专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06252803B1 Automatic program disturb with intelligent soft programming for flash cells 有权
标题翻译：自动程序干扰与闪存单元的智能软编程
公开(公告)号：US06252803B1
公开(公告)日：2001-06-26
申请号：US09692881
申请日：2000-10-23
申请人： Richard Fastow , Sameer S. Haddad , Lee E. Cleveland , Chi Chang
发明人： Richard Fastow , Sameer S. Haddad , Lee E. Cleveland , Chi Chang
IPC分类号： G11C1616
CPC分类号： G11C16/16
摘要： A method of erasing a flash electrically-erasable programmable read-only memory (EEPROM) device is provided which includes a plurality of memory cells. An erase pulse is applied to the plurality of memory cells. The plurality of memory cells is overerase verified and an overerase correction pulse is applied to the bitline to which the overerased memory cell is attached. This cycle is repeated until all cells verify as not being overerased. The plurality of memory cells is erase verified and another erase pulse is applied to the memory cells if there are undererased memory cells and the memory cells are again erase verified. This cycle is repeated until all cells verify as not being undererased. After erase verify is completed, the plurality of memory cells is soft program verified and a soft programming pulse is applied to the those memory cells in the plurality of memory cells which have a threshold voltage below a pre-defined minimum value. This cycle is repeated until all of those memory cells in the plurality of memory cells which have a threshold voltage below the pre-defined minimum value are brought above the pre-defined minimum value. The erase method is considered to be finished when there are no memory cells in the plurality of memory cells which have a threshold voltage below the pre-defined minimum value.
摘要翻译：提供擦除闪存电可擦除可编程只读存储器（EEPROM）设备的方法，其包括多个存储器单元。擦除脉冲被施加到多个存储单元。多个存储器单元被过度验证，并且过高修正脉冲被施加到被过度存储的存储单元附着的位线。重复此循环，直到所有的单元格都被验证为不被过高。多个存储器单元被擦除验证，并且如果存在未存储的存储器单元并且存储器单元再次被擦除验证，则另一个擦除脉冲被施加到存储器单元。重复此循环，直到所有单元格都被验证为不被忽略。在擦除验证完成之后，多个存储器单元被软件程序验证，并且将软编程脉冲施加到具有低于预定义最小值的阈值电压的多个存储单元中的那些存储单元。重复该循环，直到具有低于预定义最小值的阈值电压的多个存储器单元中的所有那些存储器单元高于预定义的最小值。当多个存储单元中没有存储单元的阈值电压低于预先定义的最小值时，擦除方法被认为是完成的。

2. 发明授权

US06400608B1 Accurate verify apparatus and method for NOR flash memory cells in the presence of high column leakage 有权
标题翻译：在存在高柱泄漏的情况下，NOR闪存单元的精确验证装置和方法
公开(公告)号：US06400608B1
公开(公告)日：2002-06-04
申请号：US09842288
申请日：2001-04-25
申请人： Richard Fastow , Sameer S. Haddad , Lee E. Cleveland
发明人： Richard Fastow , Sameer S. Haddad , Lee E. Cleveland
IPC分类号： G11C1134
CPC分类号： G11C16/3422 , G11C16/344 , G11C16/3445
摘要： A technique is provided for reducing column leakage in a flash EEPROM device during an erase verification process, thereby preventing false verifies. The technique has application in NOR arrays or other types of arrays in which a number of cells are connected in parallel. The technique operates by reducing the leakage of the unselected cells in parallel to the selected cell being verified, thereby preventing false verifies. The technique can also be used in conjunction with other techniques for reducing column leakage, such as soft programming, automatic programming disturb erase (APDE), or various other Vth compacting schemes.
摘要翻译：提供了一种在擦除验证过程中减少闪存EEPROM器件中的列泄漏的技术，从而防止虚假验证。该技术在NOR阵列或其他类型的阵列中的应用，其中多个单元并联连接。该技术通过减少未被选择的小区的泄漏与所验证的所选择的小区并行，从而防止虚假验证来进行操作。该技术还可以与减少列泄漏的其他技术结合使用，例如软编程，自动编程干扰擦除（APDE）或各种其他Vth压缩方案。

