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1. 发明申请

US20060290947A1 Optical metrology model optimization for repetitive structures 有权
标题翻译：重复结构的光学计量学模型优化
公开(公告)号：US20060290947A1
公开(公告)日：2006-12-28
申请号：US11155406
申请日：2005-06-16
申请人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G01B11/14
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

2. 发明授权

US07355728B2 Optical metrology model optimization for repetitive structures 有权
标题翻译：重复结构的光学计量学模型优化
公开(公告)号：US07355728B2
公开(公告)日：2008-04-08
申请号：US11155406
申请日：2005-06-16
申请人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G01B11/14
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

3. 发明申请

US20080195342A1 OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES 审中-公开
标题翻译：用于重复结构的光学计量模型优化
公开(公告)号：US20080195342A1
公开(公告)日：2008-08-14
申请号：US12099735
申请日：2008-04-08
申请人： Shifang LI , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang LI , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G06F19/00
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

4. 发明授权

US07588949B2 Optical metrology model optimization based on goals 有权
标题翻译：基于目标的光学计量模型优化
公开(公告)号：US07588949B2
公开(公告)日：2009-09-15
申请号：US11699837
申请日：2007-01-29
申请人： Vi Vuong , Emmanuel Drege , Shifang Li , Junwei Bao
发明人： Vi Vuong , Emmanuel Drege , Shifang Li , Junwei Bao
IPC分类号： H01L21/00 , G06F19/00
CPC分类号： G03F7/70625 , G03F7/705
摘要： The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.
摘要翻译：评估用于测量晶片结构的光学测量模型的优化。开发了具有度量模型变量的光学测量模型，其包括轮廓模型的轮廓模型参数。选择计量模型优化的一个或多个目标。选择要用于评估一个或多个所选目标的一个或多个简档模型参数。选择要设置为固定值的一个或多个计量模型变量。一个或多个选定的计量模型变量被设置为固定值。设置一个或多个所选目标的一个或多个终止标准。光学测量模型使用一个或多个所选计量模型变量的固定值进行优化。使用优化的光学测量模型获得一个或多个所选轮廓模型参数的测量。然后确定所获得的测量是否满足一个或多个终止标准。

5. 发明授权

US07515282B2 Modeling and measuring structures with spatially varying properties in optical metrology 有权
标题翻译：光学计量学中具有空间变化特性的建模和测量结构
公开(公告)号：US07515282B2
公开(公告)日：2009-04-07
申请号：US11173198
申请日：2005-07-01
申请人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
发明人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G03F7/70625
摘要： The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.
摘要翻译：使用光学测量模型对具有空间变化特性的区域的结构的轮廓进行建模。为光学测量模型定义了一组轮廓参数，以表征结构轮廓。对于与具有空间变化性质的结构区域对应的光学计量学模型的一部分定义了一组层，每层具有限定的高度和宽度。对于每个层，在层的宽度的至少一部分上变化的数学函数被定义为表征结构区域中相应层内的空间变化特性。

6. 发明申请

US20080071504A1 LIBRARY ACCURACY ENHANCMENT AND EVALUATION 失效
标题翻译：图书馆精确度增强与评估
公开(公告)号：US20080071504A1
公开(公告)日：2008-03-20
申请号：US11946821
申请日：2007-11-28
申请人： Shifang Li , Junwei Bao , Wei Liu
发明人： Shifang Li , Junwei Bao , Wei Liu
IPC分类号： G06F15/00
CPC分类号： G01B11/24 , G03F7/70625
摘要： The accuracy of a library of simulated-diffraction signals for use in optical metrology of a structure formed on a wafer is evaluated by utilizing an identity relationship inherent to simulated diffraction signals. Each simulated diffraction signal contains at least one set of four reflectivity parameters for a wavelength and/or angle of incidence. One of the four reflectivity parameters is selected. A value for the selected reflectivity parameter is determined using the identity relationship and values of the remaining three reflectivity parameters. The determined value for the selected reflectivity parameter is compared to the value in the obtained set of four reflectivity parameters to evaluate and improve the accuracy of the library. The identity relationship can also be used to reduce the data storage in a library.
摘要翻译：通过利用模拟衍射信号固有的身份关系来评估用于在晶片上形成的结构的光学计量学中的模拟衍射信号库的精度。每个模拟衍射信号包含用于波长和/或入射角的至少一组四个反射率参数。选择四个反射率参数之一。使用身份关系和剩余的三个反射率参数的值确定所选反射率参数的值。将所选反射率参数的确定值与获得的四个反射率参数组中的值进行比较，以评估和提高库的准确性。身份关系也可用于减少库中的数据存储。

