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1. 发明授权

US09602010B2 Insulated DC power supply and a method of controlling same 有权
公开(公告)号：US09602010B2
公开(公告)日：2017-03-21
申请号：US14964448
申请日：2015-12-09
申请人： Satoshi Arima , Kenji Nakata , Takeshi Sato
发明人： Satoshi Arima , Kenji Nakata , Takeshi Sato
IPC分类号： H02M3/335 , H02M1/00
CPC分类号： H02M3/33507 , H02M2001/0009
摘要： An insulated DC power supply includes a voltage transformer, a switching device and a primary-side regulating circuit. The voltage transformer includes primary and secondary windings and an auxiliary winding. The switching device causes current to flow intermittently through the primary winding. The primary-side regulating circuit receives a voltage proportional to a current flowing through the primary winding of the transformer, and a voltage proportional to a voltage induced in the auxiliary winding of the transformer to generate and output a drive pulse for turning on or off the switching device. The primary-side regulating circuit includes an ON/OFF signal generator circuit and first and second timer circuits. The switching device is turned off upon expiration of the first timer circuit, and the ON/OFF signal generator circuit does not generate a signal for turn-on of the switching device when the second timer circuit expires.

2. 发明授权

US08632688B2 Plasma processing apparatus and plasma processing method 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08632688B2
公开(公告)日：2014-01-21
申请号：US13236800
申请日：2011-09-20
申请人： Masaru Izawa , Kouichi Yamamoto , Kenji Nakata , Atsushi Itou
发明人： Masaru Izawa , Kouichi Yamamoto , Kenji Nakata , Atsushi Itou
IPC分类号： G01L21/30 , G01R31/00
CPC分类号： H01J37/32972 , H01J37/32899 , H01L21/32137
摘要： In a plasma processing apparatus in which a wafer is processed while supplying radio frequency power to electrodes disposed in a sample stage in a processing chamber within a reactor via a matching box, by matching a specific value of power at transition points of data values of at least two kinds among characteristic data including light emission intensity of the plasma, magnitude of its time variation, a matching position of the matching box, and a change of a value of a voltage of the radio frequency power supplied to the electrodes detected by varying the power to a plurality of values during the processing with a value detected by using characteristic data which is detected during the processing executed on a wafer of the same kind in a different reactor, the differences of the states inside the processing chamber or plasma among a plurality of semiconductor processing apparatuses or reactors are reduced.
摘要翻译：在等离子体处理装置中，其中通过匹配箱向电抗器内的处理室内的设置在样品台中的电极提供射频功率，通过匹配在at的数据值的转换点处的功率的特定值来处理晶片特征数据中包括等离子体的发光强度，其时间变化的大小，匹配箱的匹配位置以及提供给电极的射频功率的电压值的变化等特性数据中的至少两种，在处理期间利用通过使用在不同反应器中的相同晶片上执行的处理期间检测到的特征数据检测到的值而获得多个值的功率，多个处理室或等离子体之间的状态之间的差异的半导体处理装置或反应堆。

3. 发明申请

US20130045547A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
标题翻译：等离子体加工设备和等离子体处理方法
公开(公告)号：US20130045547A1
公开(公告)日：2013-02-21
申请号：US13236800
申请日：2011-09-20
申请人： Masaru IZAWA , Kouichi Yamamoto , Kenji Nakata , Atsushi Itou
发明人： Masaru IZAWA , Kouichi Yamamoto , Kenji Nakata , Atsushi Itou
IPC分类号： H01L21/66 , C23F1/08
CPC分类号： H01J37/32972 , H01J37/32899 , H01L21/32137
摘要： In a plasma processing apparatus in which a wafer is processed while supplying radio frequency power to electrodes disposed in a sample stage in a processing chamber within a reactor via a matching box, by matching a specific value of power at transition points of data values of at least two kinds among characteristic data including light emission intensity of the plasma, magnitude of its time variation, a matching position of the matching box, and a change of a value of a voltage of the radio frequency power supplied to the electrodes detected by varying the power to a plurality of values during the processing with a value detected by using characteristic data which is detected during the processing executed on a wafer of the same kind in a different reactor, the differences of the states inside the processing chamber or plasma among a plurality of semiconductor processing apparatuses or reactors are reduced.
摘要翻译：在等离子体处理装置中，其中通过匹配箱向电抗器内的处理室内的设置在样品台中的电极提供射频功率，通过匹配在at的数据值的转换点处的功率的特定值来处理晶片特征数据中包括等离子体的发光强度，其时间变化的大小，匹配箱的匹配位置以及提供给电极的射频功率的电压值的变化等特性数据中的至少两种，在处理期间利用通过使用在不同反应器中的相同晶片上执行的处理期间检测到的特征数据检测到的值而获得多个值的功率，多个处理室或等离子体之间的状态之间的差异的半导体处理装置或反应堆。

