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1. 发明申请

US20060078407A1 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US20060078407A1
公开(公告)日：2006-04-13
申请号：US11282474
申请日：2005-11-21
申请人： Santiago del Puerto , Michael DeMarco , Glenn Friedman , Jorge Ivaldi , James McClay
发明人： Santiago del Puerto , Michael DeMarco , Glenn Friedman , Jorge Ivaldi , James McClay
IPC分类号： H01L21/677
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
摘要翻译：一种用于在光刻工具中将基板从大气压转换成真空的衬底保护和输送系统和方法。该系统包括支撑衬底的一个或多个可移除衬底输送盒。盒可以包括基部和顶部，并且可以包括密封。每个盒具有至少一个排气口和至少一个过滤器。该系统还包括具有底座和盖子的盒子。盒子保持一个或多个盒式衬底布置。还提供了一种具有用于保持盒 - 盒 - 衬底布置的搁架的存放架。此外，提供具有负载锁的入口模块，用于将盒式基板装置从大气压转换成真空。出入口模块可以包括用于运送盒式基板装置的梭和/或电梯。在过渡期间，过滤器和排气口限制负载锁中的颗粒进入盒 - 衬底布置并到达衬底的表面。

2. 发明申请

US20130010277A1 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle 审中-公开
标题翻译：使用两部分盖子和保护标线盒的盒子的系统和方法
公开(公告)号：US20130010277A1
公开(公告)日：2013-01-10
申请号：US13618204
申请日：2012-09-14
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

3. 发明申请

US20070014494A1 Vacuum pre-loaded pneumatic bearing with onboard vacuum generator 失效
公开(公告)号：US20070014494A1
公开(公告)日：2007-01-18
申请号：US11182193
申请日：2005-07-15
申请人： Geoffrey Wardman , Santiago del Puerto
发明人： Geoffrey Wardman , Santiago del Puerto
IPC分类号： F16C32/06
CPC分类号： F16C29/025 , F16C32/0614 , F16C32/0618 , F16C32/0674 , F16C2370/00
摘要： A pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing comprises a bearing body having an active surface divided into a lift portion and a pre-load portion. A plurality of gas distribution channels are formed in the bearing body, wherein a first channel receives a compressed gas, a second channel supplies a vacuum to the pre-load portion of the active surface, and a third channel supplies a positive pressure gas to the lift portion of the active surface. The bearing body has an integral, pneumatically powered, vacuum generator having an inlet coupled to the first channel, a vacuum aperture coupled to the second channel, and an exhaust. The compressed gas may be supplied to the lift portion of the active surface either in parallel, in series, or in a series-parallel configuration, with the integrated vacuum generator. In an embodiment, the pneumatic bearing is reconfigurable.

4. 发明申请

US20050046820A1 Bearing arrangement for reaction mass in a controlled environment 失效
公开(公告)号：US20050046820A1
公开(公告)日：2005-03-03
申请号：US10648263
申请日：2003-08-27
申请人： Santiago del Puerto
发明人： Santiago del Puerto
IPC分类号： F16C33/10 , F16C29/02 , F16C29/04 , F16C29/08 , F16C32/06 , F16C33/74 , F16C33/78 , G03F7/20 , H01L21/027 , G03B27/58
CPC分类号： G03F7/70766 , G03F7/70841
摘要： A reaction mass apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe; at least one reaction mass movably coupled to the baseframe by at least three first bearings and coupled to a stage by at least two second bearings and at least one drive; and a plurality of bellows, each bellows surrounding a corresponding first bearing, the bellows each having a first end coupled to a reaction mass and a second end coupled to the baseframe. The apparatus can comprise an enclosure, containing a controlled environment and enclosing the stage, the second bearings, the drive, and the reaction mass, wherein each bellows separates a corresponding first bearing from the controlled environment and wherein each bellows second end is coupled to the enclosure.

5. 发明申请

US20050254154A1 Method and apparatus for managing actinic intensity transients in a lithography mirror 有权
标题翻译：用于管理光刻镜中光化强度瞬变的方法和装置
公开(公告)号：US20050254154A1
公开(公告)日：2005-11-17
申请号：US11169009
申请日：2005-06-29
申请人： Santiago del Puerto
发明人： Santiago del Puerto
IPC分类号： G02B5/08 , G02B7/18 , G03F7/20 , H01L21/027 , G21K1/06
CPC分类号： G02B7/181 , G02B5/0891 , G02B7/1815 , G03F7/702 , G03F7/70233 , G03F7/70891 , G03F7/70958
摘要： An apparatus and method for mitigating a cold edge effect within a lithography mirror is presented. The apparatus includes a heated annular zone formed on a substrate and a heated optical aperture zone formed on the heated annular zone, where each zone includes a resistive layer, and where the resistive layer of at least one zone is produced such that electrical conductivity varies by increasing from the center of the resistive layer to the periphery of the resistive layer. A wiring layer in each zone includes an insulating sublayer and contacts for coupling to a power supply. A time-constant heat load on the lithography mirror is maintained by placing additional electrical heat loads on the mirror according to the actinic heat load on the mirror. Maintaining the time-constant heat load can reduce or eliminate variation in image distortion that occurs as a result of changes in the actinic heat load.
摘要翻译：提出了一种用于减轻光刻镜内的冷边缘效应的装置和方法。该装置包括形成在基板上的加热的环形区域和形成在加热的环形区域上的加热的光学开口区域，其中每个区域包括电阻层，并且其中产生至少一个区域的电阻层，使得导电率变化从电阻层的中心向电阻层的周边增加。每个区域中的布线层包括绝缘子层和用于耦合到电源的触点。通过根据反射镜上的光化热负载将附加的电热负载放置在反射镜上来维持光刻反射镜上的时间常数热负荷。保持时间恒定的热负荷可以减少或消除由于光化热负荷的变化而发生的图像失真的变化。

