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1. 发明授权

US5369177A UV-stabilized polyoxymethylene molding materials 失效
标题翻译： UV稳定的聚甲醛成型材料
公开(公告)号：US5369177A
公开(公告)日：1994-11-29
申请号：US113094
申请日：1993-08-30
申请人： Sabine Kielhorn-Bayer , Hartmut Zeiner , Heiner Goerrissen , Dietrich Saenger
发明人： Sabine Kielhorn-Bayer , Hartmut Zeiner , Heiner Goerrissen , Dietrich Saenger
IPC分类号： C08K5/00 , C08L21/00 , C08L57/00 , C08L59/00 , C08L63/00 , C08L77/00 , C08L59/02 , C08L59/04
CPC分类号： C08K5/005 , C08L59/00 , C08L21/00 , C08L57/00 , C08L63/00 , C08L77/00
摘要： Thermoplastic molding materials containA) from 40 to 99.69% by weight of a polyoxymethylene homo- or copolymer,B) from 0.1 to 2% by weight of at least one stabilizer selected from the group consisting of benzotriazole derivatives or benzophenone derivatives or aromatic benzoate derivatives,C) from 0.1 to 2% by weight of at least one sterically hindered amino compound,D) from 0.005 to 2% by weight of a polyamide,E) from 0 to 2% by weight of an epoxy-containing compound,F) from 0 to 50% by weight of a toughened polymer andG) from 0 to 50% by weight of a fibrous or particulate filler or of a mixture thereof.
摘要翻译：热塑性成型材料包含A）40至99.69重量％的聚甲醛均聚物或共聚物，B）0.1至2重量％的至少一种选自苯并三唑衍生物或二苯甲酮衍生物或芳族苯甲酸酯衍生物的稳定剂 C）0.1至2重量％的至少一种空间位阻氨基化合物，D）0.005至2重量％的聚酰胺，E）0至2重量％的含环氧基的化合物，F） 0至50重量％的增韧聚合物和G）0至50重量％的纤维或颗粒填料或其混合物。

2. 发明授权

US4780498A Molding materials of polyoxymethylene homopolymers and/or copolymers and thermoplastic polyurethane elastomers having improved heat stability, their preparation and their use 失效
标题翻译：聚甲醛均聚物和/或共聚物和具有改进的热稳定性的热塑性聚氨酯弹性体的成型材料及其制备及其用途
公开(公告)号：US4780498A
公开(公告)日：1988-10-25
申请号：US77631
申请日：1987-07-24
申请人： Heiner Goerrissen , Dietrich Saenger , Wilhelm Schuette , Manfred Walter
发明人： Heiner Goerrissen , Dietrich Saenger , Wilhelm Schuette , Manfred Walter
IPC分类号： C08K3/34 , C08L59/00 , C08L75/00 , C08L75/04
CPC分类号： C08K3/34 , C08L59/00 , C08L75/04
摘要： Molding materials of(A) one or more polyoxymethylene homopolymers and/or copolymers and(B) one or more thermoplastic polyurethane elastomers,(C) with or without additives, contain, as an additive,(D) one or more alkaline earth metal silicates, advantageously in an amount of from 0.005 to 2% by weight, based on the weight of the components (A) and (B), for improving the heat stability, reducing the tendency to discoloration and minimizing the free formaldehyde content.To prepare the molding materials, the components (A), (B), (D) and, if required (C) are advantageously melted together in an extruder at from 150.degree. to 260.degree. C.The molding materials are useful for the production of films or moldings, which are used, for example, in the automotive, electrical appliances and electronics industries.
摘要翻译：（A）一种或多种聚甲醛均聚物和/或共聚物的成型材料和（B）一种或多种热塑性聚氨酯弹性体，（C）有或没有添加剂，含有（D）一种或多种碱土金属硅酸盐，有利地为基于组分（A）和（B）的重量的0.005-2重量％，用于改善热稳定性，降低变色的倾向和使游离甲醛含量最小化。为了制备模塑材料，组分（A），（B），（D）和（如果需要（C））有利地在150至260℃的挤出机中熔融在一起。成型材料可用于生产的电影或模制品，其用于例如汽车，电器和电子工业。

