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热词
    • 7. 发明授权
    • Method and apparatus for measuring the thickness of a layer on a
substrate
    • 用于测量衬底上的层的厚度的方法和装置
    • US5091647A
    • 1992-02-25
    • US632557
    • 1990-12-24
    • Keith R. CardunerRoscoe O. Carter, IIIDennis SchuetzleMichael J. Decello
    • Keith R. CardunerRoscoe O. Carter, IIIDennis SchuetzleMichael J. Decello
    • G01B11/06
    • G01B11/0625
    • A method and an apparatus for simultaneously measuring each constituent film in a multi-layer coating. Near Infrared Reflectance (NIR) measurements are taken at the peak and reference wavelength for a series of calibration samples. Based on these measurements, a relationship is established between the film NIR and thickness. A measuring NIR spectrometer is supplied with the relationship and a target sample is irradiated with near infrared radiation at each peak and reference wavelength. The measuring spectrometer measures the amount of NIR and computes the individual film thicknesses using the relationship supplied to it. Individual film thicknesses can be visually displayed, and/or directed to the film applying apparatus. If the thickness of an individual film layer deviates from a predetermined valve, the film applying apparatus is manipulated to apply the desired thickness of film.
    • 一种用于同时测量多层涂层中的每个构成膜的方法和装置。 对于一系列校准样品,在峰值和参考波长处进行近红外反射(NIR)测量。 基于这些测量,在膜NIR和厚度之间建立了关系。 提供测量NIR光谱仪的关系,并且在每个峰值和参考波长处用近红外辐射照射目标样品。 测量光谱仪测量NIR的量,并使用提供给它的关系来计算各个膜厚度。 可以在视觉上显示单独的膜厚度,和/或指向膜施加装置。 如果单个膜层的厚度偏离预定的阀,则操作膜施加装置以施加所需的膜厚度。