3. 发明授权

US06294430B1 Nitridization of the pre-ddi screen oxide 有权
标题翻译： ddi屏幕氧化物的氮化
公开(公告)号：US06294430B1
公开(公告)日：2001-09-25
申请号：US09495213
申请日：2000-01-31
申请人： Richard Fastow , Sameer S. Haddad , Daniel Sobek
发明人： Richard Fastow , Sameer S. Haddad , Daniel Sobek
IPC分类号： H01L21336
CPC分类号： H01L29/66825 , H01L21/28273 , H01L21/3144 , H01L29/511 , H01L29/7883 , Y10S438/923
摘要： A flash memory device and a method of manufacturing the flash memory device having high reliability in which a gate stack is formed on a tunnel oxide formed on a substrate and a layer of oxide is formed on the surfaces of the gate stack and exposed surfaces of the substrate. Nitrogen is diffused into the layer of oxide.
摘要翻译：闪存器件和制造具有高可靠性的闪速存储器件的方法，其中栅极堆叠形成在形成在衬底上的隧道氧化物上，并且氧化物层形成在栅极堆叠的表面上，基质。氮气扩散到氧化物层中。

4. 发明授权

US06911704B2 Memory cell array with staggered local inter-connect structure 失效
公开(公告)号：US06911704B2
公开(公告)日：2005-06-28
申请号：US10685044
申请日：2003-10-14
申请人： Mark W. Randolph , Sameer S. Haddad , Timothy Thurgate , Richard Fastow
发明人： Mark W. Randolph , Sameer S. Haddad , Timothy Thurgate , Richard Fastow
IPC分类号： G11C16/04 , H01L21/8246 , H01L21/8247 , H01L27/115 , H01L27/082
CPC分类号： H01L27/11568 , G11C16/0483 , H01L27/115 , H01L27/11521
摘要： A memory cell array comprises a two dimensional array of memory cells fabricated on a semiconductor substrate. The memory cells are arranged in a plurality of rows and a plurality columns. Each column of memory cells comprising a plurality of alternating channel regions and source/drain regions. A conductive interconnect is positioned above each source/drain region and coupled to only one other source/drain region. The one other source/drain region is in a second column that is adjacent to the column. The conductive interconnects are positioned such that every other conductive interconnect connects to the adjacent column to a right side of the column and every other conductive interconnect connects to adjacent column to the left side of the column. A plurality of source/drain control lines extends between adjacent columns of memory cells and electrically couples to each conductive interconnect that couples between the adjacent columns.

5. 发明授权

US06438037B1 Threshold voltage compacting for non-volatile semiconductor memory designs 失效
标题翻译：用于非易失性半导体存储器设计的阈值电压压缩
公开(公告)号：US06438037B1
公开(公告)日：2002-08-20
申请号：US09851773
申请日：2001-05-09
申请人： Richard Fastow , Xin Guo , Sameer S. Haddad
发明人： Richard Fastow , Xin Guo , Sameer S. Haddad
IPC分类号： G11C1606
CPC分类号： G11C16/3409 , G11C16/3404
摘要： A flash memory design with a compact threshold voltage distribution and a method for compacting the threshold voltage for a flash memory design in which the threshold voltage is compacted by erasing a plurality of memory cells to set the threshold voltage for the memory cells substantially towards a median erased threshold voltage; verifying at least one fast-erase memory cell; selectively soft-programming the memory cells; and erasing subsequent to selectively soft-programming.
摘要翻译：具有紧凑阈值电压分布的快闪存储器设计和用于压缩闪速存储器设计的阈值电压的方法，其中阈值电压通过擦除多个存储器单元而被压缩，以将存储器单元的阈值电压基本上朝向中位数擦除阈值电压; 验证至少一个快速擦除存储器单元; 选择性地软编程存储器单元; 并且在选择性软编程之后擦除。