3. 发明授权

US4565771A Production of gravure printing plates having plastic printing layers 失效
标题翻译：生产具有塑料印刷层的凹版印刷版
公开(公告)号：US4565771A
公开(公告)日：1986-01-21
申请号：US525509
申请日：1983-08-22
申请人： John Lynch , Reinhold J. Leyrer , Dietrich Saenger
发明人： John Lynch , Reinhold J. Leyrer , Dietrich Saenger
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/38 , G03C5/16 , G03C1/495 , G03C1/72
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/2022 , G03F7/38 , Y10S430/128 , Y10S430/136
摘要： Gravure printing plates comprising a plastic printing layer applied on a printing plate base are produced by a method wherein a solid photosensitive layer (L) firmly bonded on the printing plate base is exposed imagewise to actinic light, and the exposed layer is washed out with a developer and then subjected to thermal hardening to form the plastic printing layer. In this process, the photosensitive layer (L) employed contains, as the photosensitive component, a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups, and a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with --COOH groups under the action of heat to form a covalent chemical bond. After imagewise exposure, the layer is either washed out with an aqueous developer, post-exposed uniformly to actinic light and then subjected to thermal hardening and crosslinking, or subjected to selective thermal hardening and crosslinking in the exposed areas and then washed out with a developer.
摘要翻译：通过以下方法制造包含印刷印版基板上的塑料印刷层的凹版印刷版，其中牢固地结合在印版基板上的固体感光层（L）以光化的方式成像曝光，并将曝光层用然后进行热硬化以形成塑料印刷层。在该方法中，使用的感光层（L）含有作为感光性成分的具有两个以上芳香族和/或杂芳族邻硝基甲醇酯基的化合物和具有两个以上反应性基团的化合物，能够在热作用下与-COOH基团反应形成共价的化学键。在成像曝光后，将该层用水性显影剂洗涤，均匀曝光至光化光，然后进行热硬化和交联，或在暴露的区域中进行选择性热硬化和交联，然后用显影剂。

4. 发明授权

US4456679A Production of relief images or resist images by a positive-working method 失效
标题翻译：通过积极的工作方式生产浮雕图像或抵抗图像
公开(公告)号：US4456679A
公开(公告)日：1984-06-26
申请号：US525395
申请日：1983-08-22
申请人： Reinhold J. Leyrer , Dietrich Saenger
发明人： Reinhold J. Leyrer , Dietrich Saenger
IPC分类号： G03C1/72 , G03F7/004 , G03F7/039 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/039 , Y10S522/904
摘要： Relief images or resist images are produced by a positive-working process, using a solid photosensitive resist layer which is applied to a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups and crosslinking compounds possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are then washed out with an aqueous developer, the remaining resist layer is post-exposed uniformly to actinic light and finally the post-exposed resist layer is thermally crosslinked and hardened.
摘要翻译：缓冲图像或抗蚀剂图像通过正性工艺制备，使用固体感光性抗蚀剂层，其施加于碱并含有具有两个或多个芳族和/或杂芳族邻硝基甲醇酯基团的化合物和具有两个或多个更多的反应性基团能够在热作用下与羧基反应形成共价的化学键。为了产生浮雕图像或抗蚀剂图像，首先将光敏抗蚀剂层成像曝光于光化光，然后用水性显影剂将该层的曝光区域洗出，将剩余的抗蚀剂层均匀曝光至光化反应后曝光抗蚀剂层热交联并硬化。

5. 发明授权

US4576902A Process of making and using a positive working photosensitive film resist material 失效
标题翻译：制造和使用正性感光膜抗蚀剂材料的工艺
公开(公告)号：US4576902A
公开(公告)日：1986-03-18
申请号：US678050
申请日：1984-12-04
申请人： Dietrich Saenger , Helmut Barzynski
发明人： Dietrich Saenger , Helmut Barzynski
IPC分类号： G03C1/72 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/16 , H01L21/027 , G03C5/00
CPC分类号： G03F7/039 , G03F7/161
摘要： A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.
摘要翻译：适用于多次成像曝光的正性感光性感光膜材料包括在尺寸稳定的基底膜上的感光性涂层，其包含（a）具有芳族或杂芳族邻硝基甲醇酯基团的聚合物（例如，硝基苄基丙烯酸酯单元），并且可以在暴露后用碱性溶剂洗涤，和（b）与（a）相容的透明增塑剂。该产品可用作生产电导体板，化学磨细细线部件和识别板中的光聚合物干膜抗蚀剂材料。

