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1. 发明授权

US07670418B2 Yellow ink composition, inkset for inkjet, inkjet recording method, and recorded matter 有权
标题翻译：黄色油墨组合物，喷墨用油墨组件，喷墨记录方法和记录材料
公开(公告)号：US07670418B2
公开(公告)日：2010-03-02
申请号：US12074532
申请日：2008-03-04
申请人： Shinichi Kato , Tsuyoshi Sano
发明人： Shinichi Kato , Tsuyoshi Sano
IPC分类号： C09D11/02 , B41J2/01
CPC分类号： C09D11/322 , C09D11/40 , Y10T428/24802
摘要： A yellow ink composition for inkjet recording, containing one or more pigments selected from a group consisting of C. I. Pigment Yellow 213, 185, and 155 as a colorant.
摘要翻译：一种用于喷墨记录的黄色油墨组合物，其含有选自C.I.颜料黄213,185和155的一种或多种颜料作为着色剂。

2. 发明申请

US20080233362A1 Yellow ink composition, inkset for inkjet, inkjet recording method, and recorded matter 有权
标题翻译：黄色油墨组合物，喷墨用油墨组件，喷墨记录方法和记录材料
公开(公告)号：US20080233362A1
公开(公告)日：2008-09-25
申请号：US12074532
申请日：2008-03-04
申请人： Shinichi Kato , Tsuyoshi Sano
发明人： Shinichi Kato , Tsuyoshi Sano
IPC分类号： C09D11/02 , B05D5/00 , B32B5/00
CPC分类号： C09D11/322 , C09D11/40 , Y10T428/24802
摘要： A yellow ink composition for inkjet recording, containing one or more pigments selected from a group consisting of C. I. Pigment Yellow 213, 185, and 155 as a colorant.
摘要翻译：一种用于喷墨记录的黄色油墨组合物，其含有选自C.I.颜料黄213,185和155的一种或多种颜料作为着色剂。

3. 发明申请

US20050039632A1 Ink set, recording method, recording device, recording system, and recorded object 有权
标题翻译：油墨，记录方法，记录装置，记录系统和记录物
公开(公告)号：US20050039632A1
公开(公告)日：2005-02-24
申请号：US10494681
申请日：2003-11-04
申请人： Yuko Yamamoto , Shuichi Kataoka , Takeshi Tanoue , Shinichi Kato , Tsuyoshi Sano
发明人： Yuko Yamamoto , Shuichi Kataoka , Takeshi Tanoue , Shinichi Kato , Tsuyoshi Sano
IPC分类号： B41J2/01 , B41M5/00 , C09D11/00 , C09D11/322 , C09D11/40 , C09D11/02
CPC分类号： C09D11/40 , Y10T428/24835
摘要： It is an object of the present invention to provide an ink set which makes it possible to obtain recorded images that have a broad color reproduction range and a high saturation, as well as glossiness without conspicuous graininess caused by dot expression, and which in particular makes it possible to achieve an extreme suppression of graininess caused by dot expression in cases where the ink set is used on media that have a coating layer, and to obtain recorded images with extremely superior coloring characteristics in cases where the ink set is used on ordinary paper. The present invention provides an ink set comprising at least a yellow ink (Y), magenta ink (M), cyan ink (C) and red ink (R), wherein the L* values in the CIE-stipulated Lab display system of aqueous solutions of the respective inks diluted 1000 times by weight are in the following ranges: (Y): at least 89 but no more than 94, (M): at least 76 but no more than 93, (C): at least 74 and no more than 87, (R): at least 55 and no more than 74.
摘要翻译：本发明的目的是提供一种能够获得具有宽的色彩再现范围和高饱和度的记录图像以及光泽度而不会由点表达引起的明显颗粒度的油墨组，并且特别地使得在将油墨组用于具有涂层的介质的情况下，可以实现由点表示引起的颗粒度的极度抑制，并且在用于普通纸张的情况下获得具有极好的着色特性的记录图像。本发明提供一种油墨组，其至少包括黄色油墨（Y），品红色油墨（M），青色油墨（C）和红色油墨（R），其中CIE规定的Lab显示系统中的L * 稀释1000倍重量的各种油墨的溶液在以下范围内：（Y）：至少89但不超过94（M）：至少76但不大于93，（C）：至少74和不超过87（R）：至少55和不超过74。

