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1. 发明授权

US5108792A Double-dome reactor for semiconductor processing 失效
标题翻译：用于半导体加工的双重反应器
公开(公告)号：US5108792A
公开(公告)日：1992-04-28
申请号：US491416
申请日：1990-03-09
申请人： Roger N. Anderson , John G. Martin , Douglas Meyer , Daniel West , Russell Bowman , David V. Adams
发明人： Roger N. Anderson , John G. Martin , Douglas Meyer , Daniel West , Russell Bowman , David V. Adams
IPC分类号： H01L21/203 , C23C16/44 , C23C16/48 , C30B25/08 , C30B25/10 , C30B25/14 , H01L21/00 , H01L21/205 , H01L21/26 , H01L21/324
CPC分类号： H01L21/67115 , C23C16/44 , C23C16/481 , C30B25/08 , C30B25/10 , C30B25/14
摘要： A thermal reactor for epitaxial deposition on a wafer comprises a double-dome vessel and dual heat sources. Each heat source comprises inner and outer circular arrays of infrared lamps. Circumferential heating uniformity is assured by the cylindrical symmetry of the vessel and the heating sources. Radial heating uniformity is provided by independent control of inner and outer heating arrays for both the top and bottom heat sources. The relative temperatures of wafer and susceptor are controlled by adjusting relative energies provided by the upper and lower heat sources so that backside migration. Reduced pressure operation is provided for by the convex top and bottom domes. Due to the provided control over transmitted energy distribution, a susceptor can have low thermal mass so that elevated temperature can be achieved more quickly and cooling can be facilitated as well. This improves throughput and reduces manufacturing costs per wafer. Reagent gas introduction can be axial or radial as desired.

2. 发明授权

US5637351A Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter 失效
标题翻译：使用氧 - 硅源反应物和自由基促进剂的二氧化硅膜的化学气相沉积（CVD）
公开(公告)号：US5637351A
公开(公告)日：1997-06-10
申请号：US439349
申请日：1995-05-11
申请人： Harry E. O'Neal , Morey A. Ring , John G. Martin
发明人： Harry E. O'Neal , Morey A. Ring , John G. Martin
IPC分类号： C01B33/12 , C23C16/40 , H01L21/31 , H01L21/316 , H01L21/76
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02211 , H01L21/02271 , H01L21/31608
摘要： A low temperature chemical vapor deposition method for depositing silicon dioxide comprising the steps of heating a substrate upon which deposition is desired to a temperature of between 250.degree. C. (482.degree. F.) and 420.degree. C. (788.degree. F.) in a vacuum having a pressure of from about 0.1 to about 2.0 torr and introducing, together with a silane and oxygen or oxygen-containing silane, a free radical promoter (e.g., di-t-butylperoxide, t-butylhydroperoxide, or n-butylnitrite) as a co-reactant into the vacuum.
摘要翻译：一种用于沉积二氧化硅的低温化学气相沉积方法，包括以下步骤：将需要沉积的基底加热到250℃（482°F）至420℃（788°F）的温度压力为约0.1至约2.0托的真空并与硅烷和氧或含氧硅烷一起引入自由基促进剂（例如二叔丁基过氧化物，叔丁基过氧化氢或亚硝酸正丁酯）作为真空中的共反应物。

3. 发明授权

US4579080A Induction heated reactor system for chemical vapor deposition 失效
标题翻译：用于化学气相沉积的感应加热反应器系统
公开(公告)号：US4579080A
公开(公告)日：1986-04-01
申请号：US698580
申请日：1985-02-06
申请人： John G. Martin , Walter C. Benzing , Robert Graham
发明人： John G. Martin , Walter C. Benzing , Robert Graham
IPC分类号： C23C16/458 , C23C16/46 , C30B25/08 , C30B25/10 , C30B25/12 , C23C16/00 , H05B6/64
CPC分类号： C23C16/4411 , C23C16/4588 , C23C16/46 , C30B25/08 , C30B25/10 , C30B25/12
摘要： A chemical vapor deposition system which includes a generally closed reaction chamber having walls formed from a dielectric material. A susceptor for carrying a plurality of semiconductor wafers is positioned within the chamber. An induction coil is positioned in the vicinity of the susceptor for carrying an alternating electric current to produce induction heating of the susceptor and thereby heating the back side of the wafers thereon. Low frequency induction heating and variations in susceptor thickness are used to produce uniformity of temperature. Boundary control arrangement between the susceptor surface and wafer surfaces are used to improve deposition uniformity. A coating is formed on wall portions of the reaction chamber facing the susceptor and wafers carried thereon for reflecting heat energy radiated from the susceptor and the wafers positioned thereon back to the susceptor and the wafers to reduce substantially the heat loss therefrom and thereby to reduce substantially the thermal gradient from front to back surfaces of the wafers.
摘要翻译：一种化学气相沉积系统，其包括具有由介电材料形成的壁的通常封闭的反应室。用于承载多个半导体晶片的基座位于腔室内。感应线圈位于基座附近，用于承载交流电流以产生感受体的感应加热，从而加热晶片的背面。使用低频感应加热和基座厚度的变化来产生温度均匀性。使用感受体表面和晶片表面之间的边界控制布置来改善沉积均匀性。在反应室的面对基座的壁部分上形成涂层，并且在其上承载的晶片用于反射从基座辐射的热能和位于其上的晶片返回到基座和晶片，从而基本上减少其热损失，从而基本上减小从晶片的正面到背面的热梯度。

