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1. 发明授权

US07057313B2 Cooling of voice coil motors 有权
标题翻译：音圈电机冷却
公开(公告)号：US07057313B2
公开(公告)日：2006-06-06
申请号：US10958402
申请日：2004-10-06
申请人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H. C. M. Schapendonk
发明人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H. C. M. Schapendonk
IPC分类号： H02K41/00
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70858 , G03F7/70875 , G03F7/70891 , H02K3/24 , H02K9/22 , H02K41/0356
摘要： A voice coil motor used, for example, in a positioning device associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use, for example, in a lithographic projection apparatus including a radiation system for supplying a projection beam of radiation, a first object table for holding a mask, a second object table for holding a substrate, a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and may be of a monolithic construction.
摘要翻译：一种音圈电机，例如在与第一物体台或第二物镜台相关联的定位装置中使用，其中线圈用与线圈热接触的冷却套冷却，冷却套包括至少一个通道为了循环冷却流体，该通道或每个通道被布置成基本上位于与线圈相邻的冷却套管的一部分中，以用于例如光刻投影设备，该光刻投影设备包括用于提供投影的辐射系统用于保持掩模的第一物体台，用于保持基板的第二物体台，用于将掩模的照射部分成像到基板的目标部分上的投影系统。冷却套可以由陶瓷材料形成，并且可以是整体结构。

2. 发明授权

US06635887B2 Positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的定位系统
公开(公告)号：US06635887B2
公开(公告)日：2003-10-21
申请号：US09725299
申请日：2000-11-29
申请人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
发明人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
IPC分类号： G01N2300
CPC分类号： G03F7/70716
摘要： A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
摘要翻译：诸如可以用于将可移动物体表定位在三个自由度中的定位系统。更具体地说，本发明涉及定位系统在包括用于提供投影射束的照明系统的光刻投影设备中的用途，用于保持掩模的第一物体台，用于保持衬底的第二可移动物体台，以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。

3. 发明授权

US06525803B2 Balanced positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的平衡定位系统
公开(公告)号：US06525803B2
公开(公告)日：2003-02-25
申请号：US09739097
申请日：2000-12-19
申请人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
发明人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
IPC分类号： G03B2742
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction forces are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
摘要翻译：平衡定位装置包括平衡块，该平衡块被支撑成能够在三个自由度中移动，例如X和Y平移以及围绕Z轴的旋转。这些自由度的驱动力直接作用在定位体和平衡块之间。由定位运动产生的反作用力导致平衡质量的相应运动，并且所有反作用力都保持在平衡定位系统内。平衡块可以是具有形成安装在相对侧的H驱动器的立柱的两个线性电动机的定子的矩形平衡框架。 H型驱动器的横梁跨过框架，并且定位的对象位于框架的中心开口内。

4. 发明授权

US06671036B2 Balanced positioning system for use in lithographic apparatus 有权
公开(公告)号：US06671036B2
公开(公告)日：2003-12-30
申请号：US10209926
申请日：2002-08-02
申请人： Yim Bun P. Kwan
发明人： Yim Bun P. Kwan
IPC分类号： G03B2758
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.

5. 发明授权

US06509951B2 Lithographic projection apparatus having a temperature controlled heat shield 有权
标题翻译：具有温度控制的热屏蔽的平版印刷设备
公开(公告)号：US06509951B2
公开(公告)日：2003-01-21
申请号：US09777697
申请日：2001-02-07
申请人： Erik R. Loopstra , Yim Bun P. Kwan , Marcel J. E. H. Muitjens , Sonja T. De Vrieze-Voorn
发明人： Erik R. Loopstra , Yim Bun P. Kwan , Marcel J. E. H. Muitjens , Sonja T. De Vrieze-Voorn
IPC分类号： G03B2752
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70858 , G03F7/70875 , G03F7/70891 , H02K3/24 , H02K9/22 , H02K41/0356
摘要： In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a temperature deviating from the predetermined value, or a supply of radiation that may deviate the temperature of the first part from the predetermined value when incident on the first part. Heat shield temperature controlling means are provided to control a temperature of the heat shield to the predetermined value.
摘要翻译：在光刻投影装置中，第一部分通过隔热罩与第二部分屏蔽。第一部分需要具有预定值的温度，并且第二部分具有可能影响第一部分的温度的特性。特征可以是偏离预定值的温度，或者当入射在第一部分上时可能使第一部分的温度偏离预定值的辐射供应。提供隔热板温度控制装置以将隔热板的温度控制到预定值。

