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1. 发明申请

US20100271594A1 Device and Method for Axial Length Measurement Having Expanded Measuring Function in the Anterior Eye Segment 审中-公开
标题翻译：在前眼部扩张测量功能的轴向长度测量的装置和方法
公开(公告)号：US20100271594A1
公开(公告)日：2010-10-28
申请号：US12595592
申请日：2008-03-28
申请人： Roland Bergner , Ingo Koschmieder , Claus Dreher , Rudolf Von Buenau
发明人： Roland Bergner , Ingo Koschmieder , Claus Dreher , Rudolf Von Buenau
IPC分类号： A61B3/117 , A61B3/14
CPC分类号： G01B9/02091 , A61B3/0025 , A61B3/1005 , A61B3/1015 , A61B3/102 , A61B3/1173 , G01B9/0203 , G01B11/0675
摘要： The present invention is directed to a solution for measuring geometric parameters in the eye which are required for calculating the refractive power of intraocular lenses. The device according to the invention for axial length measurement which acquires axial length, anterior corneal radii, anterior chamber depth, and other parameters in the anterior eye segment includes a control unit, a first measuring device for determining axial length, and an additional measuring device which acquires a plurality of structures in the anterior segment (such as the cornea, anterior chamber, and lens) and which has at least one illumination unit and at least one image recording unit. By determining additional partial-distance parameters of the anterior eye segments, the IOL can be calculated with high precision even after refractive surgery in which the natural relationship between the radii of the anterior and posterior corneal surfaces is extensively altered by corneal surgery.
摘要翻译：本发明涉及一种用于测量眼内几何参数的解决方案，其是计算眼内透镜的屈光度所需的。根据本发明的用于轴向长度测量的装置，其获取前眼部分中的轴向长度，前角膜半径，前房深度和其他参数包括控制单元，用于确定轴向长度的第一测量装置和附加测量装置其获取前段（例如角膜，前房和透镜）中的多个结构，并且具有至少一个照明单元和至少一个图像记录单元。通过确定前眼部分的额外部分距离参数，即使在屈光手术之后，也可以以高精度计算出IOL，其中前角膜和后角膜表面的半径之间的自然关系被角膜手术广泛改变。

2. 发明授权

US07791711B2 Projection method including pupillary filtering and a projection lens therefor 有权
标题翻译：投影方法包括瞳孔滤光和投影透镜
公开(公告)号：US07791711B2
公开(公告)日：2010-09-07
申请号：US12036903
申请日：2008-02-25
申请人： Hubert Holderer , Christian Hembd-Soellner , Rudolf Von Buenau , Ulrich Haag
发明人： Hubert Holderer , Christian Hembd-Soellner , Rudolf Von Buenau , Ulrich Haag
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G02B17/0892 , G02B17/08 , G02B26/06 , G02B27/58 , G03F7/70225 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an image of a pattern is projected onto a light-sensitive substrate in multiple exposures, in which a first pupil filter function is set on the mirror during a first exposure and, during a subsequent, second exposure, a different, second pupil filter function is set by local changes of geometric reflective properties of the mirror in a locally resolving manner.
摘要翻译：用于生产半导体部件和/或其它精细构造的部件的工艺包括提供具有位于预定接近于投影物镜的光瞳表面的反射镜的投影物镜。在一个变型中，图案的图像在多次曝光中投影到感光基板上，其中在第一曝光期间在镜上设置第一光瞳滤光器功能，并且在随后的第二曝光期间，将不同的第二曝光瞳孔滤光器功能是以局部分辨的方式通过反射镜的几何反射特性的局部变化来设定的。

3. 发明申请

US20080297889A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
公开(公告)号：US20080297889A1
公开(公告)日：2008-12-04
申请号：US12184818
申请日：2008-08-01
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

4. 发明授权

US08208199B2 Catadioptric projection objective 有权
公开(公告)号：US08208199B2
公开(公告)日：2012-06-26
申请号：US12409394
申请日：2009-03-23
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

5. 发明授权

US08199400B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08199400B2
公开(公告)日：2012-06-12
申请号：US12561019
申请日：2009-09-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

6. 发明申请

US20100265572A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20100265572A1
公开(公告)日：2010-10-21
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

7. 发明申请

US20100253999A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20100253999A1
公开(公告)日：2010-10-07
申请号：US12817628
申请日：2010-06-17
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

8. 发明申请

US20080151365A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
公开(公告)号：US20080151365A1
公开(公告)日：2008-06-26
申请号：US12046067
申请日：2008-03-11
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B27/18
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

9. 发明申请

US20050002111A1 Microlithographic illumination method and a projection lens for carrying out the method 失效
标题翻译：微光刻法和投影透镜实施方法
公开(公告)号：US20050002111A1
公开(公告)日：2005-01-06
申请号：US10831293
申请日：2004-04-26
申请人： Toralf Gruner , Manfred Maul , Rudolf Von Buenau
发明人： Toralf Gruner , Manfred Maul , Rudolf Von Buenau
IPC分类号： G03F7/20 , G02B26/08 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70058 , G03F7/70225 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.
摘要翻译：一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免公开了当成像精细结构化图案时由于图案取向引起的对比度变化。对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

10. 发明授权

US06728043B2 Microlithographic illumination method and a projection lens for carrying out the method 失效
标题翻译：微光刻法和投影透镜实施方法
公开(公告)号：US06728043B2
公开(公告)日：2004-04-27
申请号：US10146915
申请日：2002-05-17
申请人： Toralf Gruner , Manfred Maul , Rudolf Von Buenau
发明人： Toralf Gruner , Manfred Maul , Rudolf Von Buenau
IPC分类号： G02B2714
CPC分类号： G03F7/70058 , G03F7/70225 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.
摘要翻译：一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免公开了当成像精细结构化图案时由于图案取向引起的对比度变化。对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

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