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    • 7. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US06731535B1
    • 2004-05-04
    • US10455523
    • 2003-06-06
    • Tsukasa OoishiShuichi UenoShigehiro Kuge
    • Tsukasa OoishiShuichi UenoShigehiro Kuge
    • G11C1114
    • H01L27/224G11C11/16H01L27/228
    • A nonvolatile semiconductor memory device includes a silicon substrate, bit lines, word lines, and memory cells. The bit line is positioned above the main surface of the silicon substrate and the word line is provided to intersect the bit line. The memory cell is positioned at a region where the bit line and the word line intersect and has one end electrically connected to the bit line and the other end electrically connected to the word line. The memory cell includes a TMR element and an access diode electrically connected in series. The access diode includes an n-type silicon layer and a p-type silicon layer recrystallized by melting-recrystallization and has a pn junction at the interface between the n-type silicon layer and the p-type silicon layer. As a result, a nonvolatile semiconductor memory device reduced in size and having high performance can be manufactured inexpensively.
    • 非易失性半导体存储器件包括硅衬底,位线,字线和存储单元。 位线位于硅衬底的主表面上方,并且字线被提供以与位线相交。 存储单元位于位线和字线相交的区域,并且其一端电连接到位线,另一端电连接到字线。 存储单元包括串联电连接的TMR元件和存取二极管。 存取二极管包括n型硅层和通过熔融重结晶重结晶的p型硅层,并且在n型硅层和p型硅层之间的界面处具有pn结。 结果,可以廉价地制造尺寸减小并且具有高性能的非易失性半导体存储器件。
    • 10. 发明授权
    • Semiconductor memory device capable of adjusting internal parameter
    • 半导体存储器能够调整内部参数
    • US06424593B1
    • 2002-07-23
    • US09811580
    • 2001-03-20
    • Shigehiro KugeTetsuo Kato
    • Shigehiro KugeTetsuo Kato
    • G11C800
    • G11C7/109G11C7/1078G11C11/4093G11C2207/2254
    • Internal parameter control signal generating units generate internal parameter control signals for adjusting internal parameters of a semiconductor memory device. Each internal parameter control signal generating unit includes an anti-fuse element formed with a data holding capacitor of a memory cell. The anti-fuse element is blown with application of a high voltage according to a parameter adjustment signal to break down a dielectric film and then, act as a resistance element. The internal parameter control signal generating unit sets a signal level of a corresponding internal parameter control signal in a non-volatile manner according to the presence or absence of a blowing input to the anti-fuse element.
    • 内部参数控制信号发生单元产生用于调整半导体存储器件的内部参数的内部参数控制信号。 每个内部参数控制信号产生单元包括由存储单元的数据保持电容器形成的反熔丝元件。 根据参数调整信号,通过施加高电压来对抗熔丝元件进行熔断,分解电介质膜,然后作为电阻元件。 内部参数控制信号生成部,根据是否存在向反熔丝元件的吹入输入,以非易失的方式设定相应的内部参数控制信号的信号电平。