6. 发明授权

US06262796B1 Positioning device having two object holders 有权
标题翻译：具有两个物体支架的定位装置
公开(公告)号：US06262796B1
公开(公告)日：2001-07-17
申请号：US09180011
申请日：1998-10-29
申请人： Erik R. Loopstra , Gerrit M. Bonnema , Harmen K. Van Der Schoot , Gerjan P. Veldhuis , Yim-Bun P. Kwan
发明人： Erik R. Loopstra , Gerrit M. Bonnema , Harmen K. Van Der Schoot , Gerjan P. Veldhuis , Yim-Bun P. Kwan
IPC分类号： G03B2742
CPC分类号： G03F7/70733 , B23Q1/621 , B23Q1/623 , B23Q11/0032 , G03F7/70716 , G03F7/70741 , G03F7/7075 , G03F7/709 , H01L21/682
摘要： A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.
摘要翻译：定位装置具有第一和第二物体保持器，所述第一和第二物体保持器被引导到平行于X方向并且平行于与X方向垂直的Y方向延伸的引导表面，并且其可以在引导表面上从第一位置移动到通过位移系统的第二位置。位移系统包括第一位移单元和第二位移单元，物体保持器可以交替地联接到该位移单元。第一位移单元适于在第一位置执行第一物体保持器的第一系列定位步骤，并且用于将第一物体保持器从第一位置移动到第一位置和第二位置之间的中间位置。第二位移单元适于在与第一位移单元同时且独立于第二位置执行第二对象保持器的第二系列定位步骤，并且用于将第二物体保持器从第二位置移动到中间位置。在中间位置，更换物体保持器，之后可以通过第一位移单元执行第一系列定位步骤，使第二物体保持器处于第一位置，并且第二系列定位步骤可以由第二位移单元，其中第一对象保持器处于第二位置。该定位装置适用于光刻设备，以在曝光位置中与第一半导体衬底进行曝光处理，并且同时进行曝光处理，并且独立于此，具有表征位置的第二半导体衬底的表征过程。

7. 发明授权

US07034920B2 Balanced positioning system for use in lithographic apparatus 有权
公开(公告)号：US07034920B2
公开(公告)日：2006-04-25
申请号：US10322800
申请日：2002-12-19
申请人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
发明人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
IPC分类号： G03B27/42 , G03B27/58 , H01L21/27
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.

8. 发明授权

US06924882B2 Balanced positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的平衡定位系统
公开(公告)号：US06924882B2
公开(公告)日：2005-08-02
申请号：US10649608
申请日：2003-08-28
申请人： Yim Bun P. Kwan
发明人： Yim Bun P. Kwan
IPC分类号： G03F7/22 , F16F15/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
摘要翻译：一种用于光刻设备的平衡定位系统，具有一对平衡块，该平衡块被支撑以能够在至少一个自由度（例如Y平移）中移动。在这种自由度下的相对定向的驱动力直接作用在被驱动体和平衡块之间，以使被驱动体围绕垂直于该一个方向的轴旋转。由定位运动产生的反作用力导致平衡块的直线运动，并且所有反作用力都保持在平衡的定位系统内。

9. 发明授权

US06852989B2 Positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的定位系统
公开(公告)号：US06852989B2
公开(公告)日：2005-02-08
申请号：US10648270
申请日：2003-08-27
申请人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
发明人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
IPC分类号： G12B5/00 , G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027 , H01L21/68 , G01N23/00 , A61N5/00 , B23Q1/25 , G03B27/42
CPC分类号： G03F7/70716
摘要： A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
摘要翻译：诸如可以用于将可移动物体表定位在三个自由度中的定位系统。更具体地说，本发明涉及定位系统在包括用于提供投影射束的照明系统的光刻投影设备中的用途，用于保持掩模的第一物体台，用于保持衬底的第二可移动物体台，以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。

10. 发明授权

US06657204B2 Cooling of voice coil motors in lithographic projection apparatus 失效
标题翻译：音圈投影仪中音圈电机的冷却
公开(公告)号：US06657204B2
公开(公告)日：2003-12-02
申请号：US09777701
申请日：2001-02-07
申请人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H.C.M. Schapendonk
发明人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H.C.M. Schapendonk
IPC分类号： G21K510
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70858 , G03F7/70875 , G03F7/70891 , H02K3/24 , H02K9/22 , H02K41/0356
摘要： A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use in a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a first object table for holding a mask; a second object table for holding a substrate; a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and preferably is of a monolithic construction.
摘要翻译：一种音圈电机，其用于与第一物体台或第二物体台相关联的定位装置中，其中线圈用与线圈热接触的冷却套冷却，冷却套包括至少一个通道，用于循环冷却流体，所述或每个通道被布置为基本上位于与线圈相邻的冷却套管的一部分中，用于光刻投影设备，包括：辐射系统，用于提供投影射束;第一物体用于保持掩模的表;用于保持基板的第二物镜台;用于将掩模的照射部分成像到基板的目标部分上的投影系统。冷却套可以由陶瓷材料形成，并且优选地是整体结构。

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