6. 发明授权

US06469939B1 Flash memory device with increase of efficiency during an APDE (automatic program disturb after erase) process 有权
标题翻译：闪存器件在APDE期间提高效率（擦除后的自动程序干扰）过程
公开(公告)号：US06469939B1
公开(公告)日：2002-10-22
申请号：US09969572
申请日：2001-10-01
申请人： Zhigang Wang , Richard Fastow , Sheung-Hee Park , Sameer S. Haddad , Chi Chang
发明人： Zhigang Wang , Richard Fastow , Sheung-Hee Park , Sameer S. Haddad , Chi Chang
IPC分类号： G11C1604
CPC分类号： G11C16/3409 , G11C16/10 , G11C16/12 , G11C16/3404
摘要： A source resistor or a positive voltage is coupled to the source and a negative bias voltage is applied at the substrate or p-well of flash memory cells for enhanced efficiency during programming and/or during an APDE (Automatic Program Disturb after Erase) process for a flash memory device. Furthermore, in a system and method for programming the flash memory device, a flash memory cell of the array of multiple flash memory cells is selected to be programmed. A control gate programming voltage is applied to the control gate of the selected flash memory cell, and a bit line programming voltage is applied to the drain of the selected flash memory cell via the common bit line terminal to which the drain of the selected flash memory cell is connected.
摘要翻译：源极电阻或正电压耦合到源极，并且在闪存单元的衬底或p阱处施加负偏置电压，以在编程期间和/或在APDE（擦除后自动程序干扰）处理期间提高效率闪存设备。此外，在用于对闪速存储器件进行编程的系统和方法中，选择多个闪速存储器单元的阵列中的闪存单元进行编程。控制栅极编程电压被施加到所选择的闪速存储器单元的控制栅极，并且位线编程电压通过公共位线端子被施加到所选择的闪存单元的漏极，所述公共位线端子选择闪存的漏极单元格已连接。

7. 发明授权

US06452840B1 Feedback method to optimize electric field during channel erase of flash memory devices 有权
标题翻译：用于优化闪存器件通道擦除期间电场的反馈方法
公开(公告)号：US06452840B1
公开(公告)日：2002-09-17
申请号：US09693649
申请日：2000-10-21
申请人： Ravi S. Sunkavalli , Lee Cleveland , Sameer S. Haddad , Richard Fastow , Tim Thurgate
发明人： Ravi S. Sunkavalli , Lee Cleveland , Sameer S. Haddad , Richard Fastow , Tim Thurgate
IPC分类号： G11C1604
CPC分类号： G11C16/3477 , G11C16/344 , G11C16/3445 , G11C16/3472
摘要： A method of erasing a flash memory device that improves reliability and reduces the decrease in erase speed. The state of erasure is determined either during an erase phase or a verify phase and the information is fedback to a controller that adjusts the erase vertical electrical field that is to be applied to the array. The vertical electrical field is adjusted by changing the gate voltage, the well voltage or changing both simultaneously.
摘要翻译：一种擦除闪速存储器件的方法，其提高可靠性并减少擦除速度的降低。在擦除阶段或验证阶段期间确定擦除状态，并将信息反馈到调整要应用于阵列的擦除垂直电场的控制器。通过改变栅极电压，井电压或同时改变两者来调节垂直电场。

8. 发明授权

US06974989B1 Structure and method for protecting memory cells from UV radiation damage and UV radiation-induced charging during backend processing 有权
标题翻译：用于保护记忆细胞免受后期处理中的紫外线辐射损伤和紫外线辐射诱导的充电的结构和方法
公开(公告)号：US06974989B1
公开(公告)日：2005-12-13
申请号：US10841933
申请日：2004-05-06
申请人： Cinti X. Chen , Boon-Yong Ang , Hajime Wada , Sameer S. Haddad , Inkuk Kang
发明人： Cinti X. Chen , Boon-Yong Ang , Hajime Wada , Sameer S. Haddad , Inkuk Kang
IPC分类号： H01L21/8246 , H01L21/8247 , H01L27/108 , H01L27/115
CPC分类号： H01L27/115 , H01L27/11521 , H01L27/11568
摘要： According to one exemplary embodiment, a structure comprises a substrate. The structure further comprises at least one memory cell situated on the substrate. The structure further comprises a first interlayer dielectric layer situated over the at least one memory cell and over the substrate. The structure further comprises an oxide cap layer situated on the first interlayer dielectric layer. According to this exemplary embodiment, the structure further comprises an etch stop layer comprising TCS nitride situated on the oxide cap layer, where the etch stop layer blocks UV radiation. The structure further comprises a second interlayer dielectric layer situated on the etch stop layer. The structure may further comprise a trench situated in the second interlayer dielectric layer and the etch stop layer, where the trench is filled with copper. The structure may further comprise an anti-reflective coating layer situated on the second interlayer dielectric layer.
摘要翻译：根据一个示例性实施例，一种结构包括基底。该结构还包括位于基板上的至少一个存储单元。所述结构还包括位于所述至少一个存储单元上并位于所述衬底之上的第一层间介电层。该结构还包括位于第一层间介电层上的氧化物覆盖层。根据该示例性实施例，该结构还包括位于氧化物覆盖层上的包含TCS氮化物的蚀刻停止层，其中蚀刻停止层阻挡UV辐射。该结构还包括位于蚀刻停止层上的第二层间介电层。该结构还可以包括位于第二层间电介质层和蚀刻停止层中的沟槽，其中沟槽被铜填充。该结构还可以包括位于第二层间介电层上的抗反射涂层。

