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1. 发明申请

US20050165423A1 Ligating clip with integral tissue-securing mechanism 审中-公开
标题翻译：具有整体组织固定机构的保护夹
公开(公告)号：US20050165423A1
公开(公告)日：2005-07-28
申请号：US10763439
申请日：2004-01-23
申请人： Richard Gallagher , Lowell LaFreniere , Tu Tran
发明人： Richard Gallagher , Lowell LaFreniere , Tu Tran
IPC分类号： A61B17/122 , A61B17/08
CPC分类号： A61B17/122
摘要： A polymeric, surgical clip having first and second curved leg members joined at their proximal end by a hinge portion and movable from an open position to a closed position for clamping a vessel between curved opposing inner surfaces which are substantially parallel when the clip is closed. An interlocking mechanism is formed by a portion of the inner surfaces of the first and second legs. The interlocking mechanism may be a tongue-in-groove mechanism, formed by a lip or tongue protruding from a portion of the inner surface of one leg and a groove formed in a corresponding portion of the inner surface of the other leg, or a lock-step mechanism, formed by complementary L-shaped notches wherein a notch is provided in a portion of the inner surface of each leg. The interlocking mechanism acts to impede longitudinal movement of the clip relative to the vessel being clamped.
摘要翻译：具有第一和第二弯曲腿部构件的聚合物手术夹具，其第一和第二弯曲腿部构件在其近端处由铰链部分连接并且可从打开位置移动到关闭位置，用于将容器夹紧在弯曲的相对的内表面之间，所述相对的内表面在夹子闭合时基本上平行。互锁机构由第一和第二腿部的内表面的一部分形成。互锁机构可以是榫槽机构，其由从一个腿的内表面的一部分突出的唇或舌形成，并且形成在另一个腿的内表面的对应部分中的凹槽，或者锁 - 由互补的L形凹口形成的步进机构，其中在每个支腿的内表面的一部分中设置有切口。互锁机构用于阻止夹子相对于被夹紧的容器的纵向运动。

2. 发明授权

US11239070B2 Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device 有权
公开(公告)号：US11239070B2
公开(公告)日：2022-02-01
申请号：US16865433
申请日：2020-05-04
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , B08B3/02 , G03F7/16 , B05C11/08 , H01L21/67 , H01L21/687
摘要： A method includes rendering a cleaning nozzle of a spin coating device below a base plate and out of optimal exposure to a bottom surface and edges of a substrate material placed on a spin chuck in a state of engagement of the base plate with the spin chuck, and rendering the base plate completely under the spin chuck even in the aforementioned state of engagement. In response to disengagement of a lid from the base plate, the method also includes disengaging the base plate from the spin chuck to lower the base plate to a locking point whereupon a portion of the cleaning nozzle below the base plate passes through a hole in the base plate and emerges completely out of and above the base plate, and cleaning the bottom surface and/or the edges of the substrate material utilizing the cleaning nozzle based on an optimal exposure thereof.

3. 发明申请

US20050098903A1 Semiconductor device having a bond pad and method therefor 有权
标题翻译：具有接合焊盘的半导体器件及其方法
公开(公告)号：US20050098903A1
公开(公告)日：2005-05-12
申请号：US11009598
申请日：2004-12-10
申请人： Loise Yong , Peter Happer , Tu Tran , Jeffrey Metz , George Leal , Dieu Dinh
发明人： Loise Yong , Peter Happer , Tu Tran , Jeffrey Metz , George Leal , Dieu Dinh
IPC分类号： H01L21/66 , H01L21/60 , H01L23/485 , H01L23/58 , H01L23/48
CPC分类号： H01L24/05 , H01L22/32 , H01L24/03 , H01L2224/02166 , H01L2224/0392 , H01L2224/04042 , H01L2224/05073 , H01L2224/05166 , H01L2224/05187 , H01L2224/05553 , H01L2224/05624 , H01L2224/48145 , H01L2225/06506 , H01L2225/0651 , H01L2225/06596 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01022 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01073 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/04941 , H01L2924/04953 , H01L2924/05042 , H01L2924/14 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A bond pad (10) has a probe region (14) and a wire bond region (12) that are substantially non-overlapping. In one embodiment, the bond pad (10) is connected to a final metal layer pad (16) and extends over an interconnect region (24). The bond pad (10) is formed from aluminum and the final metal layer pad (16) is formed from copper. Separating the probe region (14) from the wire bond region (12) prevents the final metal layer pad (16) from being damaged by probe testing, allowing for more reliable wire bonds. In another embodiment, the probe region (14) extends over a passivation layer (18). In an application requiring very fine pitch between bond pads, the probe regions (14) and wire bond regions (12) of a plurality of bond pads formed in a line may be staggered to increase the distance between the probe regions (14). In addition, forming the bond pads (10) over the interconnect region (24) reduces the size of the integrated circuit.
摘要翻译：接合焊盘（10）具有基本上不重叠的探针区域（14）和引线接合区域（12）。在一个实施例中，接合焊盘（10）连接到最终金属层焊盘（16）并在互连区域（24）上延伸。接合焊盘（10）由铝形成，并且最终的金属层焊盘（16）由铜形成。将探针区域（14）与引线接合区域（12）分开可防止最终金属层焊盘（16）被探针测试损坏，从而允许更可靠的引线接合。在另一个实施例中，探针区域（14）在钝化层（18）上延伸。在需要接合焊盘之间非常细间距的应用中，形成在一条线上的多个接合焊盘的探针区域（14）和引线键合区域（12）可以交错以增加探针区域（14）之间的距离。此外，在互连区域（24）上形成接合焊盘（10）减小了集成电路的尺寸。

