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    • 7. 发明授权
    • Rare earth enhanced high electron mobility transistor and method for fabricating same
    • 稀土增强型高电子迁移率晶体管及其制造方法
    • US08269253B2
    • 2012-09-18
    • US12455933
    • 2009-06-08
    • Ronald H. Birkhahn
    • Ronald H. Birkhahn
    • H01L31/102
    • H01L29/7787H01L29/2003H01L29/207H01L29/66462
    • According to one embodiment, a high electron mobility transistor (HEMT) comprises an insulator layer comprising a first group III-V intrinsic layer doped with a rare earth additive. The HEMT also comprises a second group III-V intrinsic layer formed over the insulator layer, and a group III-V semiconductor layer formed over the second group III-V intrinsic layer. In one embodiment, a method for fabricating a HEMT comprises forming a first group III-V intrinsic layer and doping the first group III-V intrinsic layer with a rare earth additive to produce an insulator layer. The method also comprises forming a second group III-V intrinsic layer over the insulator layer, and further forming a group III-V semiconductor layer over the second group III-V intrinsic layer. A two-dimensional electron gas (2DEG) is formed at a heterojunction interface of the group III-V semiconductor layer and the second group III-V intrinsic layer.
    • 根据一个实施例,高电子迁移率晶体管(HEMT)包括包含掺杂有稀土添加剂的第一III-V族本征层的绝缘体层。 HEMT还包括形成在绝缘体层上的第二组III-V本征层和形成在第二组III-V本征层上的III-V族半导体层。 在一个实施例中,制造HEMT的方法包括形成第一III-V族本征层,并用稀土添加剂掺杂第一III-V族本征层以产生绝缘体层。 该方法还包括在绝缘体层上形成第二组III-V本征层,并且进一步在第二组III-V本征层上形成III-V族半导体层。 在III-V族半导体层和第二组III-V本征层的异质结界面处形成二维电子气(2DEG)。
    • 8. 发明申请
    • Rare earth enhanced high electron mobility transistor and method for fabricating same
    • 稀土增强型高电子迁移率晶体管及其制造方法
    • US20100308375A1
    • 2010-12-09
    • US12455933
    • 2009-06-08
    • Ronald H. Birkhahn
    • Ronald H. Birkhahn
    • H01L29/778H01L21/335
    • H01L29/7787H01L29/2003H01L29/207H01L29/66462
    • According to one embodiment, a high electron mobility transistor (HEMT) comprises an insulator layer comprising a first group III-V intrinsic layer doped with a rare earth additive. The HEMT also comprises a second group III-V intrinsic layer formed over the insulator layer, and a group III-V semiconductor layer formed over the second group III-V intrinsic layer. In one embodiment, a method for fabricating a HEMT comprises forming a first group III-V intrinsic layer and doping the first group III-V intrinsic layer with a rare earth additive to produce an insulator layer. The method also comprises forming a second group III-V intrinsic layer over the insulator layer, and further forming a group III-V semiconductor layer over the second group III-V intrinsic layer. A two-dimensional electron gas (2DEG) is formed at a heterojunction interface of the group III-V semiconductor layer and the second group III-V intrinsic layer.
    • 根据一个实施例,高电子迁移率晶体管(HEMT)包括包含掺杂有稀土添加剂的第一III-V族本征层的绝缘体层。 HEMT还包括形成在绝缘体层上的第二组III-V本征层和形成在第二组III-V本征层上的III-V族半导体层。 在一个实施例中,制造HEMT的方法包括形成第一III-V族本征层,并用稀土添加剂掺杂第一III-V族本征层以产生绝缘体层。 该方法还包括在绝缘体层上形成第二组III-V本征层,并且进一步在第二组III-V本征层上形成III-V族半导体层。 在III-V族半导体层和第二组III-V本征层的异质结界面处形成二维电子气(2DEG)。