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1. 发明授权

US06803546B1 Thermally processing a substrate 失效
标题翻译：热处理基材
公开(公告)号：US06803546B1
公开(公告)日：2004-10-12
申请号：US09611349
申请日：2000-07-06
申请人： Ryan C Boas , Ajit Balakrishna , Benjamin Bierman , Brian L Haas , Dean Jennings , Wolfgang Aderhold , Sundar Ramamurthy , Abhilash Mayur
发明人： Ryan C Boas , Ajit Balakrishna , Benjamin Bierman , Brian L Haas , Dean Jennings , Wolfgang Aderhold , Sundar Ramamurthy , Abhilash Mayur
IPC分类号： F27B514
CPC分类号： C30B25/10 , C30B31/12 , H01L21/67109 , H01L21/67115 , H01L21/67248
摘要： A thermal processing method is described in which a temperature response of a substrate may be controlled during a heat-up phase or a cool-down phase, or during both phases. This reduces the thermal budget of the substrate and improves the quality and performance of devices formed on the substrate. In particular, by controlling the rate of heat transfer between the substrate and a thermal reservoir (e.g., a water-cooled reflector plate assembly), the temperature response of the substrate may be controlled during the thermal process. The rate of heat transfer may be changed by changing the thermal conductivity between the substrate and the thermal reservoir, by changing the emissivity of a surface of the thermal reservoir, or by changing the distance between the substrate and the thermal reservoir.
摘要翻译：描述了一种热处理方法，其中可以在加热阶段或冷却阶段期间或在两个阶段期间控制衬底的温度响应。这降低了基板的热预算，并改善了在基板上形成的器件的质量和性能。特别地，通过控制基板和热储存器（例如，水冷反射板组件）之间的热传递速率，可以在热处理期间控制基板的温度响应。可以通过改变基底和热储层之间的热导率，改变热储层表面的发射率，或通过改变基底和热储层之间的距离来改变传热速率。

2. 发明授权

US06395363B1 Sloped substrate support 失效
标题翻译：倾斜基板支撑
公开(公告)号：US06395363B1
公开(公告)日：2002-05-28
申请号：US08743308
申请日：1996-11-05
申请人： David S. Ballance , Benjamin Bierman , Robert M. Haney , David W. LaCourt
发明人： David S. Ballance , Benjamin Bierman , Robert M. Haney , David W. LaCourt
IPC分类号： C23C1600
CPC分类号： H01L21/68735 , H01L21/68757 , Y10T428/21 , Y10T428/213 , Y10T428/216 , Y10T428/218 , Y10T428/219 , Y10T428/31663
摘要： A substrate support comprising a shelf having a surface sloped at an angle such that the support contacts the substrate substantially at an edge portion of the substrate. The angle of the shelf is greater than an angle of the edge portion of the substrate. The surface of the shelf may be machined or polished to improve its smoothness. The substrate support thereby reduces the effect and severity of scratches on the substrate caused by the support. As a result, the substrate support improves substrate yield.
摘要翻译：一种基板支撑件，其包括具有以一定角度倾斜的表面的搁架，使得支撑件基本上在基板的边缘部分处接触基板。搁板的角度大于基板的边缘部分的角度。搁板的表面可以被加工或抛光以提高其平滑度。衬底支撑件因此降低了由支撑件引起的衬底划伤的影响和严重性。结果，衬底支撑物改善了衬底产量。

3. 发明授权

US6035100A Reflector cover for a semiconductor processing chamber 失效
标题翻译：用于处理衬底同时减少反射器上的沉积的装置和方法
公开(公告)号：US6035100A
公开(公告)日：2000-03-07
申请号：US858089
申请日：1997-05-16
申请人： Benjamin Bierman , David S. Ballance , James V. Tietz , Brian Haas , Meredith J. Williams , Paul Deaton
发明人： Benjamin Bierman , David S. Ballance , James V. Tietz , Brian Haas , Meredith J. Williams , Paul Deaton
IPC分类号： G01J5/00 , H01L21/00 , H01L21/26 , F27B5/08 , F27B5/14 , H01L21/324
CPC分类号： H01L21/67017 , G01J5/0003
摘要： In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.
摘要翻译：在一个实施例中，本发明涉及一种用于防止在处理室中的反射器上发生沉积的装置，包括：邻近反射器布置的盖，所述盖在反射器反射的波长范围内可光学透明; 以及用于保持盖相对于反射器的位置的至少一个盖支撑件。

