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1. 发明授权

US11543394B2 Combined analyzer and analysis method 有权
公开(公告)号：US11543394B2
公开(公告)日：2023-01-03
申请号：US17186356
申请日：2021-02-26
申请人： SHIMADZU CORPORATION
发明人： Ryuta Shibutani , Kazuteru Takahashi
IPC分类号： G01N30/72 , G01N30/30 , G01N30/02
摘要： A combined analyzer includes a thermal analyzer, a trap, a gas chromatograph, a mass spectrometer, a first flow path to which a gas generated in the thermal analyzer is supplied, a second flow path that branches from the first flow path and is connected to the mass spectrometer, a third flow path that branches from the first flow path and is connected to the trap, a fourth flow path that connects the trap and a column included in the gas chromatograph, and a fifth flow path that connects the column and the mass spectrometer.

2. 发明授权

US09721776B2 Sample preparation method and sample preparation device for MALDI including depositing matrix substance on sample substrate in two steps 有权
公开(公告)号：US09721776B2
公开(公告)日：2017-08-01
申请号：US14781950
申请日：2014-04-04
申请人： SHIMADZU CORPORATION , KEIO UNIVERSITY
发明人： Koretsugu Ogata , Kazuteru Takahashi , Akiko Kubo , Makoto Suematsu , Takushi Yamamoto
IPC分类号： B05D1/02 , B05D3/10 , H01J49/04 , B05D1/00 , B05D7/00 , H01J49/00
CPC分类号： H01J49/0418 , B05D1/60 , B05D3/107 , B05D7/5483 , H01J49/0004
摘要： After a sample such as a biomedical tissue section is attached to an electrically-conductive slide glass (S1), the film layer of a matrix substance is appropriately formed by vapor deposition so as to cover the sample (S2). The crystal of the matrix substance in the film layer is very fine and uniform. Subsequently, the slide glass on which the matrix film layer is formed is placed in a vaporized solvent atmosphere, and the solvent infiltrates into the matrix film layer (S3). When the solvent sufficiently infiltrated is vaporized, a substance to be measured in the sample takes in the matrix and re-crystallized. Furthermore, the matrix film layer is formed again on the surface by the vapor deposition (S4). The added matrix film layer absorbs excessive energy of a laser beam during MALDI, which suppresses the denaturation of the substance to be measured and the like, so that high detection sensitivity can be achieved while high spatial resolution is maintained.

3. 发明授权

US11607701B2 Sample pretreatment device 有权
公开(公告)号：US11607701B2
公开(公告)日：2023-03-21
申请号：US16927283
申请日：2020-07-13
申请人： SHIMADZU CORPORATION
发明人： Kazuteru Takahashi , Kenta Terashima
IPC分类号： B05B15/522 , G01N1/31 , B05B15/555 , G01N35/10 , H01J49/04 , H01J49/16
摘要： Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit (3) including a solution tube (32) for the solution to pass through, a gas tube (33) for a spray gas to pass through, and a nozzle part (30) configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier (4, 41) configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.

4. 发明授权

US09757745B2 Matrix film deposition system 有权
公开(公告)号：US09757745B2
公开(公告)日：2017-09-12
申请号：US14798691
申请日：2015-07-14
申请人： Shimadzu Corporation
发明人： Kazuteru Takahashi
IPC分类号： B05B5/08 , B05B5/00 , B05B5/03 , B05D1/04 , B05B5/053 , B05B5/16 , B05C5/02 , H01J49/16 , H01J49/04
CPC分类号： B05B5/087 , B05B5/005 , B05B5/03 , B05B5/0535 , B05B5/16 , B05B5/1608 , B05C5/02 , B05C5/0208 , B05D1/04 , H01J49/0418 , H01J49/164
摘要： A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into the space between the two electrodes 120 and 130 by an electrospray method, the nozzle 110 arranged so that none of the electrodes 120 and 130 lies on the central axis A of a spray flow of the liquid; and an electric field creator 140 for creating, between the two electrodes 120 and 130, an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.

