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1. 发明授权

US07650251B2 System and method for rule-based data mining and problem detection for semiconductor fabrication 失效
标题翻译：用于半导体制造的基于规则的数据挖掘和问题检测的系统和方法
公开(公告)号：US07650251B2
公开(公告)日：2010-01-19
申请号：US12333830
申请日：2008-12-12
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G01N37/00
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/32196 , Y02P90/22
摘要： A fabrication history a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.
摘要翻译：制造历史提供了一组晶片，其具有在其制造中进行或未发生的制造事件的每个晶片的记录，并且具有给定目标的测量值。基于制造历史形成二进制决策规则，规则是如果晶片在其制造历史中具有制造事件的特定模式，则该晶片的给定制造目标的统计量是第一值; 否则，统计量是具有与第一值至少给定距离的第二值。在二进制决策规则中的制造事件的模式在二进制决策规则的生成中被识别。所识别的模式对于给定的目标是重要的。

2. 发明授权

US07539585B2 System and method for rule-based data mining and problem detection for semiconductor fabrication 失效
标题翻译：用于半导体制造的基于规则的数据挖掘和问题检测的系统和方法
公开(公告)号：US07539585B2
公开(公告)日：2009-05-26
申请号：US11763052
申请日：2007-06-14
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G01N37/00
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/32196 , Y02P90/22
摘要： A fabrication history of a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.
摘要翻译：提供了一组晶片的制造历史，其具有在其制造中进行或未发生的制造事件的每个晶片的记录，并且具有给定目标的测量值。基于制造历史形成二进制决策规则，规则是如果晶片在其制造历史中具有制造事件的特定模式，则该晶片的给定制造目标的统计量是第一值; 否则，统计量是具有与第一值至少给定距离的第二值。在二进制决策规则中的制造事件的模式在二进制决策规则的生成中被识别。所识别的模式对于给定的目标是重要的。

3. 发明申请

US20120215335A1 DETECTING COMBINED TOOL INCOMPATIBILITIES AND DEFECTS IN SEMICONDUCTOR MANUFACTURING 失效
标题翻译：检测组合工具不匹配和半导体制造中的缺陷
公开(公告)号：US20120215335A1
公开(公告)日：2012-08-23
申请号：US13030324
申请日：2011-02-18
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06F17/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A system, a method and a computer program product for identifying incompatible manufacturing tools. The system receives measurements of products that were subject to a manufacturing process involving a plurality of manufacturing tools. The measurements pertain to a performance characteristic of each product. The system evaluates whether each manufacturing tool implemented in a sequential manufacturing process individually performs normally based on the received measurements. In response to evaluating each manufacturing tool implemented in said manufacturing process individually performs normally, the system evaluates whether a first combination of the manufacturing tools together in sequential manufacturing process perform normally based on the received measurements. The system further evaluates performance of products generated by all other combinations of tools in the sequential manufacturing process not including the first combination of tools, and, using objective measures, identifies a combination of tools that perform optimally.
摘要翻译：用于识别不兼容的制造工具的系统，方法和计算机程序产品。该系统接收涉及多个制造工具的制造过程的产品的测量。测量值与每个产品的性能特征相关。系统评估在顺序制造过程中实现的每个制造工具是否基于所接收的测量单独地执行。响应于评估在所述制造过程中实现的每个制造工具单独地执行，系统评估在顺序制造过程中一起的制造工具的第一组合是否基于所接收的测量正常执行。该系统进一步评估在不包括工具的第一组合的顺序制造过程中所有其他工具组合产生的产品的性能，并且使用客观测量来确定最佳执行的工具的组合。

4. 发明申请

US20090093904A1 System and Method for Rule-Based Data Mining and Problem Detection for Semiconductor Fabrication 失效
标题翻译：用于半导体制造的基于规则的数据挖掘和问题检测的系统和方法
公开(公告)号：US20090093904A1
公开(公告)日：2009-04-09
申请号：US12333830
申请日：2008-12-12
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06F19/00 , G06N5/02
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/32196 , Y02P90/22
摘要： A fabrication history a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.
摘要翻译：制造历史提供了一组晶片，其具有在其制造中进行或未发生的制造事件的每个晶片的记录，并且具有给定目标的测量值。基于制造历史形成二进制决策规则，规则是如果晶片在其制造历史中具有制造事件的特定模式，则该晶片的给定制造目标的统计量是第一值; 否则，统计量是具有与第一值至少给定距离的第二值。在二进制决策规则中的制造事件的模式在二进制决策规则的生成中被识别。所识别的模式对于给定的目标是重要的。