4. 发明申请

US20120088434A1 Toy Figure with Sound and Light Show 审中-公开
标题翻译：玩具图与声光秀
公开(公告)号：US20120088434A1
公开(公告)日：2012-04-12
申请号：US13253342
申请日：2011-10-05
申请人： Peter E. Teel , Anna Y. Yi , Andrey Cherednichenko , John G. Martin
发明人： Peter E. Teel , Anna Y. Yi , Andrey Cherednichenko , John G. Martin
IPC分类号： A63H3/33
CPC分类号： A63H3/006 , A63H3/28
摘要： A toy figure has a torso, a torso light source, a light source support member, a plurality of peripheral light sources, one or more spacers, and a speaker. A controller is operably connected to the torso light source, the plurality of peripheral light sources, and the speaker to coordinate a magical light and sound experience. Clothing fabric hides the plurality of peripheral light sources, but allows light from the plurality of peripheral light sources to be seen through the clothing fabric when the light and sound experience begins.
摘要翻译：玩具人物具有躯干，躯干光源，光源支撑构件，多个周边光源，一个或多个间隔物和扬声器。控制器可操作地连接到躯干光源，多个外围光源和扬声器，以协调神奇的光和声音体验。服装面料隐藏了多个周边光源，但是当光和声音体验开始时，允许来自多个周边光源的光通过衣服织物看到。

5. 发明授权

US4769365A Certain carboxylic azetidine derivatives useful in reducing blood cholesterol 失效
标题翻译：某些可用于降低血液胆固醇的羧基氮杂环丁烷衍生物
公开(公告)号：US4769365A
公开(公告)日：1988-09-06
申请号：US937287
申请日：1986-12-03
申请人： James B. M. Gellatly , John G. Martin
发明人： James B. M. Gellatly , John G. Martin
IPC分类号： C07D205/06 , A61K31/395 , A61K31/397 , A61P3/06 , A61K31/40
CPC分类号： A61K31/395
摘要： Compound for use in a method for treatment of the human or animal body by therapy, characterized in that the compound is a carboxy azetidine derivative of the general formula I or a pharmaceutically acceptable salt, ester, amide, alkylamide, hydrazide or alkylhydrazide thereof: ##STR1## in which: X represents one of the groups CH.sub.2, CHR or CR.sub.2.Y represents one of the groups CH.sub.2, CHR, CR.sub.2 or CH.CO.sub.2 H andZ represents one of the groups CH.sub.2, CHR, CR.sub.2 or CH.CO.sub.2 H;the or each R independently represents an alkyl, alkenyl or cycloalkyl group or an aryl or aralkyl group optionally substituted on the aryl nucleus by one or more of the same or different substituents selected from halogen atoms, alkyl groups and alkoxy groups;and one but only one of Y and Z must represent a CH.CO.sub.2 H group.
摘要翻译：用于通过治疗人或动物体的方法的化合物，其特征在于所述化合物是通式I的羧基氮杂环丁烷衍生物或其药学上可接受的盐，酯，酰胺，烷基酰胺，酰肼或烷基酰肼： IMAGE> I，其中：X表示CH2，CHR或CR2之一。 Y表示CH2，CHR，CR2或CH.CO2H之一，Z表示CH2，CHR，CR2或CH.CO2H之一; 所述或每个R独立地表示烷基，烯基或环烷基或芳基或芳烷基，所述芳基或芳烷基任选在芳基核上被一个或多个相同或不同的选自卤素原子，烷基和烷氧基的取代基取代; Y和Z中只有一个必须代表CH.CO2H基团。

