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    • 5. 发明授权
    • Photopolymerizable recording materials and photoresist layers and
lithographic printing plates based thereon
    • 基于此可光聚合记录材料和光致抗蚀剂层和平版印刷版
    • US4886735A
    • 1989-12-12
    • US195008
    • 1988-05-17
    • Andreas BoettcherMartin FischerReinhard AldagThomas Bluemel
    • Andreas BoettcherMartin FischerReinhard AldagThomas Bluemel
    • G03C1/00G03F7/031
    • G03F7/031Y10S430/116Y10S430/12Y10S430/121
    • Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system(a) one or more colorless or virtually colorless organic compounds which are oxidizable to colored compounds, and(b) a photooxidant for the colorless or virtually colorless organic compound(s) (a),wherein photooxidant (b) comprises an organic salt with a substituted or unsubstituted hetaromatic system, this hetaromatic system having one or more built-in groups of the general formula (I) ##STR1## where R is substituted or unsubstituted alkenyl, alkynyl, hetaryl, alkoxycarbonyl, carbamoyl, alkylsulfonyl or arylsulfonylaminosulfinyl, substituted cycloalkyl or a substituted or unsubstituted hetaryl cation, with the proviso that the maximum of the long-wave absorption band of the salt is below 400 nm.
    • 适用于生产光致抗蚀剂层和平版印刷版的光聚合记录材料由一种或多种可光聚合的烯属不饱和有机化合物,任选的聚合物粘合剂,一种或多种光聚合引发剂,在光化光照射下引起的着色系统 记录材料的颜色强度,敏化剂和任选的其它添加剂和/或辅助物质,并且包含作为成色体系(a)一种或多种可有色化合物可氧化的无色或几乎无色的有机化合物,和(b )一种用于无色或几乎无色的有机化合物(a)的光氧化剂,其中光氧化剂(b)包含具有取代或未取代的整数系统的有机盐,该该共混体系具有一个或多个内置的通式 (I)其中R是取代或未取代的烯基,炔基,杂芳基,烷基 氧羰基,氨基甲酰基,烷基磺酰基或芳基磺酰氨基亚磺酰基,取代的环烷基或取代或未取代的杂芳基阳离子,条件是盐的长波吸收带的最大值低于400nm。