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    • 8. 发明申请
    • ELECTRO-COPPER PLATING APPARATUS
    • 电镀铜装置
    • US20140069805A1
    • 2014-03-13
    • US13842947
    • 2013-03-15
    • SAMSUNG ELECTRO-MECHANICS CO., LTD.
    • Hyo Seung NAMMi Geum KIM
    • C25D3/38
    • C25D3/38C25D17/10C25D21/18
    • Disclosed herein is an electro-copper plating apparatus in which a cathode, an insoluble anode, a copper ball, and a plating solution are included in a single bath, wherein the plating solution includes manganese oxide; or an electro-copper plating apparatus including: a main bath including a cathode, an insoluble anode, and a plating solution; and a dissolution bath including a copper ball, and manganese oxide. According to the present invention, the manganese oxide having higher oxidation-reduction potential instead of using Fe3+ of the related art as the copper source in the electro-copper plating apparatus may be used to obtain a high effect in suppressing surface plating even at a low concentration.
    • 这里公开了一种电镀铜装置,其中阴极,不溶性阳极,铜球和电镀液包含在单个浴中,其中电镀溶液包括氧化锰; 或电镀铜装置,其包括:主阴极,不溶性阳极和电镀液; 以及包含铜球和氧化锰的溶解浴。 根据本发明,可以使用具有较高氧化还原电位的氧化还原电位而不是使用现有技术的Fe 3+作为电镀铜装置中的铜源的氧化锰,以获得即使在低电平下也能抑制表面电镀的高效果 浓度。