4. 发明申请

US20200266049A1 OPTIMAL EXPOSURE OF A BOTTOM SURFACE OF A SUBSTRATE MATERIAL AND/OR EDGES THEREOF FOR CLEANING IN A SPIN COATING DEVICE 审中-公开
公开(公告)号：US20200266049A1
公开(公告)日：2020-08-20
申请号：US16865433
申请日：2020-05-04
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , G03F7/16 , B08B3/02 , H01L21/687 , H01L21/67 , B05C11/08
摘要： A method includes rendering a cleaning nozzle of a spin coating device below a base plate and out of optimal exposure to a bottom surface and edges of a substrate material placed on a spin chuck in a state of engagement of the base plate with the spin chuck, and rendering the base plate completely under the spin chuck even in the aforementioned state of engagement. In response to disengagement of a lid from the base plate, the method also includes disengaging the base plate from the spin chuck to lower the base plate to a locking point whereupon a portion of the cleaning nozzle below the base plate passes through a hole in the base plate and emerges completely out of and above the base plate, and cleaning the bottom surface and/or the edges of the substrate material utilizing the cleaning nozzle based on an optimal exposure thereof.

5. 发明申请

US20080088449A1 Antenna Arrangement 有权
标题翻译：天线布置
公开(公告)号：US20080088449A1
公开(公告)日：2008-04-17
申请号：US11793868
申请日：2005-12-21
申请人： Tu Tran
发明人： Tu Tran
IPC分类号： G06K7/00 , H01Q21/00 , H01Q21/24 , H01Q21/28
CPC分类号： G06K7/10336 , G06K7/10435 , H01Q21/24 , H01Q21/28
摘要： A network of antennas for contactless reading or writing of RFID tags in a detection volume, including three or four flat, independent antennas sequentially connected to a single reader by a switch, wherein planes of the antennas pass through a reading/writing/detection volume centered in the detection volume, for every pair of antennas, an intersection of their planes is included in the optimal reading/writing volume, and the antennas are arranged so that any direction in the optimal reading/writing volume forms an angle of about 45° or less with at least one of the planes of the antennas.
摘要翻译：用于在检测体积中非接触式读取或写入RFID标签的天线网络，包括通过开关顺序连接到单个读取器的三个或四个平坦的独立天线，其中天线的平面穿过读/写/检测体积居中在检测体积中，对于每对天线，它们的平面的交叉点被包括在最佳读/写体积中，并且天线被布置成使得最佳读/写体积中的任何方向形成约45°的角度或更少与天线的至少一个平面。

6. 发明申请

US20200266050A1 OPTIMAL EXPOSURE OF A BOTTOM SURFACE OF A SUBSTRATE MATERIAL AND/OR EDGES THEREOF FOR CLEANING IN A SPIN COATING DEVICE 审中-公开
公开(公告)号：US20200266050A1
公开(公告)日：2020-08-20
申请号：US16865438
申请日：2020-05-04
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , G03F7/16 , B08B3/02 , H01L21/687 , H01L21/67 , B05C11/08
摘要： A non-transitory medium includes instructions to control a spin coating device including instructions to render a cleaning nozzle of the spin coating device below a base plate and out of optimal exposure to a bottom surface and edges of a substrate material placed on a spin chuck in a state of engagement of the base plate with the spin chuck. In response to disengagement of a lid from the base plate, the non-transitory medium also includes instructions to disengage the base plate from the spin chuck to lower the base plate to a locking point whereupon a portion of the cleaning nozzle below the base plate passes through a hole in the base plate and emerges completely out of and above the base plate, and instructions to clean the bottom surface and/or the edges of the substrate material utilizing the cleaning nozzle based on an optimal exposure thereof.

