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    • 9. 发明授权
    • Method of manufacturing integrated circuits using pre-made and pre-qualified exposure masks for selected blocks of circuitry
    • 使用用于选定的电路块的预制和预合格曝光掩模来制造集成电路的方法
    • US07519941B2
    • 2009-04-14
    • US11279666
    • 2006-04-13
    • Serafino BuetiKenneth J. GoodnowGregory J. MannJason M. Norman
    • Serafino BuetiKenneth J. GoodnowGregory J. MannJason M. Norman
    • G07F17/50
    • G03F1/84
    • Disclosed are embodiments of a manufacturing method that establishes a library of pre-made and pre-qualified masks for patterning different blocks of circuitry that meet established performance and timing requirements. The embodiments of the method use stepped exposures of multiple masks, including at least one mask selected from this library, to pattern a chip design onto a silicon wafer, where the chip design is made up of two or more interconnected blocks of circuitry. Consequently, for a given integrated circuit design, pre-made/pre-qualified mask(s) can be selected from the library to pattern one, some or all blocks of circuitry for the design. Optionally, additional masks can be specially made and qualified to pattern other block(s) of circuitry (e.g., application specific logic) within the design. The blocks of circuitry patterned in this manner can be electrically connected via generic or customized interfaces in order to complete the chip design.
    • 公开了一种制造方法的实施例,其建立用于图案化满足已确定的性能和时序要求的不同电路块的预制和预先限定的掩模库。 该方法的实施例使用多个掩模的步进曝光,包括从该库选择的至少一个掩模,以将芯片设计图案化到硅晶片上,其中芯片设计由两个或更多个互连的电路块组成。 因此,对于给定的集成电路设计,可以从库中选择预制/预先限定的掩模,以对设计的一个,一些或所有电路块进行图案化。 可选地,附加掩模可以被特别地制造并且被限定以在设计中对其他电路块(例如,应用专用逻辑)进行图案化。 以这种方式图案化的电路块可通过通用或定制界面电连接,以完成芯片设计。