6. 发明授权

US5494758A Article manufactured by an ion-beam-assisted-deposition process 失效
标题翻译：通过离子束辅助沉积工艺制造的物品
公开(公告)号：US5494758A
公开(公告)日：1996-02-27
申请号：US258450
申请日：1994-06-10
申请人： Ghawamedin Bayan , John G. Martin , Roger A. Cassell
发明人： Ghawamedin Bayan , John G. Martin , Roger A. Cassell
IPC分类号： C23C14/20 , F16K25/00 , B32B15/04
CPC分类号： F16K25/005 , C23C14/20 , Y10T428/24777 , Y10T428/24793 , Y10T428/31678 , Y10T428/31681 , Y10T428/31688 , Y10T428/31692 , Y10T428/31699
摘要： An article is provided manufactured by an ion-beam-assisted-deposition process. The article includes a polymeric element adapted to releasably engage a contact surface. The polymeric element is provided with a surface layer bonded to a surface of the polymeric element through an ion-beam-assisted-deposition process in order to reduce the tackiness of the polymeric material.
摘要翻译：通过离子束辅助沉积工艺制造的制品。该制品包括适于可释放地接合接触表面的聚合物元件。聚合物元件具有通过离子束辅助沉积工艺结合到聚合物元件的表面的表面层，以便降低聚合物材料的粘性。

7. 发明授权

US4322592A Susceptor for heating semiconductor substrates 失效
标题翻译：用于加热半导体衬底的受体
公开(公告)号：US4322592A
公开(公告)日：1982-03-30
申请号：US181376
申请日：1980-08-22
申请人： John G. Martin
发明人： John G. Martin
IPC分类号： C30B25/12 , C30B25/14 , H05B6/02 , H05B5/08 , B05C13/00
CPC分类号： H05B6/105 , C30B25/12 , C30B25/14
摘要： An integral graphite susceptor of the barrel type comprising a hollow polyhedron arranged to support one or more semiconductor substrates on its outer planar wall surfaces. The substrates are supported in a novel column and row array in which each wafer is mounted on a wall surface portion that is related to the other adjacent wall surface portions in an equilateral triangular configuration to provide an efficient substrate support susceptor. Wafer edges extending beyond corners of the susceptor cause a disturbance in the gas flow resulting in more uniform deposition of epitaxial material.
摘要翻译：筒型的整体石墨感受器，包括中空多面体，其设置成在其外平面壁表面上支撑一个或多个半导体衬底。基板被支撑在新颖的列和列阵列中，其中每个晶片以等边三角形构造安装在与其它相邻壁表面部分相关的壁表面部分上，以提供有效的基板支撑基座。延伸超过基座角落的晶圆边缘会导致气流的干扰，导致外延材料的更均匀的沉积。

8. 发明授权

US4318521A Lawn refuse bag positioner 失效
标题翻译：草坪垃圾袋定位器
公开(公告)号：US4318521A
公开(公告)日：1982-03-09
申请号：US60784
申请日：1979-07-25
申请人： Emma L. Martin , John G. Martin
发明人： Emma L. Martin , John G. Martin
IPC分类号： B65B67/12
CPC分类号： B65B67/1238
摘要： The specification discloses an especially designed and built bag frame that comprises a closed loop of tubing having a shaped form about which the open end of a refuse bag of plastic or other flexible material may be stretched and wrapped so as to hold the mouth of the bag open while the user rakes or gathers in grass, leaves, or other refuse. In one embodiment the frame is D-shaped so that the flat side may rest squarely on the ground. In another embodiment the frame includes spikes adjacent the flat side so that the frame may forceably be engaged with the earth so that it will stand alone when the user releases hold thereof; this permits the user to have both hands free for the raking or gathering activity.
摘要翻译：本说明书公开了一种特别设计和建造的袋框架，其包括具有成形形式的封闭环管，围绕塑料或其他柔性材料的垃圾袋的开口端可以被拉伸和包裹以便保持袋的口打开时，用户耙或收集在草，叶子或其他垃圾中。在一个实施例中，框架是D形的，使得平坦侧面可以平直地搁置在地面上。在另一个实施例中，框架包括邻近平坦侧面的尖峰，使得框架可以可靠地与地球接合，使得当用户释放其时，它将独立; 这样可以让用户双手自由地进行罢工或收集活动。

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