6. 发明授权

US06906783B2 System for using a two part cover for protecting a reticle 有权
标题翻译：使用两部分盖子保护标线的系统
公开(公告)号：US06906783B2
公开(公告)日：2005-06-14
申请号：US10369323
申请日：2003-02-20
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： B65G49/07 , G03B27/42 , G03B27/48 , G03B27/58 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

7. 发明授权

US06826451B2 Lithography tool having a vacuum reticle library coupled to a vacuum chamber 有权
标题翻译：光刻工具具有耦合到真空室的真空掩模库
公开(公告)号：US06826451B2
公开(公告)日：2004-11-30
申请号：US10225343
申请日：2002-08-22
申请人： Santiago del Puerto , Markus F. A. Eurlings
发明人： Santiago del Puerto , Markus F. A. Eurlings
IPC分类号： G06F1900
CPC分类号： G03F7/70741 , G03F7/70841
摘要： A lithography tool includes an exposure chamber and a reticle handler that exchanges a reticle being exposed as prescribed by the user of the lithography tool. The reticle handler can include a vacuum-compatible robot, a vacuum chamber to house the robot, a load-lock to input reticles and transition them from atmospheric pressure to vacuum, a processing station for processing the reticle, and a reticle library for storing at least one extra reticle so that it is quickly available for exchange during an exposure process. The robot can have a two or more handed gripper to simultaneously hold multiple reticles. This allows a first reticle to be removed from the reticle stage with a first hand and a second reticle to be loaded onto the reticle stage with a second hand, and so on, which minimizes exchange time.
摘要翻译：光刻工具包括曝光室和掩模版处理器，其根据光刻工具的用户交换正在暴露的掩模版。掩模版处理器可以包括真空兼容的机器人，用于容纳机器人的真空室，用于输入掩模版并将它们从大气压转换成真空的加载锁定，用于处理掩模版的处理站和用于存储在其中的掩模版库至少一个额外的掩模版，使其在曝光过程中可以快速进行交换。机器人可以具有两个或更多个手柄夹持器，以同时容纳多个掩模版。这允许第一掩模版从第一手和第二掩模版从标线片台移除，以用二手装载到掩模版台上，等等，这最小化交换时间。

8. 发明授权

US07304720B2 System for using a two part cover for protecting a reticle 有权
标题翻译：使用两部分盖子保护标线的系统
公开(公告)号：US07304720B2
公开(公告)日：2007-12-04
申请号：US10369108
申请日：2003-02-20
申请人： Santiago del Puerto , Eric R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Eric R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括连接掩模版和盖板以保护掩模版。盖子包括框架和移动面板，移动以允许在曝光过程中将光直接接近光罩。使用机器人夹持器将掩模版和盖板移动到平台。在移动之前，掩模版和盖可以联接到基板。相应的对准装置联接到框架和面板，夹具和面板以及基板和面板。舞台和框架可以具有相应的附件装置。可以使用预对准装置将掩模版运送到台架之前对齐。预对准装置和框架可以具有可用于执行预对准的相应对准装置。掩模版的预定区域可以被硬化或成形，使得在与掩模版接触期间产生较少的颗粒。

9. 发明授权

US07209220B2 System for using a two part cover for and a box for protecting a reticle 有权
标题翻译：使用两部分盖子和一个箱子保护标线的系统
公开(公告)号：US07209220B2
公开(公告)日：2007-04-24
申请号：US11299787
申请日：2005-12-13
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

10. 发明授权

US06239863B1 Removable cover for protecting a reticle, system including and method of using the same 有权
标题翻译：用于保护掩模版的可拆卸盖，系统及其使用方法
公开(公告)号：US06239863B1
公开(公告)日：2001-05-29
申请号：US09473710
申请日：1999-12-29
申请人： Eric B. Catey , David Hult , Santiago del Puerto , Stephen Roux
发明人： Eric B. Catey , David Hult , Santiago del Puerto , Stephen Roux
IPC分类号： G03B2762
CPC分类号： H01L21/67359 , G03F1/62 , G03F1/66 , G03F7/70741 , G03F7/70983 , H01L21/67369
摘要： A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener that applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. A plurality of fasteners are used to position and secure the removable cover and reticle. A method of performing lithography and a lithographic system are also described.
摘要翻译：描述了用于保护光刻系统中使用的掩模版的可拆卸盖。可拆卸的盖包括框架和由框架支撑的膜。膜对于检查波长是透明的，使得可以用可移除的盖检查掩模版就位。当可拆卸的盖子就位时，该可移除的盖保护掩模版并且可移除以进行光刻曝光。可移除的盖可以进一步包括至少一个标线紧固件，该紧固件对分划板施加力，从而防止当可拆卸盖位于适当位置时可拆卸盖相对于掩模版的移动。使用多个紧固件来定位和固定可移除的盖和掩模版。还描述了执行光刻和光刻系统的方法。

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