4. 发明授权

US07959725B2 Ink set, recording method, recording device, recording system, and recorded object 有权
标题翻译：油墨，记录方法，记录装置，记录系统和记录物
公开(公告)号：US07959725B2
公开(公告)日：2011-06-14
申请号：US10494681
申请日：2003-11-04
申请人： Yuko Yamamoto , Shuichi Kataoka , Takeshi Tanoue , Shinichi Kato , Tsuyoshi Sano
发明人： Yuko Yamamoto , Shuichi Kataoka , Takeshi Tanoue , Shinichi Kato , Tsuyoshi Sano
IPC分类号： C09D11/02
CPC分类号： C09D11/40 , Y10T428/24835
摘要： It is an object of the present invention to provide an ink set which makes it possible to obtain recorded images that have a broad color reproduction range and a high saturation, as well as glossiness without conspicuous graininess caused by dot expression, and which in particular makes it possible to achieve an extreme suppression of graininess caused by dot expression in cases where the ink set is used on media that have a coating layer, and to obtain recorded images with extremely superior coloring characteristics in cases where the ink set is used on ordinary paper. The present invention provides an ink set comprising at least a yellow ink (Y), magenta ink (M), cyan ink (C) and red ink (R), wherein the L* values in the CIE-stipulated Lab display system of aqueous solutions of the respective inks diluted 1000 times by weight are in the following ranges: (Y): at least 89 but no more than 94, (M): at least 76 but no more than 93, (C): at least 74 and no more than 87, (R): at least 55 and no more than 74.
摘要翻译：本发明的目的是提供一种能够获得具有宽的色彩再现范围和高饱和度的记录图像以及光泽度而不会由点表达引起的明显颗粒度的油墨组，并且特别地使得在将油墨组用于具有涂层的介质的情况下，可以实现由点表示引起的颗粒度的极度抑制，并且在用于普通纸张的情况下获得具有极好的着色特性的记录图像。本发明提供一种油墨组，其至少包括黄色油墨（Y），品红色油墨（M），青色油墨（C）和红色油墨（R），其中CIE规定的Lab显示系统中的L * 稀释1000倍重量的各种油墨的溶液在以下范围内：（Y）：至少89但不超过94（M）：至少76但不大于93，（C）：至少74和不超过87（R）：至少55和不超过74。

5. 发明授权

US09434005B2 Pb-free copper-alloy sliding material, and plain bearing 有权
标题翻译：无铅铜合金滑动材料和滑动轴承
公开(公告)号：US09434005B2
公开(公告)日：2016-09-06
申请号：US13493617
申请日：2012-06-11
申请人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
发明人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
IPC分类号： B22F7/08 , C22C1/04 , C22C9/00 , C22C9/02 , F16C33/12 , C22C9/04 , C22C9/08
CPC分类号： B22F7/08 , B22F2998/00 , C22C1/0425 , C22C9/00 , C22C9/02 , C22C9/04 , C22C9/08 , F16C33/121 , F16C2204/12 , Y02T10/865 , B22F3/10
摘要： A method of producing a Pb-free copper-alloy sliding material containing 1.0 to 15.0% of Sn, 0.5 to 15.0% of Bi and 0.05 to 5.0% of Ag, and Ag and Bi from an Ag—Bi eutectic. If necessary, at least one of 0.1 to 5.0% of Ni, 0.02 to 0.2% P, 0.5 to 30.0% of Zn, and 1.0 to 10.0 mass % of at least one of a group consisting of Fe3P, Fe2P, FeB, NiB and AlN may be added.
摘要翻译：制备含有Sn：1.0〜15.0％，Bi：0.5〜15.0％，Ag：0.05〜5.0％，Ag-Bi共晶的Ag，Bi的无铅铜合金滑动材料的制造方法。如果需要，可以使用0.1〜5.0％的Ni，0.02〜0.2％的P，0.5〜30.0％的Zn和1.0〜10.0质量％的Fe 3 P，Fe 2 P，FeB，NiB和可以添加AlN。

