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    • 8. 发明授权
    • Solid-state imaging device and camera having the same
    • 固态成像装置和具有相同功能的相机
    • US07863661B2
    • 2011-01-04
    • US12054038
    • 2008-03-24
    • Motonari KatsunoRyohei MiyagawaHirohisa Ohtsuki
    • Motonari KatsunoRyohei MiyagawaHirohisa Ohtsuki
    • H01L29/72
    • H01L27/14603H01L27/14609
    • Provided is a solid-state imaging device including unit pixels, wherein the unit pixels include two kinds of unit pixels including a first unit pixel and a second unit pixel that are formed on a common well on a semiconductor substrate. The first unit pixel includes: at least one photoelectric conversion region which converts light into a signal charge; the first semiconductor region that is formed on the common well and has a conductivity type identical to that of the common well; and the first contact electrically connected to the first semiconductor region. The second unit pixel includes: at least one photoelectric conversion region; the second semiconductor region that is formed on the common well and has a conductivity type opposite to that of the common well; and the second contact electrically connected to the second semiconductor region.
    • 提供了一种包括单位像素的固态成像装置,其中单位像素包括形成在半导体衬底上的公共阱上的包括第一单位像素和第二单位像素的两种单位像素。 第一单位像素包括:将光转换成信号电荷的至少一个光电转换区域; 所述第一半导体区域形成在所述共同阱上并且具有与所述公用阱的导电类型相同的导电类型; 并且所述第一触点电连接到所述第一半导体区域。 第二单位像素包括:至少一个光电转换区域; 所述第二半导体区域形成在所述公井上,并且具有与所述公共井的导电类型相反的导电类型; 并且所述第二触点电连接到所述第二半导体区域。
    • 9. 发明申请
    • SOLID-STATE IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
    • 固态图像传感器及其制造方法
    • US20090278181A1
    • 2009-11-12
    • US12434474
    • 2009-05-01
    • Shouzi TANAKARyohei Miyagawa
    • Shouzi TANAKARyohei Miyagawa
    • H01L31/112H01L21/265
    • H01L27/14603H01L21/26586H01L27/1463H01L27/14689
    • A solid-state image sensor includes: a trench isolation region; a photodiode region for converting incident light to signal charges and accumulating the signal charges therein; a floating diffusion region for accumulating the signal charges of the photodiode region; a gate electrode formed over the element formation region located between the photodiode region and the floating diffusion region, and formed so that both ends of the gate electrode respectively overlap a part of the photodiode region and a part of the floating diffusion region; and an inactive layer formed in a region located in a bottom portion and sidewall portions of the trench isolation region. An impurity concentration in a region located under the gate electrode in the inactive layer is lower than that in a region other than the region located under the gate electrode in the inactive layer.
    • 固态图像传感器包括:沟槽隔离区域; 用于将入射光转换为信号电荷并在其中累积信号电荷的光电二极管区域; 用于累积光电二极管区域的信号电荷的浮动扩散区域; 栅电极,形成在位于光电二极管区域和浮动扩散区域之间的元件形成区域上,并且形成为使得栅电极的两端分别与光电二极管区域的一部分和浮动扩散区域的一部分重叠; 以及形成在位于沟槽隔离区域的底部和侧壁部分中的区域中的非活性层。 在非活性层中位于栅电极下方的区域中的杂质浓度低于非活性层中位于栅电极下方的区域以外的区域中的杂质浓度。