4. 发明授权

US6157106A Magnetically-levitated rotor system for an RTP chamber 失效
标题翻译：用于RTP室的磁悬浮转子系统
公开(公告)号：US6157106A
公开(公告)日：2000-12-05
申请号：US879497
申请日：1997-05-16
申请人： James V. Tietz , Benjamin Bierman
发明人： James V. Tietz , Benjamin Bierman
IPC分类号： H01L21/205 , H01L21/00 , H01L21/26 , H01L21/687 , H02K7/09
CPC分类号： H01L21/68785 , F16C32/047 , H01L21/68792
摘要： Accomodations for a magnetically levitated rotating system in an RTP chamber are provided. The system includes a magnetically permeable rotor; a cylindrical thin wall concentric with and surrounding the rotor; and a magnetic stator assembly adjacent the cylindrical thin wall. The radial distance between the rotor and the magnetic stator assembly is small enough that a magnetic field created by the stator assembly magnetically levitates the rotor but is great enough that the rotor does not physically contact the thin wall upon thermal expansion. The system is such that the relative positions of a plurality of sensors which determine the position of a rotating frame is maintained upon dismantling. Thermal isolation of the area including the rotor is accomplished from the reactive gases in a processing area of the RTP chamber. The rotor may be cooled by a number of cooling chambers formed within the chamber.
摘要翻译：提供了一个用于RTP室中的磁悬浮旋转系统的住宿。该系统包括导磁转子; 与转子同心并围绕转子的圆柱形薄壁; 以及邻近圆柱形薄壁的磁性定子组件。转子和磁性定子组件之间的径向距离足够小，使得由定子组件产生的磁场使转子磁悬浮，但足够大，使得转子在热膨胀时不与薄壁物理接触。该系统使得在拆卸时保持确定旋转框架的位置的多个传感器的相对位置。包括转子在内的区域的热隔离由RTP室的处理区域内的反应性气体完成。转子可以由在室内形成的多个冷却室冷却。

5. 发明授权

US06133152A Co-rotating edge ring extension for use in a semiconductor processing chamber 失效
标题翻译：用于半导体处理室的同向旋转边缘环延伸
公开(公告)号：US06133152A
公开(公告)日：2000-10-17
申请号：US880194
申请日：1997-05-16
申请人： Benjamin Bierman , Meredith J. Williams , David S. Ballance , Brian Haas , Paul Deaton , James V. Tietz
发明人： Benjamin Bierman , Meredith J. Williams , David S. Ballance , Brian Haas , Paul Deaton , James V. Tietz
IPC分类号： H01L21/205 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/48 , C30B25/12 , C30B25/14 , H01L21/26 , H01L21/687 , H01L21/302
CPC分类号： C23C16/45521 , C23C16/4401 , C23C16/4584 , C23C16/481 , C30B25/12 , C30B25/14 , H01L21/68735 , H01L21/68785 , H01L21/68792
摘要： An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.
摘要翻译：一种用于隔离处理室中的旋转框架的装置，包括：可旋转地从所述旋转框架延伸的支撑筒; 以及从所述支撑筒延伸到至少一个基本上热，光学和机械地将所述共旋转边缘环延伸部上方的区域与所述同向旋转边缘环延伸部下方的区域隔开的共同旋转边缘环延伸。

