专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110044172A1 Method and Protocol for Congestion Control in a Vehicular Network 有权
标题翻译：车辆网络拥塞控制方法与协议
公开(公告)号：US20110044172A1
公开(公告)日：2011-02-24
申请号：US12543944
申请日：2009-08-19
申请人： Raymond Yim , Fei Ye , Masashi Saito , Philip V. Orlik
发明人： Raymond Yim , Fei Ye , Masashi Saito , Philip V. Orlik
IPC分类号： H04L12/56
CPC分类号： H04L47/19 , H04L47/14 , H04L51/38 , H04L67/12 , H04L69/321 , H04W4/12 , H04W28/22 , H04W76/50 , H04W84/18
摘要： In a vehicle ad-hoc network (VANET), a transceiver node is arranged in a vehicle. The node includes a protocol stack, which includes an application layer, a link layer; and a congestion control layer arranged between the application layer and the link layer. The congestion layer transfers short messages between the application layer and the link layer. The short messages are defined according to a standard for the VANET, and the congestion layer optimizes a network-wide rate allocation for the short messages.
摘要翻译：在车辆自组织网络（VANET）中，在车辆中布置收发器节点。节点包括协议栈，其包括应用层，链路层; 以及布置在所述应用层和所述链路层之间的拥塞控制层。拥塞层在应用层和链路层之间传输短消息。短消息根据VANET的标准进行定义，拥塞层优化了短消息的全网速率分配。

2. 发明授权

US08233389B2 Method and protocol for congestion control in a vehicular network 有权
标题翻译：车辆网络中拥塞控制的方法和协议
公开(公告)号：US08233389B2
公开(公告)日：2012-07-31
申请号：US12543944
申请日：2009-08-19
申请人： Raymond Yim , Fei Ye , Masashi Saito , Philip V. Orlik
发明人： Raymond Yim , Fei Ye , Masashi Saito , Philip V. Orlik
IPC分类号： H04L12/26
CPC分类号： H04L47/19 , H04L47/14 , H04L51/38 , H04L67/12 , H04L69/321 , H04W4/12 , H04W28/22 , H04W76/50 , H04W84/18
摘要： In a vehicle ad-hoc network (VANET), a transceiver node is arranged in a vehicle. The node includes a protocol stack, which includes an application layer, a link layer; and a congestion control layer arranged between the application layer and the link layer. The congestion layer transfers short messages between the application layer and the link layer. The short messages are defined according to a standard for the VANET, and the congestion layer optimizes a network-wide rate allocation for the short messages.
摘要翻译：在车辆自组织网络（VANET）中，在车辆中布置收发器节点。节点包括协议栈，其包括应用层，链路层; 以及布置在所述应用层和所述链路层之间的拥塞控制层。拥塞层在应用层和链路层之间传输短消息。短消息根据VANET的标准进行定义，拥塞层优化了短消息的全网速率分配。

3. 发明授权

US08174374B2 Method and system for coding digital information in lane markings using an optical sensor 有权
标题翻译：使用光学传感器对通道标记中的数字信息进行编码的方法和系统
公开(公告)号：US08174374B2
公开(公告)日：2012-05-08
申请号：US12495419
申请日：2009-06-30
申请人： Raymond Yim , Masashi Saito , Fatih M. Porikli , Jinyun Zhang
发明人： Raymond Yim , Masashi Saito , Fatih M. Porikli , Jinyun Zhang
IPC分类号： G08B21/00
CPC分类号： G06K9/00798 , G01C21/3602 , G05D1/0234 , G05D2201/0213 , G06K19/06009
摘要： A road surface includes lane marking that store digital information. Images of the road surface and lane markings are acquired by a camera. The digital information is decoded from the images, analyzed so that a feedback signal can be generated according to the decoded digital information.
摘要翻译：路面包括存储数字信息的车道标记。路面和车道标记的图像由相机获取。从图像中解码数字信息，进行分析，使得可以根据解码的数字信息生成反馈信号。

4. 发明申请

US20100328054A1 Method and System for Coding Digital Information in Lane Markings 有权
标题翻译：车道标记中数字信息编码的方法与系统
公开(公告)号：US20100328054A1
公开(公告)日：2010-12-30
申请号：US12495419
申请日：2009-06-30
申请人： Raymond Yim , Masashi Saito , Fatih M. Porikli , Jinyun Zhang
发明人： Raymond Yim , Masashi Saito , Fatih M. Porikli , Jinyun Zhang
IPC分类号： G06K9/36 , B60Q1/00
CPC分类号： G06K9/00798 , G01C21/3602 , G05D1/0234 , G05D2201/0213 , G06K19/06009
摘要： A road surface includes lane marking that store digital information. Images of the road surface and lane markings are acquired by a camera. The digital information is decoded from the images, analyzed so that a feedback signal can be generated according to the decoded digital information.
摘要翻译：路面包括存储数字信息的车道标记。路面和车道标记的图像由相机获取。从图像中解码数字信息，进行分析，使得可以根据解码的数字信息生成反馈信号。