9. 发明授权

US06808996B1 Method for protecting gate edges from charge gain/loss in semiconductor device 有权
标题翻译：在半导体器件中保护栅极边缘免受电荷增益/损耗的方法
公开(公告)号：US06808996B1
公开(公告)日：2004-10-26
申请号：US09376659
申请日：1999-08-18
申请人： Tuan D. Pham , Mark T. Ramsbey , Sameer S. Haddad , Angela T. Hui , Yu Sun , Chi Chang
发明人： Tuan D. Pham , Mark T. Ramsbey , Sameer S. Haddad , Angela T. Hui , Yu Sun , Chi Chang
IPC分类号： H01L21336
CPC分类号： H01L27/11521 , H01L27/115
摘要： A method for making a ULSI MOSFET includes covering core gate stacks with a first protective layer, etching away the first layer such that intended source regions of the substrate are exposed, and implanting dopant into the source regions. A second protective layer is then deposited over the first layer and is etched back to conform to the first layer, covering only the sides of the gate stacks, and exposing intended drain regions of the substrate. Dopant is then implanted into the drain regions. During subsequent manufacturing steps including ILD formation and metallization, mobile ions and other process-induced charges are blocked from entering the floating gates of the gate stacks by the protective layers, thereby preventing unwanted charge gain/loss.
摘要翻译：制造ULSI MOSFET的方法包括用第一保护层覆盖芯栅极叠层，蚀刻掉第一层，使得衬底的预期源极区域暴露，并将掺杂剂注入到源极区域中。然后在第一层上沉积第二保护层，并将其回蚀刻以符合第一层，仅覆盖栅极堆叠的侧面，并暴露衬底的预期漏极区域。然后将掺杂剂注入漏区。在包括ILD形成和金属化的后续制造步骤期间，阻止移动离子和其它工艺感应电荷被保护层进入栅极堆叠的浮置栅极，从而防止不必要的电荷增益/损耗。

10. 发明授权

US06795357B1 Method for reading a non-volatile memory cell 失效
标题翻译：读取非易失性存储单元的方法
公开(公告)号：US06795357B1
公开(公告)日：2004-09-21
申请号：US10283590
申请日：2002-10-30
申请人： Zhizheng Liu , Yi He , Mark W. Randolph , Sameer S. Haddad
发明人： Zhizheng Liu , Yi He , Mark W. Randolph , Sameer S. Haddad
IPC分类号： G11C700
CPC分类号： G11C16/0491 , G11C16/0475 , G11C16/26
摘要： A method of detecting a charge stored on a charge storage region of a first dual bit dielectric memory cell within an array of dual bit dielectric memory cells comprises applying a source voltage to a first bit line that is the source of the selected memory cell and applying a drain voltage to a second bit line that forms a drain junction with the channel region. The source voltage may be a small positive voltage and the drain voltage may be greater than the source voltage. A read voltage is applied to a selected one of the word lines that forms a gate over the charge storage region and a bias voltage is applied to non-selected word lines in the array. The bias voltage may be a negative voltage.
摘要翻译：检测存储在双位介质存储器单元阵列内的第一双位介质存储单元的电荷存储区域上的电荷的方法包括将源电压施加到作为所选存储单元的源的第一位线并施加到与沟道区形成漏极结的第二位线的漏极电压。源极电压可以是小的正电压，并且漏极电压可能大于源极电压。将读取电压施加到在电荷存储区域上形成栅极的所选择的一条字线，并且将偏置电压施加到阵列中的未选择的字线。偏置电压可以是负电压。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式