6. 发明授权

US6123766A Method and apparatus for achieving temperature uniformity of a substrate 失效
标题翻译：用于实现基板的温度均匀性的方法和装置
公开(公告)号：US6123766A
公开(公告)日：2000-09-26
申请号：US872123
申请日：1997-05-16
申请人： Meredith J. Williams , David S. Ballance , Benjamin Bierman , Paul Deaton , Brian Haas , Nobuyuki Takahashi , James V. Tietz
发明人： Meredith J. Williams , David S. Ballance , Benjamin Bierman , Paul Deaton , Brian Haas , Nobuyuki Takahashi , James V. Tietz
IPC分类号： C23C16/46 , C30B25/10 , C30B25/16
CPC分类号： C23C16/46 , C30B25/10 , C30B25/16 , Y10T117/1008
摘要： A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.
摘要翻译：一种用于控制处理室中的衬底的温度的方法。处理室采用对至少两个加热区的加热控制。根据与衬底温度和用户可定义的偏移相对应的测量信号，每个加热区可独立控制。

7. 发明授权

US5879128A Lift pin and support pin apparatus for a processing chamber 失效
标题翻译：用于处理室的提升销和支撑销装置
公开(公告)号：US5879128A
公开(公告)日：1999-03-09
申请号：US687165
申请日：1996-07-24
申请人： James V. Tietz , Benjamin Bierman
发明人： James V. Tietz , Benjamin Bierman
IPC分类号： H01L21/683 , H01L21/26 , H01L21/687 , B05C13/00
CPC分类号： H01L21/68742 , Y10S414/135 , Y10S414/139
摘要： A substrate support mechanism including a housing made of a magnetically permeable material; a pin located substantially within the housing and having an upper end extending up into a passage which extends up through the bottom of the chamber and into the cavity which contains a substrate during processing; a first magnet assembly on the inside of the housing and mounted on the pin; a carriage structure located outside of the housing; and a second magnet assembly mounted on the carriage structure, wherein the first and second magnet assemblies are positioned relative to each other so that the second magnet assembly causes the pin and the first magnet assembly to magnetically levitate within the housing.
摘要翻译：一种衬底支撑机构，包括由导磁材料制成的壳体; 销基本上位于壳体内，并且具有向上延伸到通道的上端的上端，该通道在处理期间向上延伸穿过腔室的底部并进入包含衬底的空腔中; 位于壳体内部并安装在销上的第一磁体组件; 位于壳体外部的托架结构; 以及安装在所述滑架结构上的第二磁体组件，其中所述第一和第二磁体组件相对于彼此定位，使得所述第二磁体组件引起所述销和所述第一磁体组件在所述壳体内磁悬浮。

8. 发明授权

US5781693A Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween 失效
标题翻译：气体导入用于具有上透明板和下透明板的RTP室的喷淋头，并且其间流动气体流
公开(公告)号：US5781693A
公开(公告)日：1998-07-14
申请号：US687150
申请日：1996-07-24
申请人： David S. Ballance , Benjamin Bierman , James V. Tietz
发明人： David S. Ballance , Benjamin Bierman , James V. Tietz
IPC分类号： B01J4/00 , C23C16/44 , C23C16/455 , C23C16/458 , C23C16/48 , C23F4/00 , C30B25/10 , C30B25/14 , C30B31/12 , C30B31/16 , H01L21/205 , H01L21/22 , H01L21/302 , H01L21/3065 , H01L21/20
CPC分类号： C23C16/45574 , C23C16/45565 , C23C16/4584 , C23C16/481 , C30B25/10 , C30B25/14 , C30B31/12 , C30B31/16
摘要： A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a high intensity source which emits radiation that heats a substrate within the chamber, the showerhead including a top window on a side of the showerhead that is adjacent to the lamp head; a bottom window on a side of the showerhead that is adjacent to the substrate during processing; and a gas supply inlet through which a gas is introduced into a space between the top and bottom windows, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.
摘要翻译：一种与热处理室中的灯头一起使用的喷头，所述灯头包括发射辐射的高强度源，所述辐射辐射加热所述腔室内的衬底，所述喷头包括位于所述淋浴头侧面上的顶部窗口，灯头; 在处理过程中在喷头的与衬底相邻的一侧上的底部窗口; 以及气体供给入口，通过所述气体供给入口将气体引入到所述顶部和底部窗口之间的空间中，其中所述顶部和底部窗口对于来自所述灯头中的所述源的辐射是透明的，并且其中所述底部窗口包括多个气体分布气体从顶部和底部窗口之间的空间注入到腔室中。

