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    • 4. 发明授权
    • Cardiac pacemaker circuit with fast stored charge reduction
    • 心脏起搏器电路具有快速储存的电荷减少
    • US4811738A
    • 1989-03-14
    • US53135
    • 1987-05-21
    • Apollo P. EconomidesStephen GergelyChristopher Walton
    • Apollo P. EconomidesStephen GergelyChristopher Walton
    • A61N1/37A61N1/36
    • A61N1/371
    • A cardiac pacemaker circuit for use with a stimulating electrode embedded in a patient's atrium or ventricle and a reference electrode positioned outside the heart or on the same lead within the heart. Stimulus pulses are applied by the circuit across the two electrodes, these stimulus pulses replacing evoked pulses. On termination of each stimulus pulse the amount of charge stored between the two electrodes is monitored and pulses of short duration are applied to the stimulating electrode progressively to reduce this charge over a very short time period to a level at which the intrinsic pulses of the evoked heart response can be monitored. The evoked heart response can then be used for diagnosis while the pacemaker circuit is in operation. If the stored charge was not reduced quickly then the charge would mask the intrinsic pulse and the pacemaker would have to be switched off before the intrinsic pulses could be monitored for diagnosis.
    • 一种心脏起搏器电路,其用于嵌入患者心房或心室中的刺激电极和位于心脏外部或心脏内同一引线上的参考电极。 激励脉冲由电路在两个电极上施加,这些刺激脉冲代替诱发脉冲。 在每个刺激脉冲终止时,监测在两个电极之间存储的电荷量,并且将持续时间短的脉冲逐渐施加到刺激电极,以在非常短的时间段内将该电荷减少到诱发的本征脉冲的水平 可以监测心脏反应。 然后,起搏器电路运行时,诱发的心脏反应可用于诊断。 如果存储的电荷没有快速减少,则电荷将掩蔽本征脉冲,并且必须先关闭起搏器,然后才能监测内在脉冲进行诊断。
    • 7. 发明授权
    • Adhesive particle shielding
    • 粘合剂颗粒屏蔽
    • US07473301B2
    • 2009-01-06
    • US10245218
    • 2002-09-17
    • Leonard Elliott KlebanoffDaniel John RaderChristopher WaltonJames Folta
    • Leonard Elliott KlebanoffDaniel John RaderChristopher WaltonJames Folta
    • B01D45/08
    • H01L21/67017H01L21/67132Y10S55/14
    • An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.
    • 用于捕获快速移动颗粒的有效装置具有粘合剂颗粒屏蔽,其包括(i)安装板和(ii)附接到安装板的膜,其中膜的外表面具有设置在其上的粘合剂涂层以捕获颗粒 接触外表面。 可以使用屏蔽来保持基本上无颗粒的环境,例如具有关键表面的光刻系统,例如晶片,掩模和光学器件,以及用于制造对颗粒污染敏感的这些部件的工具。 屏蔽件可以便携式地定位在光刻机的难以到达的区域中。 粘合剂颗粒屏蔽可以包含冷却装置以通过热泳效应吸引颗粒。
    • 8. 发明授权
    • Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients
    • 用于制造具有亚埃厚度均匀性或定制厚度梯度的溅射薄膜的方法和系统
    • US06524449B1
    • 2003-02-25
    • US09454673
    • 1999-12-03
    • James A. FoltaClaude MontcalmChristopher Walton
    • James A. FoltaClaude MontcalmChristopher Walton
    • C23C1600
    • C23C14/54C23C14/543C23C14/545G02B1/10
    • A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source) can be varied or set to zero.
    • 通过将衬底穿过气相沉积源(通常在其上,通常用于生产具有高度均匀(或高度准确的定制分级)厚度的薄膜的方法和系统,该平板或渐变衬底(例如凹形或凸形光学器件) 时变)速度。 在优选实施例中,该方法包括以下步骤:测量源通量分布(使用在暴露于源时保持静止的测试件),计算一组预测的膜厚度分布,每个薄膜厚度分布假设测量的磁通分布;以及 一组扫描速度调制配方中的不同的一个,并且从预测的膜厚度分布确定足以实现预定厚度分布的扫描速度调制配方。 本发明的方面包括精确测量源通量分布的实用方法,以及采用图形用户界面的计算机实现的方法,以促进方便地选择最佳或近似最佳的扫描速度调制配方以在衬底上实现期望的厚度分布。 优选地,计算机实现了一种算法,其中许多扫描速度函数参数(例如,每个基板绕其中心旋转,当其扫过源时的速度)可以被改变或设置为零。