6. 发明授权

US08963050B2 Apparatus for and method of heat-treating thin film on surface of substrate 有权
标题翻译：薄膜表面热处理设备及方法
公开(公告)号：US08963050B2
公开(公告)日：2015-02-24
申请号：US13272657
申请日：2011-10-13
申请人： Shinichi Kato , Hiroki Kiyama
发明人： Shinichi Kato , Hiroki Kiyama
IPC分类号： F27D11/00 , H05B7/18 , H05B3/68 , F26B3/30 , F27B17/00 , F27D7/02 , H01L21/67
CPC分类号： F27B17/0025 , F27D7/02 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer having a surface with a thin film formed thereon is transported into a chamber and held by a holder. After an atmosphere provided in the chamber is replaced, flashes of light are directed from flash lamps in a light irradiation part toward the semiconductor wafer to perform a baking process on the thin film. The irradiation of the semiconductor wafer with light from halogen lamps in the light irradiation part also starts at the same time as the irradiation thereof with the flashes of light. The flashes of light emitted for an extremely short period of time and having a high intensity allow the surface temperature of the thin film to rise momentarily. This prevents the occurrence of abnormal grain growth resulting from prolonged baking in the film.
摘要翻译：将其上形成有薄膜的表面的半导体晶片输送到室中并由保持器保持。在更换室内提供的气氛之后，将闪光灯从光照射部分中的闪光灯朝向半导体晶片引导，以对薄膜进行烘烤处理。用光照射部分的卤素灯的光照射半导体晶片也是在与闪光的照射的同时开始的。在非常短的时间内发射的光并且具有高强度的闪光使得薄膜的表面温度瞬间上升。这防止了由于膜中长时间烘烤而导致的异常晶粒生长的发生。

7. 发明授权

US08852966B2 Heat treatment method and heat treatment apparatus of thin film 有权
标题翻译：薄膜的热处理方法和热处理装置
公开(公告)号：US08852966B2
公开(公告)日：2014-10-07
申请号：US13609947
申请日：2012-09-11
申请人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
发明人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/26 , H01L21/02 , H01L21/268 , H01L21/67
CPC分类号： H01L21/2686 , H01L21/02181 , H01L21/0228 , H01L21/02337 , H01L21/02356 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer, on the surface of which a silicon dioxide base material and an amorphous silicon thin film are formed in this order, is carried into a chamber. An insulated gate bipolar transistor (IGBT) is connected with a power supply circuit to a flash lamp, and the IGBT makes an energization period to the flash lamp to be 0.01 millisecond or more and 1 millisecond or less, consequently making a flash light irradiation time to be 0.01 millisecond or more and 1 millisecond or less. Since a flash heat treatment is performed with a remarkably short flash light irradiation time, the excessive heating of the thin film of amorphous silicon is suppressed and harmful influence such as the exfoliation of the film is prevented.
摘要翻译：在其表面上依次形成二氧化硅基底材料和非晶硅薄膜的半导体晶片被携带到腔室中。绝缘栅双极晶体管（IGBT）与电源电路连接到闪光灯，并且IGBT使闪光灯的通电周期为0.01毫秒以上且1毫秒以下，从而使闪光灯照射时间为0.01毫秒以上且1毫秒以下。由于以明显短的闪光照射时间进行闪光热处理，因此能够抑制非晶硅薄膜的过度加热，并且防止了膜的剥离等有害影响。

8. 发明授权

US08623750B2 Heat treatment method for promoting crystallization of high dielectric constant film 有权
标题翻译：促进高介电常数膜结晶的热处理方法
公开(公告)号：US08623750B2
公开(公告)日：2014-01-07
申请号：US13607892
申请日：2012-09-10
申请人： Kazuhiko Fuse , Shinichi Kato
发明人： Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/3205 , H01L21/31 , H01L21/469
CPC分类号： H01L21/02356 , H01L21/2686 , H01L21/28176 , H01L21/67115 , H01L21/68707 , H01L21/68735 , H01L29/513 , H01L29/517 , H01L29/7848
摘要： A film of silicon dioxide is formed on the silicon-germanium layer, and a high dielectric constant film is further formed on the film of silicon dioxide. First irradiation from a flash lamp is performed on the semiconductor wafer to increase the temperature of a front surface of the semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 3 milliseconds to 1 second. Subsequently, second irradiation from the flash lamp is performed to maintain the temperature of the front surface of the semiconductor wafer within a ±25° C. range around the target temperature for a time period in the range of 3 milliseconds to 1 second. This promotes the crystallization of the high dielectric constant film while suppressing the alleviation of distortion in the silicon-germanium layer.
摘要翻译：在硅 - 锗层上形成二氧化硅膜，并且在二氧化硅膜上进一步形成高介电常数膜。在半导体晶片上进行来自闪光灯的第一次照射，将半导体晶片的正面的温度从预热温度升温至目标温度，时间范围为3毫秒〜1秒。随后，执行从闪光灯的第二次照射，以将半导体晶片的前表面的温度保持在目标温度的±25℃范围内，持续3毫秒至1秒的时间段。这促进了高介电常数膜的结晶，同时抑制了硅 - 锗层中的变形的减轻。