4. 发明授权

US5685684A Vacuum processing system 失效
标题翻译：真空加工系统
公开(公告)号：US5685684A
公开(公告)日：1997-11-11
申请号：US612465
申请日：1996-03-07
申请人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
发明人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
IPC分类号： B65G49/07 , H01L21/677 , B65H5/08
CPC分类号： H01L21/67778 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.
摘要翻译：一种具有真空处理室的真空处理装置，其特征在于，包括：多个基板盒，其安装在所述露天空间中并保持要被输送到所述真空处理室的基板;装置用于在基板盒和真空处理室之间输送基板，以及选择在真空处理室中处理后的被处理基板被保持在待处理基板的基板盒中的装置或将真空处理室中处理后的被处理基板保持在与基板盒不同的另一基板盒中。

5. 发明授权

US07617030B2 Display system, in-vehicle display system, operation control system, and operator specification method 失效
标题翻译：显示系统，车载显示系统，操作控制系统和操作员指定方法
公开(公告)号：US07617030B2
公开(公告)日：2009-11-10
申请号：US11987263
申请日：2007-11-28
申请人： Satoshi Harumoto , Masahiro Ikeda , Guosheng Lin , Hidenori Kurose , Yuki Makimoto , Shougo Tanaka , Shinya Tanaka , Kenji Nakata , Takako Fukuda
发明人： Satoshi Harumoto , Masahiro Ikeda , Guosheng Lin , Hidenori Kurose , Yuki Makimoto , Shougo Tanaka , Shinya Tanaka , Kenji Nakata , Takako Fukuda
IPC分类号： G06F7/00
CPC分类号： B60W40/08 , B60W2040/0809 , B60W2040/0881
摘要： A seat sensor is arranged for each of a plurality of seats. A pulse-signal supplying unit supplies a pulse signal with a different timing to the seat sensor. An operator identifying unit detects, when a first operator sit on any one of the seats operates an operating unit, the pulse signal supplied to the seat sensor by the pulse-signal supplying unit through the first operator and the operating unit, and identifies the first operator based on a timing of a detected pulse signal. An operation control unit performs a control depending on an operation performed on the operating unit by a detected first operator.
摘要翻译：为多个座位中的每一个设置座椅传感器。脉冲信号供给单元向座椅传感器提供具有不同定时的脉冲信号。当第一操作者坐在任何一个座椅上操作操作单元时，操作员识别单元检测由脉冲信号提供单元通过第一操作器和操作单元提供给座椅传感器的脉冲信号，并且识别第一基于检测到的脉冲信号的定时。操作控制单元根据检测到的第一操作者对操作单元执行的操作进行控制。

6. 发明申请

US20090003978A1 Vacuum processing apparatus and vacuum processing method 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20090003978A1
公开(公告)日：2009-01-01
申请号：US12230467
申请日：2008-08-29
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/67
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus and method in which the apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：一种真空处理装置和方法，其中所述装置包括用于对样品进行真空处理的真空处理室，真空支架，可切换室，用于支撑多个能够容纳样品的盒的盒支架，以及用于支持等同的盒子，其与支撑在盒支架上的盒子不同，并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

7. 发明授权

US07149830B2 Semiconductor device and microcontroller 有权
标题翻译：半导体器件和微控制器
公开(公告)号：US07149830B2
公开(公告)日：2006-12-12
申请号：US10947538
申请日：2004-09-23
申请人： Norihiro Nakatsuhama , Yoshiaki Nagatomi , Kenichi Kawabata , Tomohide Yamamoto , Kenji Nakata , Hironori Aono , Masatoshi Konishi
发明人： Norihiro Nakatsuhama , Yoshiaki Nagatomi , Kenichi Kawabata , Tomohide Yamamoto , Kenji Nakata , Hironori Aono , Masatoshi Konishi
IPC分类号： G06F13/24
CPC分类号： G06F13/24
摘要： A semiconductor device in which input terminals for external interrupts can be set as desired. A plurality of external input terminals can be specified as interrupt terminals which output an input signal to an external interrupt circuit via an interrupt terminal selector. A selection control circuit specifies whether a plurality of external input terminals are used as interrupt terminals. According to the selection control circuit, the interrupt terminal selector outputs to the external interrupt circuit an input signal entered from an external input terminal which is specified as an interrupt terminal out of the plurality of external input terminals.
摘要翻译：可以根据需要设定用于外部中断的输入端子的半导体装置。可以将多个外部输入端子指定为通过中断端子选择器将输入信号输出到外部中断电路的中断端子。选择控制电路指定多个外部输入端子是否用作中断端子。根据选择控制电路，中断终端选择器向外部中断电路输出从多个外部输入端子中指定为中断端子的外部输入端子输入的输入信号。