5. 发明授权

US08594821B2 Detecting combined tool incompatibilities and defects in semiconductor manufacturing 失效
标题翻译：检测半导体制造中的组合工具不兼容性和缺陷
公开(公告)号：US08594821B2
公开(公告)日：2013-11-26
申请号：US13030324
申请日：2011-02-18
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06F19/00 , G06F17/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A system, a method and a computer program product for identifying incompatible manufacturing tools. The system receives measurements of products that were subject to a manufacturing process involving a plurality of manufacturing tools. The measurements pertain to a performance characteristic of each product. The system evaluates whether each manufacturing tool implemented in a sequential manufacturing process individually performs normally based on the received measurements. In response to evaluating each manufacturing tool implemented in said manufacturing process individually performs normally, the system evaluates whether a first combination of the manufacturing tools together in sequential manufacturing process perform normally based on the received measurements. The system further evaluates performance of products generated by all other combinations of tools in the sequential manufacturing process not including the first combination of tools, and, using objective measures, identifies a combination of tools that perform optimally.
摘要翻译：用于识别不兼容的制造工具的系统，方法和计算机程序产品。该系统接收涉及多个制造工具的制造过程的产品的测量。测量值与每个产品的性能特征相关。系统评估在顺序制造过程中实现的每个制造工具是否基于所接收的测量单独地执行。响应于评估在所述制造过程中实现的每个制造工具单独地执行，系统评估在顺序制造过程中一起的制造工具的第一组合是否基于所接收的测量正常执行。该系统进一步评估在不包括工具的第一组合的顺序制造过程中所有其他工具组合产生的产品的性能，并且使用客观测量来确定最佳执行的工具的组合。

6. 发明授权

US08533635B2 Rule-based root cause and alias analysis for semiconductor manufacturing 失效
标题翻译：基于规则的半导体制造的根本原因和别名分析
公开(公告)号：US08533635B2
公开(公告)日：2013-09-10
申请号：US12690492
申请日：2010-01-20
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06F17/50
CPC分类号： G06N5/025 , H01L22/20
摘要： The present invention includes a computing system determining a best alias rule in a semiconductor manufacturing process. The computing system obtains an original rule and candidate alias rules based on sampled data from the semiconductor manufacturing process. The computing system compares the original rule to the candidate alias rules. The computing system ranks the candidate alias rules according to the comparison. The computing system filters the ranked candidate alias rules. A user selects one rule among the filtered candidate alias rules based on knowledge of the semiconductor manufacturing process.
摘要翻译：本发明包括在半导体制造过程中确定最佳别名规则的计算系统。计算系统基于半导体制造过程的采样数据获得原始规则和候选别名规则。计算系统将原始规则与候选别名规则进行比较。计算系统根据比较对候选别名规则进行排序。计算系统过滤排名的候选别名规则。用户根据半导体制造过程的知识在筛选的候选别名规则中选择一个规则。

7. 发明申请

US20110178624A1 RULE-BASED ROOT CAUSE AND ALIAS ANALYSIS FOR SEMICONDUCTOR MANUFACTURING 失效
标题翻译：基于规则的根本原因和半导体制造的ALIAS分析
公开(公告)号：US20110178624A1
公开(公告)日：2011-07-21
申请号：US12690492
申请日：2010-01-20
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06N5/02 , G06F17/00 , G06F17/30
CPC分类号： G06N5/025 , H01L22/20
摘要： The present invention includes a computing system determining a best alias rule in a semiconductor manufacturing process. The computing system obtains an original rule and candidate alias rules based on sampled data from the semiconductor manufacturing process. The computing system compares the original rule to the candidate alias rules. The computing system ranks the candidate alias rules according to the comparison. The computing system filters the ranked candidate alias rules. A user selects one rule among the filtered candidate alias rules based on knowledge of the semiconductor manufacturing process.
摘要翻译：本发明包括在半导体制造过程中确定最佳别名规则的计算系统。计算系统基于半导体制造过程的采样数据获得原始规则和候选别名规则。计算系统将原始规则与候选别名规则进行比较。计算系统根据比较对候选别名规则进行排序。计算系统过滤排名的候选别名规则。用户根据半导体制造过程的知识在筛选的候选别名规则中选择一个规则。

