会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • Drum Pallet
    • 鼓盘
    • US20100251940A1
    • 2010-10-07
    • US12753224
    • 2010-04-02
    • David Paul JonesRoy Lee Fehrman, JR.
    • David Paul JonesRoy Lee Fehrman, JR.
    • B65D19/38B65D19/04
    • B65D19/004B65D71/70B65D2519/00034B65D2519/00069B65D2519/00268B65D2519/00288B65D2519/00318B65D2519/00338B65D2519/00815B65D2519/0094B65D2519/00965
    • A one-piece pallet for securing and stacking drums thereon may include a tray having downwardly and inwardly tapering peripheral side walls, a top surface having a plurality of raised support surfaces, each shaped to engage a bottom of a container, a plurality of raised dividers, each of said dividers being positioned between adjacent support surfaces and being shaped to engage a side wall of a drum resting on said adjacent support surfaces. The side walls may have outer raised ribs terminating adjacent one of the support surfaces and shaped to engage a side wall of a drum resting on said adjacent one of said support surfaces. The dividers may include inner raised ribs having terminal portions opposite the terminal portions of the outer raised ribs such that a drum resting on any one of said support surfaces is constrained by the terminal portions of the inner and outer raised ribs from lateral movement relative to the tray. Support pedestals extend from a bottom surface of the tray, and the pedestals each include an arcuate groove shaped to engage an upper periphery of a drum that may facilitate stacking of the pallet.
    • 用于在其上固定和堆叠鼓的一体式托盘可以包括具有向下且向内渐缩的周边侧壁的托盘,顶表面具有多个凸起的支撑表面,每个凸起的支撑表面成形为接合容器的底部,多个升高的​​分隔件 每个所述分隔件定位在相邻的支撑表面之间并且成形为接合放置在所述相邻支撑表面上的鼓的侧壁。 所述侧壁可以具有与所述支撑表面中的一个相邻的外部凸起肋,并且成形为接合在所述相邻的一个所述支撑表面上的鼓的侧壁。 分隔件可以包括内部凸起凸起,其具有与外部凸起肋的末端部分相对的端部部分,使得搁置在任何一个所述支撑表面上的滚筒被内部和外部凸起的肋的端部部分相对于相对于 托盘。 支撑座从托盘的底部表面延伸,并且基座各自包括弓形凹槽,该弓形凹槽成形为接合滚筒的上周边,其可以有利于托盘的堆叠。
    • 10. 发明授权
    • Top drain MOSgated device and process of manufacture therefor
    • 顶漏MOS器件及其制造工艺
    • US07439580B2
    • 2008-10-21
    • US11217870
    • 2005-09-01
    • Daniel M. KinzerDavid Paul JonesKyle Spring
    • Daniel M. KinzerDavid Paul JonesKyle Spring
    • H01L29/94H01L29/76
    • H01L29/781H01L29/66734
    • A trench type top drain MOSgated device has a drain electrode on the die top and a source electrode on the die bottom surface. The device is turned on by a control voltage connected between a drain and a gate region. The device cell has a body short trench and a gate trench. Gate poly is disposed in the bottom of the gate trench and is disposed adjacent a thin gate oxide lining a channel region with minimum overlap of the drain drift region. The bottom of the body short trench contains a contact which shorts the body region to the channel region. The body short, top drain region and gate polysilicon are simultaneously silicided. The gate trench is widened at its top to improve Qgd characteristics. Both the body short trench and gate trench are simultaneously filled with gap fill material.
    • 沟槽型顶漏MOS器件在管芯顶部具有漏极电极,在管芯底表面上具有源电极。 该器件通过连接在漏极和栅极区域之间的控制电压而导通。 器件单元具有主体短沟槽和栅极沟槽。 栅极多晶硅设置在栅极沟槽的底部,并且与漏极漂移区域的重叠最小重叠的沟道区域邻近设置在薄栅极氧化物附近。 身体短沟槽的底部包含一个将身体区域缩短到通道区域的接触件。 主体短路,顶漏区和栅极多晶硅同时被硅化。 栅极沟槽在其顶部被加宽以改善Q特性。 主体短沟槽和栅极沟槽都同时填充间隙填充材料。