9. 发明申请

US20120225968A1 INK COMPOSITION FOR INK JET 审中-公开
标题翻译：墨水喷墨墨水组合物
公开(公告)号：US20120225968A1
公开(公告)日：2012-09-06
申请号：US13337581
申请日：2011-12-27
申请人： Tomohito Nakano , Toshiyuki Miyabayashi , Shinichi Kato , Hiroki Nakane , Hirotoshi Koyano , Yoshinobu Sato , Hiroshi Sawada , Kenji Kitada
发明人： Tomohito Nakano , Toshiyuki Miyabayashi , Shinichi Kato , Hiroki Nakane , Hirotoshi Koyano , Yoshinobu Sato , Hiroshi Sawada , Kenji Kitada
IPC分类号： C09D11/10
CPC分类号： C08F299/06 , C08F290/067 , C09D11/101
摘要： An ink composition for ink jet providing excellent in the curability based on ultraviolet irradiation in the presence of water or a solvent, the ejection stability with respect to the factors such as dot loss or flight deflection, and the storage stability of ink. Also provided herein is an ink composition for ink jet including: a pigment; a water-soluble organic solvent; a surfactant; at least either of a urethane (meth)acrylate being represented by the following general formula (1) and having a weight average molecular weight of 1,000 to 10,000 and a cross-linked urethane (meth)acrylate having a constitutional unit including the urethane (meth)acrylate; a compound having a radical polymerizable group(s); a photoradical polymerization initiator; and water: A1-O—(CONH—B1—NHCOO—C1—O)n—CONH—B1—NH—COO-D1 (1) where each of A1, B1, C1, D1, and n in formula (1) are described herein.
摘要翻译：一种用于喷墨的油墨组合物，其在水或溶剂的存在下，基于紫外线照射提供优异的固化性，相对于诸如点损失或飞行偏转等因素的喷射稳定性以及油墨的储存稳定性。本文还提供了一种用于喷墨的油墨组合物，包括：颜料; 水溶性有机溶剂; 表面活性剂; 氨基甲酸酯（甲基）丙烯酸酯中的至少一种由以下通式（1）表示并具有1,000至10,000的重均分子量和具有包含氨基甲酸酯（甲基）丙烯酸酯的结构单元的交联的聚氨酯（甲基）丙烯酸酯）丙烯酸酯; 具有自由基聚合性基团的化合物; 光自由基聚合引发剂; 和水：式（1）中的A1，B1，C1，D1和n各自的A1-O-（CONH-B1-NHCOO-C1-O）n-CONH-B1-NH-COO-D1（1）在此描述。

10. 发明授权

US08129284B2 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation 有权
标题翻译：热处理方法和通过光照射加热基板的热处理装置
公开(公告)号：US08129284B2
公开(公告)日：2012-03-06
申请号：US12732591
申请日：2010-03-26
申请人： Shinichi Kato
发明人： Shinichi Kato
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： F27B17/0025 , H01L21/26513 , H01L21/2686 , H01L21/67103 , H01L21/67115 , H01L21/67248 , H01L21/68742 , H01L21/68785 , H01L21/68792
摘要： A semiconductor wafer in which a carbon thin film is formed on a surface of a silicon substrate implanted with impurities is irradiated with flash light emitted from flash lamps. Absorbing the flash light causes the temperature of the carbon thin film to increase. The surface temperature of the silicon substrate implanted with impurities is therefore increased to be higher than that in a case where no thin film is formed, and the sheet resistance value can be thereby decreased. When the semiconductor wafer with the carbon thin film formed thereon is irradiated with flash light in high concentration oxygen atmosphere, since the carbon of the thin film is oxidized to be vaporized, removal of the thin film is performed concurrently with flash heating.
摘要翻译：在其上注入有杂质的硅衬底的表面上形成碳薄膜的半导体晶片被从闪光灯发射的闪光照射。吸收闪光灯会导致碳薄膜的温度升高。因此，注入杂质的硅衬底的表面温度增加到高于不形成薄膜的情况下的表面温度，并且可以降低薄层电阻值。当在其上形成有碳薄膜的半导体晶片用高浓度氧气氛中的闪光照射时，由于薄膜的碳被氧化以汽化，所以与闪光加热同时进行薄膜的去除。

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