5. 发明申请

US20160167065A1 MATRIX FILM DEPOSITION SYSTEM 有权
标题翻译：矩阵膜沉积系统
公开(公告)号：US20160167065A1
公开(公告)日：2016-06-16
申请号：US14798691
申请日：2015-07-14
申请人： Shimadzu Corporation
发明人： Kazuteru Takahashi
IPC分类号： B05B5/08 , H01J49/16 , B05B5/03 , B05B5/00 , B05B5/16
CPC分类号： B05B5/087 , B05B5/005 , B05B5/03 , B05B5/0535 , B05B5/16 , B05B5/1608 , B05C5/02 , B05C5/0208 , B05D1/04 , H01J49/0418 , H01J49/164
摘要： A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into the space between the two electrodes 120 and 130 by an electrospray method, the nozzle 110 arranged so that none of the electrodes 120 and 130 lies on the central axis A of a spray flow of the liquid; and an electric field creator 140 for creating, between the two electrodes 120 and 130, an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.
摘要翻译：提供一种能够沉积含有少量杂质（例如中性粒子）的基质膜的系统。该系统包括：第一板状电极120，其具有附着表面，样品板P将要安装在该附着表面上; 布置成面向所述附接表面的第二平板电极130; 用于通过电喷雾方法将含有基质物质的液体喷射到两个电极120和130之间的空间中的喷嘴110，喷嘴110布置成使得电极120和130中没有一个位于中心轴线A上，液体; 以及电场产生器140，用于在两个电极120和130之间产生用于迫使包含在含有基质物质的液体的喷射流中的带电荷的液滴朝向附着表面移动的电场。

6. 发明授权

US09679755B2 Ionization apparatus 有权
公开(公告)号：US09679755B2
公开(公告)日：2017-06-13
申请号：US15049366
申请日：2016-02-22
申请人： SHIMADZU CORPORATION
发明人： Yusuke Tateishi , Kazuteru Takahashi , Hideki Sato
IPC分类号： H01J49/10 , H01J49/14
CPC分类号： H01J49/147 , H01J27/024 , H01J27/205 , H01J49/067 , H01J49/145
摘要： In an ion source 3 in which a repeller electrode 32 for forming a repelling electric field that repels ions toward an ion emission port 311 is provided inside of an ionization chamber 31, ion focusing electrodes 36 and 37 are respectively arranged between an electron introduction port 312 and a filament 34 and between an electron discharge port 313 and a counter filament 35. An electric field formed by applying a predetermined voltage to each of the ion focusing electrodes 36 and 37 intrudes into the ionization chamber 31 through the electron introduction port 312 and the electron discharge port 313, and becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamber 31 receive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission port 311 while approaching the ion optical axis C. Accordingly, the amount of ions sent out from the ion emission port increases. Further, even if a charge-up phenomenon occurs, the ion trajectories less easily change, and the stability of the sensitivity can be enhanced.

7. 发明授权

US09334569B2 Sample preparation device to form a matrix film for matrix assisted laser desorption/ionization method 有权
标题翻译：用于形成基质辅助激光解吸/电离方法的基质膜的样品制备装置
公开(公告)号：US09334569B2
公开(公告)日：2016-05-10
申请号：US13674745
申请日：2012-11-12
申请人： SHIMADZU CORPORATION
发明人： Kazuteru Takahashi , Kiyoshi Ogawa
IPC分类号： C23C14/54 , C23C14/24 , G01B11/06 , C23C16/52 , C23C14/12
CPC分类号： C23C16/52 , C23C14/12 , C23C14/24 , C23C14/54 , C23C14/547 , C23C14/548 , G01B11/0625
摘要： To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unit 23 for supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition source 21 for a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention means 23a for preventing the matrix substance that has flown off from the above-described vapor deposition source 21 from adhering to the above-described light amount measurement unit.
摘要翻译：提供适于通过真空气相沉积形成用于MALDI的基质膜的样品制备装置。样品制备装置具有：样品基板支撑单元23，用于在基板S上支撑待分析物质，使得物质面向基质物质J的气相沉积源21; 光量测量单元，其用测量光对角地照射沉积在基板S上的基质膜蒸气并检测已经透射或已经从上述矩阵膜反射的测量光的量; 以及用于防止从上述蒸镀源21流出的基质物质粘附于上述光量测定单元的防附着装置23a。

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