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1. 发明申请

US20110001955A1 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle 有权
标题翻译：使用两部分盖子和保护标线盒的盒子的系统和方法
公开(公告)号：US20110001955A1
公开(公告)日：2011-01-06
申请号：US12882712
申请日：2010-09-15
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： G03B27/58 , G03B27/62 , G02B7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

2. 发明授权

US06906783B2 System for using a two part cover for protecting a reticle 有权
标题翻译：使用两部分盖子保护标线的系统
公开(公告)号：US06906783B2
公开(公告)日：2005-06-14
申请号：US10369323
申请日：2003-02-20
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： B65G49/07 , G03B27/42 , G03B27/48 , G03B27/58 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

3. 发明授权

US07209220B2 System for using a two part cover for and a box for protecting a reticle 有权
标题翻译：使用两部分盖子和一个箱子保护标线的系统
公开(公告)号：US07209220B2
公开(公告)日：2007-04-24
申请号：US11299787
申请日：2005-12-13
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

4. 发明授权

US07830497B2 System and method for using a two part cover and a box for protecting a reticle 有权
标题翻译：使用两部分覆盖物和保护掩模版的盒子的系统和方法
公开(公告)号：US07830497B2
公开(公告)日：2010-11-09
申请号：US11785548
申请日：2007-04-18
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
IPC分类号： G03B27/32 , G03B27/52 , G03B27/62
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

5. 发明授权

US08446570B2 System and method for using a two part cover and a box for protecting a reticle 有权
标题翻译：使用两部分覆盖物和保护掩模版的盒子的系统和方法
公开(公告)号：US08446570B2
公开(公告)日：2013-05-21
申请号：US12882712
申请日：2010-09-15
申请人： Santiago Del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
发明人： Santiago Del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

6. 发明申请

US20130010277A1 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle 审中-公开
标题翻译：使用两部分盖子和保护标线盒的盒子的系统和方法
公开(公告)号：US20130010277A1
公开(公告)日：2013-01-10
申请号：US13618204
申请日：2012-09-14
申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
发明人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olsen , Jonathan H. Feroce
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

7. 发明授权

US06721389B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06721389B2
公开(公告)日：2004-04-13
申请号：US09934681
申请日：2001-08-23
申请人： Jan E. Van Der Werf , Mark Kroon , Wilhelmus C. Keur , Vadim Y. Banine , Hans Van Der Laan , Johannes H. J. Moors , Erik R. Loopstra
发明人： Jan E. Van Der Werf , Mark Kroon , Wilhelmus C. Keur , Vadim Y. Banine , Hans Van Der Laan , Johannes H. J. Moors , Erik R. Loopstra
IPC分类号： G03F720
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译：光刻投影设备包括用于提供波长λ1小于50nm的辐射投射光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。该装置还包括辐射传感器，其被定位成能够接收来自投影光束的辐射，所述传感器包括将波长λ1的入射辐射转换成二次辐射的辐射敏感材料; 以及能够检测从所述层出射的所述次级辐射的感测装置。

8. 发明授权

US06262796B1 Positioning device having two object holders 有权
标题翻译：具有两个物体支架的定位装置
公开(公告)号：US06262796B1
公开(公告)日：2001-07-17
申请号：US09180011
申请日：1998-10-29
申请人： Erik R. Loopstra , Gerrit M. Bonnema , Harmen K. Van Der Schoot , Gerjan P. Veldhuis , Yim-Bun P. Kwan
发明人： Erik R. Loopstra , Gerrit M. Bonnema , Harmen K. Van Der Schoot , Gerjan P. Veldhuis , Yim-Bun P. Kwan
IPC分类号： G03B2742
CPC分类号： G03F7/70733 , B23Q1/621 , B23Q1/623 , B23Q11/0032 , G03F7/70716 , G03F7/70741 , G03F7/7075 , G03F7/709 , H01L21/682
摘要： A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.
摘要翻译：定位装置具有第一和第二物体保持器，所述第一和第二物体保持器被引导到平行于X方向并且平行于与X方向垂直的Y方向延伸的引导表面，并且其可以在引导表面上从第一位置移动到通过位移系统的第二位置。位移系统包括第一位移单元和第二位移单元，物体保持器可以交替地联接到该位移单元。第一位移单元适于在第一位置执行第一物体保持器的第一系列定位步骤，并且用于将第一物体保持器从第一位置移动到第一位置和第二位置之间的中间位置。第二位移单元适于在与第一位移单元同时且独立于第二位置执行第二对象保持器的第二系列定位步骤，并且用于将第二物体保持器从第二位置移动到中间位置。在中间位置，更换物体保持器，之后可以通过第一位移单元执行第一系列定位步骤，使第二物体保持器处于第一位置，并且第二系列定位步骤可以由第二位移单元，其中第一对象保持器处于第二位置。该定位装置适用于光刻设备，以在曝光位置中与第一半导体衬底进行曝光处理，并且同时进行曝光处理，并且独立于此，具有表征位置的第二半导体衬底的表征过程。

