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    • 5. 发明授权
    • Ramping pass voltage to enhance channel boost in memory device
    • 缓存通过电压以增强存储器件中的通道升压
    • US08644075B2
    • 2014-02-04
    • US13955597
    • 2013-07-31
    • SanDisk Technologies Inc.
    • Gerrit Jan HeminkShih-Chung LeeAnubhav KhandelwalHenry ChinGuirong LiangDana Lee
    • G11C11/34
    • G11C16/3427G11C16/10
    • In a non-volatile storage system, first and second substrate channel regions for an unselected NAND string are boosted during programming to inhibit program disturb. The first and second substrate channel regions are created on either side of an isolation word line. During a program pulse time period in which a program pulse is applied to a selected word line, a voltage applied to an unselected word line which extends directly over the second channel region is stepped up to a respective pre-program pulse voltage, at a faster rate at which a voltage applied to an unselected word line which extends directly over the first channel region is stepped up to a respective pre-program pulse voltage. This helps improve the isolation between the channel regions.
    • 在非易失性存储系统中,用于未选择的NAND串的第一和第二衬底沟道区在编程期间被增强以抑制编程干扰。 第一和第二衬底沟道区域在隔离字线的任一侧上产生。 在将编程脉冲施加到所选字线的编程脉冲时间段期间,施加到直接在第二通道区域上延伸的未选择字线的电压以更快的速度升高到相应的预编程脉冲电压 施加到直接在第一通道区域上延伸的未选择字线的电压的速率被升高到相应的预编程脉冲电压。 这有助于改善通道区域之间的隔离。
    • 10. 发明授权
    • Erase speed adjustment for endurance of non-volatile storage
    • 擦除非易失性存储的耐久性的速度调整
    • US09224494B2
    • 2015-12-29
    • US14152834
    • 2014-01-10
    • SanDisk Technologies Inc.
    • Henry ChinDana Lee
    • G11C11/34G11C16/34G11C16/04G11C13/00G11C16/14G11C16/00G11C16/16
    • G11C16/3454G11C13/0097G11C16/00G11C16/0483G11C16/14G11C16/16G11C16/3445
    • Techniques are disclosed herein for erasing non-volatile storage. The erase has two or more phases. The first phase includes erasing a group of non-volatile storage elements at a first speed until the group of non-volatile storage elements pass a first verify level. The second phase is performed after the group of non-volatile storage elements pass the first verify level. The second phase includes erasing the group of non-volatile storage elements at a second speed that is less than the first speed until the group of non-volatile storage elements pass a second verify level that is lower than the first verify level. Erasing at the first speed results in a fast erase without significant risk of over-erasing the storage elements. Erasing at the second speed during the second phase prevents or reduces over-erasure which could damage the storage elements.
    • 本文公开了用于擦除非易失性存储器的技术。 擦除有两个或多个阶段。 第一阶段包括以第一速度擦除一组非易失性存储元件,直到非易失性存储元件组通过第一验证电平。 在非易失性存储元件组通过第一验证级别之后执行第二阶段。 第二阶段包括以小于第一速度的第二速度擦除非易失性存储元件组,直到非易失性存储元件组通过低于第一验证电平的第二验证电平。 以第一速度擦除会导致快速擦除,而不会有过度擦除存储元件的重大风险。 在第二阶段以第二速度擦除可防止或减少可能损坏存储元件的过度擦除。