8. 发明申请

US20080312858A1 SYSTEM AND METHOD FOR RULE-BASED DATA MINING AND PROBLEM DETECTION FOR SEMICONDUCTOR FABRICATION 失效
标题翻译：用于半导体制造的基于规则数据挖掘和问题检测的系统和方法
公开(公告)号：US20080312858A1
公开(公告)日：2008-12-18
申请号：US11763052
申请日：2007-06-14
申请人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
发明人： Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/32196 , Y02P90/22
摘要： A fabrication history of a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.
摘要翻译：提供了一组晶片的制造历史，其具有在其制造中进行或未发生的制造事件的每个晶片的记录，并且具有给定目标的测量值。基于制造历史形成二进制决策规则，规则是如果晶片在其制造历史中具有制造事件的特定模式，则该晶片的给定制造目标的统计量是第一值; 否则，统计量是具有与第一值至少给定距离的第二值。在二进制决策规则中的制造事件的模式在二进制决策规则的生成中被识别。所识别的模式对于给定的目标是重要的。

9. 发明授权

US08594826B2 Method and system for evaluating a machine tool operating characteristics 失效
标题翻译：用于评估机床操作特性的方法和系统
公开(公告)号：US08594826B2
公开(公告)日：2013-11-26
申请号：US13608032
申请日：2012-09-10
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh A. Tipu , Adam D. Ticknor , Timothy M. McCormack
IPC分类号： G06F19/00
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method, a system and a computer program product suitable for use in a manufacturing environment comprising a multiplicity of nominally identical independent tools. A computing device generates a multi dimensional array of process trace data derived from at least one of the independent tools, wherein, the array includes data representing a first dimension comprising a list of steps in a manufacturing recipe and data representing a second dimension comprising a list of a set of sensors generating measurements from at least one of the independent tools. The computing device conducts an analysis on at least one preselected subset of the multi dimensional array for the purpose of evaluating at least one operating characteristic of at least one of the independent tools. The computing device presents results of the analysis via a set of hierarchically linked and browseable graphics.
摘要翻译：一种适用于制造环境的方法，系统和计算机程序产品，包括多个名义上相同的独立工具。计算设备生成从至少一个独立工具导出的过程跟踪数据的多维阵列，其中，所述阵列包括表示包括制造配方中的步骤列表的第一维度的数据和表示包括列表的第二维度的数据一组传感器从至少一个独立工具产生测量值。为了评估至少一个独立工具的至少一个操作特征，计算设备对多维阵列的至少一个预选子集进行分析。计算设备通过一组分层链接和可浏览的图形呈现分析结果。

10. 发明授权

US08315729B2 Enhancing investigation of variability by inclusion of similar objects with known differences to the original ones 有权
标题翻译：通过将具有已知差异的相似对象与原始对象相结合，来增强对变异性的调查
公开(公告)号：US08315729B2
公开(公告)日：2012-11-20
申请号：US12775107
申请日：2010-05-06
申请人： Robert J. Baseman , Tomasz J. Nowicki , Fateh A. Tipu
发明人： Robert J. Baseman , Tomasz J. Nowicki , Fateh A. Tipu
IPC分类号： G06F17/00 , G06F11/30
CPC分类号： G06F17/50 , G01R31/2894 , H01L22/14 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features.
摘要翻译：用于分析至少两个制造产品的功能的系统，方法和/或计算机程序产品获得第一制成品的第一特征。该系统获得第二制造产品的第二特性。该系统识别第一特征和第二特性之间的共同特征。该系统识别第一特征和第二特性之间的区别特征。该系统基于所识别的共同特征或所识别的可区分特征或两个特征来确定第一制造产品或第二制造产品或两个制造产品中的功能性偏差的原因。

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