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1. 发明授权

US4886735A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon 失效
标题翻译：基于此可光聚合记录材料和光致抗蚀剂层和平版印刷版
公开(公告)号：US4886735A
公开(公告)日：1989-12-12
申请号：US195008
申请日：1988-05-17
申请人： Andreas Boettcher , Martin Fischer , Reinhard Aldag , Thomas Bluemel
发明人： Andreas Boettcher , Martin Fischer , Reinhard Aldag , Thomas Bluemel
IPC分类号： G03C1/00 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/116 , Y10S430/12 , Y10S430/121
摘要： Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system(a) one or more colorless or virtually colorless organic compounds which are oxidizable to colored compounds, and(b) a photooxidant for the colorless or virtually colorless organic compound(s) (a),wherein photooxidant (b) comprises an organic salt with a substituted or unsubstituted hetaromatic system, this hetaromatic system having one or more built-in groups of the general formula (I) ##STR1## where R is substituted or unsubstituted alkenyl, alkynyl, hetaryl, alkoxycarbonyl, carbamoyl, alkylsulfonyl or arylsulfonylaminosulfinyl, substituted cycloalkyl or a substituted or unsubstituted hetaryl cation, with the proviso that the maximum of the long-wave absorption band of the salt is below 400 nm.
摘要翻译：适用于生产光致抗蚀剂层和平版印刷版的光聚合记录材料由一种或多种可光聚合的烯属不饱和有机化合物，任选的聚合物粘合剂，一种或多种光聚合引发剂，在光化光照射下引起的着色系统记录材料的颜色强度，敏化剂和任选的其它添加剂和/或辅助物质，并且包含作为成色体系（a）一种或多种可有色化合物可氧化的无色或几乎无色的有机化合物，和（b ）一种用于无色或几乎无色的有机化合物（a）的光氧化剂，其中光氧化剂（b）包含具有取代或未取代的整数系统的有机盐，该该共混体系具有一个或多个内置的通式（I）其中R是取代或未取代的烯基，炔基，杂芳基，烷基氧羰基，氨基甲酰基，烷基磺酰基或芳基磺酰氨基亚磺酰基，取代的环烷基或取代或未取代的杂芳基阳离子，条件是盐的长波吸收带的最大值低于400nm。

2. 发明授权

US4962011A Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon 失效
标题翻译：含有三唑增感剂和光致抗蚀剂层的光聚合记录材料和基于其的平版印刷版
公开(公告)号：US4962011A
公开(公告)日：1990-10-09
申请号：US194954
申请日：1988-05-17
申请人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
发明人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
IPC分类号： G03C1/00 , G03F7/00 , G03F7/004 , G03F7/028 , G03F7/031
CPC分类号： G03F7/031
摘要： Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain benzotriazole compound as a sensitizer and optionally further additive and/or auxiliary substances.
摘要翻译：适用于特别用于制备光致抗蚀剂层和平版印刷版的新型可光聚合记录材料由一种或多种可光聚合的烯属不饱和有机化合物，任选的聚合物粘合剂，光聚合引发剂，由成色剂和光氧化剂组成的成色体系，某些苯并三唑化合物作为敏化剂和任选的其它添加剂和/或辅助物质。

3. 发明授权

US4891301A Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds 失效
标题翻译：可光聚合记录材料，光致抗蚀剂层和基于平板印刷版的基于theron的新型4-喹唑酮化合物
公开(公告)号：US4891301A
公开(公告)日：1990-01-02
申请号：US196078
申请日：1988-05-17
申请人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
发明人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
IPC分类号： G03C1/00 , C07D239/91 , G03F7/031 , G03F7/105
CPC分类号： G03F7/031 , G03F7/105 , Y10S430/116 , Y10S430/121
摘要： Abstract of the disclosure: Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, novel 4-quinazolone compounds as sensitizers of the formula (I) ##STR1##
摘要翻译：本发明摘要：适用于制备光致抗蚀剂层和平版印刷版的新型光聚合记录材料由一种或多种可光聚合的烯属不饱和有机化合物，光聚合引发剂，由成色剂和光氧化剂组成的成色体系，新颖的4-喹唑酮化合物作为式（I）的敏化剂