8. 发明授权

US5615424A Earthquake-proof bed 失效
标题翻译：防震床
公开(公告)号：US5615424A
公开(公告)日：1997-04-01
申请号：US518933
申请日：1995-08-24
申请人： Kenji Nakata
发明人： Kenji Nakata
IPC分类号： A47C29/00 , A47C19/22
CPC分类号： A47C31/002
摘要： An earthquake-proof bed having a superior endurance property is constructed of approximately box-shaped metallic panels and contains necessities in the event of an earthquake, such as tools for escaping and food in tool boxes installed under the bed. This earthquake-proof bed includes box-shaped metallic panels. Each panel is shaped with a plurality of frames and a pair of metal plates fixed on both sides of the frames. A plurality of tool boxes is installed on the bottom metallic panel. The plurality of tool boxes is formed by dividing plates. A plurality of lids covers the tool boxes, and an opening is shaped on any one of the metal panels. Bedding is provided on the lids.
摘要翻译：具有优异耐久性的防震床由大致为箱状的金属板构成，并且在发生地震的情况下包含必需品，例如用于逃逸的工具和安装在床下方的工具箱中的食物。该防震床包括箱形金属板。每个面板成形为具有多个框架和一对固定在框架两侧的金属板。多个工具箱安装在底部金属面板上。多个工具箱由分隔板形成。多个盖子覆盖工具箱，并且开口在任何一个金属板上成形。盖子上设有床上用品。

9. 发明授权

US4862587A Harness producing apparatus and method 失效
标题翻译：线束产生装置及方法
公开(公告)号：US4862587A
公开(公告)日：1989-09-05
申请号：US158287
申请日：1988-02-19
申请人： Kenji Nakata , Kyo Tomonari , Takeo Yamanaka
发明人： Kenji Nakata , Kyo Tomonari , Takeo Yamanaka
IPC分类号： H01R43/048 , H01R43/05 , H01R43/052 , H01R43/055
CPC分类号： H01R43/048 , H01R43/05 , H01R43/052 , H01R43/055 , Y10T29/49192 , Y10T29/49201 , Y10T29/514 , Y10T29/5142 , Y10T29/53235
摘要： A wire harness is produced by attaching terminals to one of the respective ends of a plurality of wires and gathering the other ends and attaching a single terminal thereto. The plurality of insulated wires are intermittently fed by respective predetermined lengths along predetermined feed paths, and then cut to respective predetermined lengths to provide remaining wires and cut wire sections. The insulation on the forward ends of the remaining wires and on the rear ends of the cut wire sections, next to the cut just made, are stripped. Terminals are crimped to insulation-stripped ends of the remaining wires. The cut wire sections are transferred so that their insulation-stripped ends are gathered in one place and then the insulation-stripped ends of the cut wire sections are trued-up and a single terminal is crimped thereto to form a single terminal for the plurality of cut wire sections.
摘要翻译：通过将端子连接到多根线的各个端部之一并收集另一端并将单个端子附接到其上而制造线束。多条绝缘线沿着预定的馈送路径间歇地进给预定的长度，然后切割成相应的预定长度，以提供剩余的线和切割线段。其余电线前端和切割电线部分后端的绝缘材料，刚刚切割的切口被剥离。端子被压接到剩余电线的绝缘剥离端。切割的线段被转移，使得其绝缘剥离的端部聚集在一个位置，然后切割的线段的绝缘剥离端被修整，并且单个端子被压接到其上以形成用于多个切割线段。

10. 发明申请

US20110299962A1 Vacuum Processing Apparatus And Vacuum Processing Method 审中-公开
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20110299962A1
公开(公告)日：2011-12-08
申请号：US13209871
申请日：2011-08-15
申请人： Takeshi OONO , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi OONO , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/677 , H01L21/673
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：真空处理设备包括用于对样品进行真空处理的真空处理室，真空托架，可切换室，用于支撑多个能够容纳样品的盒的盒支架和用于支撑不同的等待盒的等待盒支架从支撑在盒支架上的盒子并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

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