7. 发明申请

US20070077305A1 Biocompatible polymeric matrix and preparation thereof 审中-公开
标题翻译：生物相容性聚合物基质及其制备
公开(公告)号：US20070077305A1
公开(公告)日：2007-04-05
申请号：US11240578
申请日：2005-10-03
申请人： Tien Le , Tu Tran , Mircea-Alexandru Mateescu
发明人： Tien Le , Tu Tran , Mircea-Alexandru Mateescu
IPC分类号： A61K9/14
CPC分类号： A61K9/205 , A61K9/0014 , A61K9/1652 , A61K9/2054 , A61K9/5161 , A61K9/7007 , A61K47/36 , A61K47/38 , C08B13/00 , C08B37/003 , C08B37/0084 , C08L1/32 , C08L5/04 , C08L5/08
摘要： The invention discloses a biocompatible polymeric matrix which is functionalized through the reaction with a functionalizing agent including protonated carboxylic acid groups. There is also disclosed a method of preparation of the polymeric matrix and a pharmaceutical composition including the matrix as a carrier for controlled release of a bioactive agent. The pharmaceutical composition is suitable for immobilizing and protecting the bioactive agent from denaturing factors, and can take various forms such as tablets, spheres, films, hydrogels, and emulsions.
摘要翻译：本发明公开了一种生物相容性聚合物基质，其通过与包括质子化的羧酸基团的官能化试剂反应进行官能化。还公开了制备聚合物基质的方法和药物组合物，其包含作为生物活性剂的受控释放载体的基质。该药物组合物适于固定和保护生物活性剂免受变性因子的影响，并且可以采取各种形式，例如片剂，球体，膜，水凝胶和乳液。

8. 发明授权

US11495451B2 Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device 有权
公开(公告)号：US11495451B2
公开(公告)日：2022-11-08
申请号：US16865438
申请日：2020-05-04
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , G03F7/16 , B05C11/08 , H01L21/67 , B08B3/02 , H01L21/687
摘要： A non-transitory medium includes instructions to control a spin coating device to render a cleaning nozzle of the spin coating device below a base plate and out of optimal exposure to a substrate material placed on a spin chuck when the base plate is engaged with the spin chuck. In response to disengagement of a lid from the base plate, the non-transitory medium also includes instructions to disengage the base plate from the spin chuck to lower the base plate to a locking point whereupon a portion of the cleaning nozzle below the base plate passes through a hole in the base plate and emerges completely out of and above the base plate, and instructions to clean the bottom surface and/or the edges of the substrate material utilizing the cleaning nozzle based on an optimal exposure to the bottom surface and the edges of the substrate material.

9. 发明授权

US10679844B2 Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device 有权
公开(公告)号：US10679844B2
公开(公告)日：2020-06-09
申请号：US16459613
申请日：2019-07-02
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , G03F7/16 , B05C11/08 , H01L21/67 , B08B3/02 , H01L21/687
摘要： A spin coating device includes a base plate, a spin chuck on which a substrate material is placed, and an actuator mechanism to engage the base plate with the spin chuck such that the base plate synchronously spins along with the spin chuck. The substrate material includes a top surface coated with a film-forming substance and a bottom surface. The cleaning mechanism is below the base plate and out of optimal exposure to the bottom surface and edges of the substrate material in a state of base plate engagement. In response to disengagement of a lid configured to synchronously co-rotate with the base plate, the actuator mechanism is further configured to disengage the base plate from the spin chuck and to enable the optimal exposure of the cleaning mechanism to the bottom surface and the edges of the substrate material.

10. 发明申请

US20200013614A1 OPTIMAL EXPOSURE OF A BOTTOM SURFACE OF A SUBSTRATE MATERIAL AND/OR EDGES THEREOF FOR CLEANING IN A SPIN COATING DEVICE 审中-公开
公开(公告)号：US20200013614A1
公开(公告)日：2020-01-09
申请号：US16459613
申请日：2019-07-02
申请人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
发明人： Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
IPC分类号： H01L21/02 , G03F7/16 , B08B3/02
摘要： A spin coating device includes a base plate, a spin chuck on which a substrate material is placed, and an actuator mechanism to engage the base plate with the spin chuck such that the base plate synchronously spins along with the spin chuck. The substrate material includes a top surface coated with a film-forming substance and a bottom surface. The cleaning mechanism is below the base plate and out of optimal exposure to the bottom surface of the substrate material and edges thereof in a state of the base plate engagement. In response to disengagement of a lid configured to synchronously co-rotate with the base plate, the actuator mechanism is further configured to disengage the base plate from the spin chuck and to enable the optimal exposure of the cleaning mechanism to the bottom surface of the substrate material and the edges thereof.

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