5. 发明授权

US09082592B2 Plasma processing apparatus and processing gas supply structure thereof 有权
标题翻译：等离子体处理装置及其处理气体供应结构
公开(公告)号：US09082592B2
公开(公告)日：2015-07-14
申请号：US13159585
申请日：2011-06-14
申请人： Masashi Saito
发明人： Masashi Saito
IPC分类号： C23F1/08 , C23C16/455 , H01J37/32 , H01L21/67
CPC分类号： H01J37/3244 , C23C16/45563 , H01J37/321 , H01J37/32449 , H01L21/67069
摘要： There is provided a plasma processing apparatus for performing a plasma process on a substrate mounted on a mounting table in a processing chamber by generating inductively coupled plasma within the processing chamber by applying a high frequency power to a high frequency antenna. The apparatus includes a multiple number of gas nozzles protruding from a sidewall of the processing chamber toward a center of the processing chamber in a space above the mounting table, and each gas nozzle has a gas discharge hole at a leading end of the gas nozzle in a protruding direction and a gas discharge hole at a sidewall of the gas nozzle. Further, the apparatus includes a rotation device configured to rotate each of the gas nozzles on each central axis of the gas nozzles and each central axis is extended in the protruding direction of each of the gas nozzles.
摘要翻译：提供了一种等离子体处理装置，用于通过对高频天线施加高频功率，通过在处理室内产生感应耦合等离子体，在安装在处理室中的安装台上的基板上进行等离子体处理。该装置包括多个气体喷嘴，其从处理室的侧壁向安装台上方的空间朝向处理室的中心突出，并且每个气体喷嘴在气体喷嘴的前端具有排气孔突出方向和在气体喷嘴的侧壁处的气体排出孔。此外，该装置包括旋转装置，其构造成使气体喷嘴的每个中心轴线上的每个气体喷嘴旋转，并且每个中心轴线在每个气体喷嘴的突出方向上延伸。

6. 发明授权

US08945340B2 Plasma processing apparatus, and maintenance method and assembling method of the same 有权
标题翻译：等离子体处理装置及其维护方法及组装方法
公开(公告)号：US08945340B2
公开(公告)日：2015-02-03
申请号：US12705141
申请日：2010-02-12
申请人： Masashi Saito
发明人： Masashi Saito
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32522 , H01J37/32834 , Y10T29/49826
摘要： A plasma processing apparatus includes a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object, an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber, and a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing chamber and the inside of the exhaust chamber.
摘要翻译：等离子体处理装置包括处理室，其将从气体供给源引入的处理气体转换成等离子体，并对目标物体进行等离子体处理;排气室，其与处理室内部连通，排出转换成等离子体的气体所述处理室和设置在所述排气室中的阻挡盖，以阻挡所述处理室的内部和所述排气室的内部之间的连通。

7. 发明授权

US08743248B2 Solid-state imaging device, method of driving solid-state imaging device, and image processing device 有权
标题翻译：固态成像装置，固态成像装置的驱动方法和图像处理装置
公开(公告)号：US08743248B2
公开(公告)日：2014-06-03
申请号：US13019560
申请日：2011-02-02
申请人： Masashi Saito
发明人： Masashi Saito
IPC分类号： H04N5/335
CPC分类号： H04N5/335 , H03M1/1038 , H03M1/123 , H03M1/14 , H03M1/502 , H03M1/60 , H04N5/378
摘要： An image processing device comprising: first A/D converters that receive output signals of respective columns of a plurality of pixels arranged in a matrix form, convert the output signals into first digital signals, and output the first digital signals; a second A/D converter that receives a correction signal, converts the correction signal into a second digital signal, and outputs the second digital signal; a first correction calculation unit that produces a first correction formula; a second correction calculation unit that produces a second correction formula based on the second digital signal; a determination unit that compares a coefficient of the second correction formula and a coefficient of a second correction formula produced before the second correction formula, and determines whether or not to produce the first correction formula based on the comparison result; and a signal output unit that outputs an update signal when it is determined to produce the first correction formula.
摘要翻译：一种图像处理装置，包括：第一A / D转换器，其接收以矩阵形式布置的多个像素的各列的输出信号，将输出信号转换为第一数字信号，并输出第一数字信号; 接收校正信号的第二A / D转换器，将校正信号转换为第二数字信号，并输出第二数字信号; 产生第一校正公式的第一校正计算单元; 第二校正计算单元，其基于所述第二数字信号产生第二校正公式; 确定单元，其比较第二校正公式的系数和在第二校正公式之前产生的第二校正公式的系数，并且基于比较结果来确定是否产生第一校正公式; 以及当确定产生第一校正公式时，输出更新信号的信号输出单元。