6. 发明授权

US4465760A Production of relief images or resist images by a negative-working method 失效
标题翻译：通过负面工作方法生产浮雕图像或抗蚀图像
公开(公告)号：US4465760A
公开(公告)日：1984-08-14
申请号：US525394
申请日：1983-08-22
申请人： Reinhold J. Leyrer , Dietrich Saenger , Uwe Klinsmann
发明人： Reinhold J. Leyrer , Dietrich Saenger , Uwe Klinsmann
IPC分类号： G03F7/038 , G03F7/004 , G03F7/039 , G03F7/20 , G03F7/38 , G03F7/10 , G03C1/495 , G03C1/71 , G03C5/16
CPC分类号： G03F7/2022 , G03F7/0045 , G03F7/039 , G03F7/38
摘要： Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.
摘要翻译：缓冲图像或抗蚀剂图像是通过负性工艺制造的，其中使用光敏抗蚀剂层，该光致抗蚀剂层施加在基底上并含有具有两个或更多个芳族和/或杂芳族邻硝基甲醇酯基团的化合物以及具有两个或多个反应性基团，其能够在热作用下与羧基反应形成共价的化学键。为了产生浮雕图像或抗蚀剂图像，首先将光敏抗蚀剂层成像曝光于光化光，该层的暴露区域进行选择性热硬化和交联，然后将抗蚀剂层均匀曝光至光化反应用含水显影剂洗掉。

7. 发明授权

US4239609A Photopolymerizable coating and recording materials containing a photoinitiator and an organic halogen compound 失效
标题翻译：含有光引发剂和有机卤素化合物的光聚合涂层和记录材料
公开(公告)号：US4239609A
公开(公告)日：1980-12-16
申请号：US974622
申请日：1978-12-27
申请人： Helmut Barzynski , Dietrich Saenger
发明人： Helmut Barzynski , Dietrich Saenger
IPC分类号： C08F2/00 , C08F2/46 , C08F2/50 , C08F4/32 , C09D4/00 , C09D5/00 , C09D11/00 , C09D11/10 , G03F7/029 , G03F7/031
CPC分类号： G03F7/0295 , C08F2/50 , G03F7/031
摘要： Photopolymerizable coating and recording materials, such as photopolymer dry film resist materials and photoresist materials, comprising at least one photopolymerizable olefinic compound, which materials contain, as activated photoinitiator system, a carbonyl compound that, when exposed to actinic light, forms free radicals which initiate polymerization, such as benzophenone and benzophenone derivatives, as well as a benzene compound having at least two dichloromethyl groups bound to the benzene nucleus, such as bis(dichloromethyl)-benzene and 2,5-dichloro-1,4-bis(dichloromethyl)benzene, and preferably also a dye which changes color in the presence of acid. The coating and recording materials of the invention exhibit improved curing when exposed to ultraviolet light for the usual periods and can be readily washed out with solvents without any damage to the exposed areas.
摘要翻译：可光聚合涂层和记录材料，例如光聚合物干膜抗蚀剂材料和光致抗蚀剂材料，其包含至少一种可光聚合的烯属化合物，该材料包含作为活化的光引发剂体系的羰基化合物，其在暴露于光化光时形成自由基，其起始例如二苯甲酮和二苯甲酮衍生物，以及具有与苯核结合的至少两个二氯甲基的苯化合物，例如双（二氯甲基） - 苯和2,5-二氯-1,4-双（二氯甲基）苯，优选还有在酸存在下改变颜色的染料。本发明的涂料和记录材料在常规时期暴露于紫外线时表现出改进的固化，并且可以容易地用溶剂洗涤而不会对暴露的区域造成任何损害。

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