4. 发明授权

US4940649A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon 失效
标题翻译：基于此可光聚合记录材料和光致抗蚀剂层和平版印刷版
公开(公告)号：US4940649A
公开(公告)日：1990-07-10
申请号：US196079
申请日：1988-05-17
申请人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz , Friedrich-Wilhelm Raulfs
发明人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz , Friedrich-Wilhelm Raulfs
IPC分类号： G03C1/00 , G03F7/00 , G03F7/004 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/127
摘要： Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain 4-phenylpyridine as sensitizer and optionally further additive and/or auxiliary substances.
摘要翻译：适用于特别用于制备光致抗蚀剂层和平版印刷版的新型可光聚合记录材料由一种或多种可光聚合的烯属不饱和有机化合物，任选的聚合物粘合剂，光聚合引发剂，由成色剂和光氧化剂组成的成色体系，某些4-苯基吡啶作为敏化剂和任选的其它添加剂和/或辅助物质。

5. 发明授权

US4908448A 4-Quinazolone compounds 失效
标题翻译： 4-喹唑啉酮化合物
公开(公告)号：US4908448A
公开(公告)日：1990-03-13
申请号：US389888
申请日：1989-08-04
申请人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
发明人： Reinhard Aldag , Peter Neumann , Andreas Boettcher , Thomas Bluemel , Friedrich Seitz
IPC分类号： G03C1/00 , C07D239/91 , G03F7/031 , G03F7/105
CPC分类号： G03F7/031 , G03F7/105 , Y10S430/116 , Y10S430/121
摘要： Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, novel 4-quinazolone compounds as sensitizers and optionally further additive and/or auxiliary substances.

6. 发明授权

US4814256A Optical recording material 失效
标题翻译：光学记录材料
公开(公告)号：US4814256A
公开(公告)日：1989-03-21
申请号：US069231
申请日：1987-07-02
申请人： Reinhard Aldag , Peter Neumann
发明人： Reinhard Aldag , Peter Neumann
IPC分类号： C09B47/04 , B41M5/26 , G11B7/244 , G11B7/248 , G11B7/24 , G01D9/00 , G03C1/72
CPC分类号： G11B7/248 , Y10S430/146
摘要： An optical recording material possesses a light-absorbing layer on a base, the said layer containing one or more colorants of the formula (I) ##STR1## where M is two hydrogen atoms or Fe, Cu, Co, Ni, Pb, Cr, Mn, VO, TiO, ZrO, Nb, Ta, Pd, SiCl.sub.2, Sn or SnX.sub.2, X is Cl, Br or I, and A is a divalent radical of an unsaturated, unsubstituted or substituted carbocyclic ring system.The colorants (I) present on the novel recording materials have a high absorption in the range from 650 to 850 nm and accordingly can be written on and read by means of a laser. The colorants can be applied as 20-1000 nm layers on a suitable base by vapor deposition or as a solution or dispersion, with or without the addition of a polymeric binder, by a conventional method.The layers are very stable to atmospheric influences and daylight.
摘要翻译：光学记录材料在基底上具有光吸收层，所述层含有一种或多种式（I）的着色剂，其中M是两个氢原子或Fe，Cu，Co，Ni，Pb ，Cr，Mn，VO，TiO，ZrO，Nb，Ta，Pd，SiCl 2，Sn或SnX 2，X是Cl，Br或I，A是不饱和的，未取代的或取代的碳环系的二价基团。存在于新型记录材料上的着色剂（I）在650至850nm的范围内具有高吸收，因此可以通过激光器写入和读取。通过常规方法，着色剂可以通过气相沉积或作为溶液或分散体在有或没有添加聚合物粘合剂的情况下作为20-1000nm层施加在合适的基底上。这些层对大气影响和日光非常稳定。

7. 发明授权

US4987220A Purification of poly(n-vinylcarbazole) containing impurities 失效
标题翻译：纯化含有杂质的聚（正乙烯基咔唑）
公开(公告)号：US4987220A
公开(公告)日：1991-01-22
申请号：US278354
申请日：1988-12-01
申请人： Reinhard Aldag , Peter Neumann
发明人： Reinhard Aldag , Peter Neumann
IPC分类号： G03G5/07 , C08F6/00 , C08F6/28 , C08F26/12
CPC分类号： C08F6/28
摘要： Poly-N-vinylcarbazole containing impurities is purified by a process in which the poly-N-vinylcarbazole to be purified is treated in a suitable apparatus at from 20.degree. to 150.degree. C. with an extracting agent.
摘要翻译：含有N-乙烯基咔唑的杂质通过其中待纯化的聚-N-乙烯基咔唑在20至150℃的适当设备中用提取剂进行处理的方法进行纯化。

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