7. 发明申请

US20080033683A1 EXAMINING A STRUCTURE FORMED ON A SEMICONDUCTOR WAFER USING MACHINE LEARNING SYSTEMS 失效
标题翻译：使用机器学习系统检查在半导体波形上形成的结构
公开(公告)号：US20080033683A1
公开(公告)日：2008-02-07
申请号：US11869591
申请日：2007-10-09
申请人： Shifang LI , Junwei Bao
发明人： Shifang LI , Junwei Bao
IPC分类号： G06F19/00
CPC分类号： G03F7/70625
摘要： A structure formed on a semiconductor wafer is examined by obtaining a first diffraction signal measured from the structure using an optical metrology device. A first profile is obtained from a first machine learning system using the first diffraction signal obtained as an input to the first machine learning system. The first machine learning system is configured to generate a profile as an output for a diffraction signal received as an input. A second profile is obtained from a second machine learning system using the first profile obtained from the first machine learning system as an input to the second machine learning system. The second machine learning system is configured to generate a diffraction signal as an output for a profile received as an input. The first and second profiles include one or more parameters that characterize one or more features of the structure.
摘要翻译：通过使用光学测量装置获得从该结构测量的第一衍射信号来检查形成在半导体晶片上的结构。使用作为第一机器学习系统的输入获得的第一衍射信号从第一机器学习系统获得第一轮廓。第一机器学习系统被配置为生成作为作为输入接收的衍射信号的输出的轮廓。使用从第一机器学习系统获得的第一轮廓作为第二机器学习系统的输入，从第二机器学习系统获得第二轮廓。第二机器学习系统被配置为产生衍射信号作为作为输入接收的轮廓的输出。第一和第二简档包括表征结构的一个或多个特征的一个或多个参数。

8. 发明申请

US20080013107A1 Generating a profile model to characterize a structure to be examined using optical metrology 审中-公开
标题翻译：使用光学计量产生轮廓模型来表征要检查的结构
公开(公告)号：US20080013107A1
公开(公告)日：2008-01-17
申请号：US11484974
申请日：2006-07-11
申请人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
发明人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/8883 , G01N2021/95615
摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.
摘要翻译：在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。在视图画布附近显示一个轮廓形状调色板。在轮廓形状调色板中显示多个不同的轮廓形状基元。轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中生成并显示在视图画布中。

9. 发明申请

US20070229855A1 In-die optical metrology 失效
标题翻译：模内光学计量学
公开(公告)号：US20070229855A1
公开(公告)日：2007-10-04
申请号：US11396164
申请日：2006-03-30
申请人： Shifang Li , Junwei Bao , Vi Vuong
发明人： Shifang Li , Junwei Bao , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24
摘要： To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.
摘要翻译：为了确定半导体晶片上的管芯内结构的一个或多个特征，在要形成在测试焊盘上的测试结构的一个或多个特征与相应的管芯内结构的一个或多个特征之间确定相关性。获得测量结果测得的衍射信号。使用测量的衍射信号确定测试结构的一个或多个特征。基于测试结构的一个或多个确定的特征和确定的相关性来确定管芯内结构的一个或多个特征。

10. 发明申请

US20070225940A1 Library accuracy enhancement and evaluation 有权
标题翻译：图书馆精确度增强和评估
公开(公告)号：US20070225940A1
公开(公告)日：2007-09-27
申请号：US11390798
申请日：2006-03-27
申请人： Shifang Li , Junwei Bao , Wei Liu
发明人： Shifang Li , Junwei Bao , Wei Liu
IPC分类号： G06F19/00
CPC分类号： G01B11/24 , G03F7/70625
摘要： The accuracy of a library of simulated-diffraction signals for use in optical metrology of a structure formed on a wafer is evaluated by utilizing an identity relationship inherent to simulated diffraction signals. Each simulated diffraction signal contains at least one set of four reflectivity parameters for a wavelength and/or angle of incidence. One of the four reflectivity parameters is selected. A value for the selected reflectivity parameter is determined using the identity relationship and values of the remaining three reflectivity parameters. The determined value for the selected reflectivity parameter is compared to the value in the obtained set of four reflectivity parameters to evaluate and improve the accuracy of the library. The identity relationship can also be used to reduce the data storage in a library.
摘要翻译：通过利用模拟衍射信号固有的身份关系来评估用于在晶片上形成的结构的光学计量学中的模拟衍射信号库的精度。每个模拟衍射信号包含用于波长和/或入射角的至少一组四个反射率参数。选择四个反射率参数之一。使用身份关系和剩余的三个反射率参数的值确定所选反射率参数的值。将所选反射率参数的确定值与获得的四个反射率参数组中的值进行比较，以评估和提高库的准确性。身份关系也可用于减少库中的数据存储。

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