9. 发明授权

US06226075B1 Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices 失效
标题翻译：配备有气体轴承的气弹簧的支撑装置以及设置有该支撑装置的光刻装置
公开(公告)号：US06226075B1
公开(公告)日：2001-05-01
申请号：US09110612
申请日：1998-07-06
申请人： Erik R. Loopstra , Peter Heiland
发明人： Erik R. Loopstra , Peter Heiland
IPC分类号： G03B2762
CPC分类号： F16C32/06 , F16C32/0603 , F16F15/022 , F16F15/0232 , G03F7/70691 , G03F7/70825
摘要： A supporting device (53) provided with a first part (69), a second part (71), and a gas spring (73) for supporting the second part relative to the first part parallel to a support direction (Z). The gas spring (73) comprises a pressure chamber (75) which is provided in an intermediate part (79) and is bounded by a piston (81) which is displaceable in the intermediate part (79) parallel to the support direction and is supported perpendicularly to the support direction by means of a static gas bearing (85). A stiffness of the supporting device parallel to the support direction is thus substantially entirely determined by a stiffness of the gas spring, and a low stiffness can be achieved through a suitable design of the gas spring. A transmission of vibrations directed parallel to the support direction from the first part to the second part is prevented as much as possible thereby. The invention also relates to a lithography device having a plurality of such supporting devices.
摘要翻译：具有第一部分（69），第二部分（71）和用于相对于第一部分平行于支撑方向（Z）支撑第二部分的气体弹簧（73）的支撑装置（53）。气弹簧（73）包括设置在中间部分（79）中且由中间部分（79）平行于支撑方向移动的活塞（81）限定的压力室（75），并被支撑通过静态气体轴承（85）垂直于支撑方向。因此，平行于支撑方向的支撑装置的刚度基本上完全由气弹簧的刚度决定，并且可以通过气弹簧的适当设计来实现低刚度。尽可能地防止从第一部分到第二部分平行于支撑方向引导的振动的传递。本发明还涉及具有多个这种支撑装置的光刻装置。

10. 发明授权

US06987278B2 Gas flushing system with recovery system for use in lithographic apparatus 失效
标题翻译：具有用于光刻设备的回收系统的气体冲洗系统
公开(公告)号：US06987278B2
公开(公告)日：2006-01-17
申请号：US10376640
申请日：2003-03-03
申请人： Erik R. Loopstra
发明人： Erik R. Loopstra
IPC分类号： G21G5/00 , G21G4/00 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70858 , G03F7/70866 , G03F7/70983
摘要： In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N2 by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.
摘要翻译：在使用相对较短波长的曝光辐射的光刻设备中，例如， 157或126nm，在设备的移动部件中或与其邻近的横梁的横跨两部分提供了N 2层的流动。层流比运动部件的最大速度快，空气的扩散速度更快，从而通过与空气混合使N 2 CO 2的污染最小化。可以通过提供隔板来确保层流，通过覆盖层流上或邻近层流中的组分中的粗糙或非平面表面并且通过提供空气动力学构件来将束路分割成单独的空间。

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