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    • 3. 发明授权
    • Liquid processing apparatus and liquid processing method
    • 液体处理装置和液体处理方法
    • US07566365B2
    • 2009-07-28
    • US10796179
    • 2004-03-10
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • B05C5/02
    • H01L21/68721B05C11/08B05D1/005H01L21/6715H01L21/68735H01L21/6875
    • In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
    • 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中,旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上,使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置,其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环,该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口,其中空气入口与排气单元连通。
    • 4. 发明授权
    • Liquid processing apparatus and liquid processing method
    • 液体处理装置和液体处理方法
    • US07927657B2
    • 2011-04-19
    • US12492650
    • 2009-06-26
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • B05D3/12
    • H01L21/68721B05C11/08B05D1/005H01L21/6715H01L21/68735H01L21/6875
    • In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
    • 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中,旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上,使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置,其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环,该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口,其中空气入口与排气单元连通。
    • 5. 发明授权
    • Coating treatment apparatus and coating treatment method
    • 涂层处理装置和涂层处理方法
    • US07553374B2
    • 2009-06-30
    • US11047600
    • 2005-02-02
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • B05C11/06B05C11/00B05C11/02B05C11/10B05B7/06
    • H01L21/6715
    • In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating film forming component and a solvent is applied to the front face of the substrate and spread into a thin film state by a so-called spin coating method, and thereafter the substrate is rotated at a high speed so that the coating solution is dried. In this case, it is possible to control fresh gas flow from above the substrate to decrease the difference in evaporation rate of the solvent between the coating solution on the corner portions of the substrate and the coating solution inside them, thus enabling the coating treatment uniform within a plane on the substrate.
    • 在本发明中,根据涂布处理,将水平保持在基板保持单元上并可上下移动的基板的前面的角部的气流限制环设定为规定的高度。 然后,将含有涂膜形成成分和溶剂的涂布溶液涂布在基板的正面,通过所谓的旋涂法扩展成薄膜状态,然后高速旋转基板 使涂层溶液干燥。 在这种情况下,可以控制从基板上方的新鲜气体流动,以减少基板的角部上的涂布液与其内部的涂布液之间的溶剂的蒸发速率差,从而能够使涂布处理均匀 在基板上的平面内。
    • 6. 发明申请
    • Coating treatment apparatus and coating treatment method
    • 涂层处理装置和涂层处理方法
    • US20050181127A1
    • 2005-08-18
    • US11047600
    • 2005-02-02
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • Masahito HamadaFumio HirotaShinji Kobayashi
    • B05D1/40B05C5/00B05C11/00B05C11/08B05D3/12H01L21/00H01L21/027
    • H01L21/6715
    • In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating film forming component and a solvent is applied to the front face of the substrate and spread into a thin film state by a so-called spin coating method, and thereafter the substrate is rotated at a high speed so that the coating solution is dried. In this case, it is possible to control fresh gas flow from above the substrate to decrease the difference in evaporation rate of the solvent between the coating solution on the corner portions of the substrate and the coating solution inside them, thus enabling the coating treatment uniform within a plane on the substrate.
    • 在本发明中,根据涂布处理,将水平保持在基板保持单元上并可上下移动的基板的前面的角部的气流限制环设定为规定的高度。 然后,将含有涂膜形成成分和溶剂的涂布溶液涂布在基板的正面,通过所谓的旋涂法扩展成薄膜状态,然后高速旋转基板 使涂层溶液干燥。 在这种情况下,可以控制从基板上方的新鲜气体流动,以减少基板的角部上的涂布液与其内部的涂布液之间的溶剂的蒸发速率差,从而能够使涂布处理均匀 在基板上的平面内。
    • 10. 发明申请
    • EVAPORATED FUEL TREATMENT DEVICE FOR VEHICLE
    • 蒸汽燃料处理装置
    • US20120240904A1
    • 2012-09-27
    • US13397418
    • 2012-02-15
    • Takeshi ShimuraIkuo HaraTadaaki NagataShinji KobayashiTakahiro Imamura
    • Takeshi ShimuraIkuo HaraTadaaki NagataShinji KobayashiTakahiro Imamura
    • F02M33/04
    • B60K15/03504B60K2015/03514B60K2015/0561Y10T137/6855
    • An evaporated fuel treatment device for a vehicle is provided to suppress the flowout of evaporated fuel into atmospheric air. In the evaporated fuel treatment device, a communication chamber is formed in a fuel supply cap, allowing communication between a charge passage and the inside of a fuel tank in a closed state. In the communication chamber, a positive pressure adjusting valve is openable to supply evaporated fuel in the fuel tank to an evaporated fuel storage unit through the communication chamber and the charge passage, and a negative pressure adjusting valve is openable to supply atmospheric air to the fuel tank from the evaporated fuel storage unit through the communication chamber and the charge passage. An interlocking member is provided between the key cover and the negative pressure adjusting valve, and opens the negative pressure adjusting valve in an interlocking manner with an operation of opening the key cover.
    • 提供一种用于车辆的蒸发燃料处理装置,以抑制蒸发的燃料流入大气中。 在蒸发燃料处理装置中,连通室形成在燃料供给盖中,允许在关闭状态下在充电通道和燃料箱内部之间连通。 在通信室中,正压调节阀可打开,以通过连通室和充气通道将燃料箱中的蒸发燃料供应到蒸发燃料存储单元,负压调节阀可打开以向燃料供应大气 来自蒸发的燃料存储单元的罐通过通信室和充电通道。 在键盖和负压调节阀之间设置有互锁构件,并且通过打开钥匙盖的操作以互锁的方式打开负压调节阀。