8. 发明申请

US20130243453A1 IMAGE FORMING APPARATUS AND METHOD OF CONTROLLING THE SAME 有权
标题翻译：图像形成装置及其控制方法
公开(公告)号：US20130243453A1
公开(公告)日：2013-09-19
申请号：US13836197
申请日：2013-03-15
申请人： Takayuki Horie , Hideaki Hayashi , Masashi Saito , Hideki Hadano , Osamu Morita , Satoru Yoneda
发明人： Takayuki Horie , Hideaki Hayashi , Masashi Saito , Hideki Hadano , Osamu Morita , Satoru Yoneda
IPC分类号： G03G15/00 , G03G21/00
CPC分类号： G03G21/20 , G03G21/206
摘要： An image forming apparatus has an outline surrounded by a casing. The casing has an opening. The image forming apparatus includes a fixing unit configured to fix an image formed on a recording medium, and a control unit. The fixing unit includes a heating fixing member. The control unit is configured to control an opening degree of the opening based on temperature of a surface of or in the vicinity of the heating fixing member, so as to prevent emission of a substance by an air current to outside of the casing through the opening, during an image forming operation.
摘要翻译：图像形成装置具有由壳体包围的轮廓。外壳有开口。图像形成装置包括：固定单元，被配置为固定形成在记录介质上的图像;以及控制单元。定影单元包括加热固定构件。控制单元被配置为基于加热固定构件的表面或其附近的温度来控制开口的开度，以防止物质通过气流通过开口向壳体的外部发射，在图像形成操作期间。

9. 发明申请

US20120145324A1 PLASMA PROCESSING APPARATUS AND METHOD 有权
标题翻译：等离子体加工设备和方法
公开(公告)号：US20120145324A1
公开(公告)日：2012-06-14
申请号：US13396181
申请日：2012-02-14
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
IPC分类号： H01L21/3065
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32174 , H01J37/32348 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J37/32642 , H01J37/32706 , H01J37/32834 , H01J2237/3344 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/67069
摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.
摘要翻译：一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。被配置为施加具有相对较高频率的第一RF功率的第一RF电源连接到上电极。配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。可变直流电源连接到上电极。将处理气体供给到处理室中，同时控制来自可变直流电源到上部电极的施加电压，施加电流和施加电力中的任何一个，以产生处理气体的等离子体，以进行等离子体蚀刻。

10. 发明申请

US20110094995A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
标题翻译：等离子体加工设备和等离子体处理方法
公开(公告)号：US20110094995A1
公开(公告)日：2011-04-28
申请号：US12913135
申请日：2010-10-27
申请人： Yohei Yamazawa , Chishio Koshimizu , Masashi Saito , Kazuki Denpoh , Jun Yamawaku , Hachishiro Iizuka
发明人： Yohei Yamazawa , Chishio Koshimizu , Masashi Saito , Kazuki Denpoh , Jun Yamawaku , Hachishiro Iizuka
IPC分类号： C23F1/08 , C23C16/455 , C23C16/458 , C23C16/505 , C23F1/00
CPC分类号： H01J37/321 , H01L21/31116 , H01L21/31122 , H01L21/31138
摘要： A plasma processing apparatus includes: a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit, provided in the chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a processing gas to the chamber; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the chamber. The apparatus further includes a correction coil, provided at a position outside the chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution in the chamber; and an antenna-coil distance control unit for controlling a distance between the RF antenna and the correction coil while supporting the correction coil substantially in parallel with the RF antenna.
摘要翻译：一种等离子体处理装置，包括：包括电介质窗的处理室; 设置在电介质窗外部的线圈状RF天线; 基板支撑单元，设置在所述室中，用于在其上安装目标基板; 处理气体供应单元，用于将处理气体供应到所述室; 以及RF电源单元，用于向RF天线提供RF功率，以通过腔室中的感应耦合产生处理气体的等离子体。该装置还包括校正线圈，其设置在室外的位置处，其中校正线圈将通过电磁感应与RF天线耦合，用于控制腔室中的等离子体密度分布; 以及天线线圈距离控制单元，用于在支撑基本上与RF天线并联的校正线圈的同时控制RF天线和校正线圈之间的距离。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式