9. 发明授权

US6090210A Multi-zone gas flow control in a process chamber 失效
标题翻译：处理室中的多区域气体流量控制
公开(公告)号：US6090210A
公开(公告)日：2000-07-18
申请号：US690265
申请日：1996-07-24
申请人： David S. Ballance , Benjamin Bierman , James V. Tietz
发明人： David S. Ballance , Benjamin Bierman , James V. Tietz
IPC分类号： B01J4/00 , C23C16/44 , C23C16/455 , C23C16/48 , C23F4/00 , C30B25/14 , C30B31/16 , H01L21/205 , H01L21/22 , H01L21/302 , H01L21/3065 , C23C16/00 , F27B5/04 , F27B5/16
CPC分类号： C23C16/45574 , C23C16/45565 , C23C16/45572 , C23C16/481 , C30B25/14 , C30B31/16 , H01L21/67115
摘要： A showerhead for introducing gas from one or more external supplies into a substrate processing chamber, the showerhead including a faceplate including a plurality of gas injection ports through which gas is injected into the chamber, wherein the plurality of gas injection ports includes a first subset of gas injection ports and a second subset of gas injection ports; a first gas distribution system which during use delivers a first gas to the first subset of injection ports for injection into the chamber; and a second gas distribution system which during use delivers a second gas to the second subset of injection ports for injection into the chamber.
摘要翻译：一种用于将气体从一个或多个外部供应引入基板处理室的喷头，所述喷头包括面板，所述面板包括多个气体注入口，气体通过所述气体注入口注入到所述室中，其中所述多个气体注入端口包括：气体注入口和气体注入口的第二子集; 第一气体分配系统，其在使用期间将第一气体输送到用于喷射到所述室中的所述注入口的第一子集; 以及第二气体分配系统，其在使用期间将第二气体输送到用于喷射到室中的第二注入口子集。

10. 发明授权

US5960555A Method and apparatus for purging the back side of a substrate during chemical vapor processing 失效
标题翻译：用于在化学气相处理期间净化衬底的背面的方法和装置
公开(公告)号：US5960555A
公开(公告)日：1999-10-05
申请号：US858091
申请日：1997-05-16
申请人： Paul Deaton , Benjamin Bierman , Meredith J. Williams , Brian Haas , David S. Ballance , James V. Tietz
发明人： Paul Deaton , Benjamin Bierman , Meredith J. Williams , Brian Haas , David S. Ballance , James V. Tietz
IPC分类号： H01L21/683 , C23C16/44 , C23C16/455 , H01L21/205 , H01L21/26 , H01L21/31 , F26B11/18
CPC分类号： C23C16/45521 , C23C16/455
摘要： An apparatus for purging the backside of a substrate in a process chamber includes a purge gas injector. The injector includes a substantially annular-shaped opening providing a slit that is structured and arranged to direct a flow of purge gas about radially outward therefrom in a direction approximately parallel to a plane defined by the substrate, wherein the substrate is supported in the process chamber above the purge gas injector. When the substrate is rotated at a sufficient speed, the purge gas flowing from the injector is impelled to flow spirally outward along the backside of the substrate.
摘要翻译：用于清洗处理室中的衬底背面的装置包括净化气体注入器。喷射器包括大致环形的开口，其提供狭缝，该狭缝被构造和布置成沿着大致平行于由衬底限定的平面的方向引导吹扫气体的径向向外流动，其中衬底被支撑在处理室在吹扫气体喷射器之上。当衬底以足够的速度旋转时，从注射器流出的吹扫气体被推动沿着衬底的背面螺旋地向外流动。

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