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1. 发明申请

US20090087666A1 CURABLE HIGH REFRACTIVE INDEX RESINS FOR OPTOELECTRONIC APPLICATIONS 审中-公开
标题翻译：光电应用的可固化高折射率树脂
公开(公告)号：US20090087666A1
公开(公告)日：2009-04-02
申请号：US12194369
申请日：2008-08-19
申请人： Ramil-Marcelo L. Mercado , Robert V. Morford , Curtis Planje , Willie Perez , Tony D. Flaim , Taylor R. Bass
发明人： Ramil-Marcelo L. Mercado , Robert V. Morford , Curtis Planje , Willie Perez , Tony D. Flaim , Taylor R. Bass
IPC分类号： H01B1/12 , B05D5/12 , B32B27/06 , C08J7/04
CPC分类号： C08G59/245 , C08F283/10 , C08G59/226 , C08G59/38 , C08G65/18 , C08L63/00 , C08L63/04 , H01L51/5262 , Y10T428/31511
摘要： Novel compositions and methods of using those compositions to form high refractive index coatings are provided. The compositions preferably comprise both a reactive solvent and a high refractive index compound. Preferred reactive solvents include aromatic resins that are functionalized with one or more reactive groups (e.g., epoxides, vinyl ethers, oxetane), while preferred high refractive index compounds include aromatic epoxides, vinyl ethers, oxetanes, phenols, and thiols. An acid or crosslinking catalyst is preferably also included. The inventive compositions are stable under ambient conditions and can be applied to a substrate to form a layer and cured via light and/or heat application. The cured layers have high refractive indices and light transmissions.
摘要翻译：提供了使用这些组合物形成高折射率涂层的新型组合物和方法。组合物优选包含反应性溶剂和高折射率化合物。优选的反应性溶剂包括用一个或多个反应性基团（例如环氧化物，乙烯基醚，氧杂环丁烷）官能化的芳族树脂，而优选的高折射率化合物包括芳族环氧化物，乙烯基醚，氧杂环丁烷，酚和硫醇。优选还包括酸或交联催化剂。本发明的组合物在环境条件下是稳定的，并且可以施加到基底以形成层并通过光和/或热应用固化。固化层具有高折射率和光透射。

2. 发明授权

US07803458B2 Hybrid organic-inorganic polymer coatings with high refractive indices 有权
$Hybrid organic-inorganic polymer coatings with high refractive indices$
标题翻译：具有高折射率的杂化有机 - 无机聚合物涂层
公开(公告)号：US07803458B2
公开(公告)日：2010-09-28
申请号：US11246399
申请日：2005-10-07
申请人： Tony D. Flaim , Yubao Wang , Ramil-Marcelo L. Mercado
发明人： Tony D. Flaim , Yubao Wang , Ramil-Marcelo L. Mercado
IPC分类号： B32B27/18
CPC分类号： C08G79/00 , C08K5/0091 , C08K5/56 , C08L85/00 , Y10T428/25 , C08L2666/02
摘要： Novel compositions and methods of using those compositions to form metal oxide films or coatings are provided. The compositions comprise an organometallic oligomer and an organic polymer or oligomer dispersed or dissolved in a solvent system. The compositions have long shelf lives and can be prepared by easy and reliable preparation procedures. The compositions can be cured to cause conversion of the composition into films of metal oxide interdispersed with organic polymer or oligomer. The cured films have high refractive indices, high optical clarities, and good mechanical stabilities at film thicknesses of greater than about 1 μm.
摘要翻译：提供了使用这些组合物形成金属氧化物膜或涂层的新型组合物和方法。组合物包含分散或溶解在溶剂体系中的有机金属低聚物和有机聚合物或低聚物。组合物具有长的保质期，并且可以通过简单和可靠的制备方法制备。组合物可以固化以使组合物转化成与有机聚合物或低聚物分散的金属氧化物的膜。固化膜具有高折射率，高光学透明度，以及在大于约1μm的膜厚度下的良好的机械稳定性。

3. 发明授权

US09638999B2 Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography 有权
公开(公告)号：US09638999B2
公开(公告)日：2017-05-02
申请号：US12389135
申请日：2009-02-19
申请人： Jim D. Meador , Douglas J. Guerrero , Ramil-Marcelo L. Mercado
发明人： Jim D. Meador , Douglas J. Guerrero , Ramil-Marcelo L. Mercado
IPC分类号： H01L21/027 , B05D5/06 , B05D3/06 , B32B3/00 , G03F7/09 , G03F7/039 , G03F7/095 , G03F7/20
CPC分类号： G03F7/091 , G03F7/039 , G03F7/095 , G03F7/2041 , Y10T428/24521 , Y10T428/265 , Y10T428/31504
摘要： The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.

4. 发明授权

US07914974B2 Anti-reflective imaging layer for multiple patterning process 有权
标题翻译：抗反射成像层，用于多个图案化工艺
公开(公告)号：US07914974B2
公开(公告)日：2011-03-29
申请号：US11839317
申请日：2007-08-15
申请人： Douglas J. Guerrero , Ramil-Marcelo L. Mercado
发明人： Douglas J. Guerrero , Ramil-Marcelo L. Mercado
IPC分类号： G03F7/26
CPC分类号： H01L21/0274 , G03F7/0035 , G03F7/0392 , G03F7/168
摘要： Novel methods of double patterning a photosensitive resin composition are provided. The methods involve applying the photosensitive composition to a substrate and thermally crosslinking the composition. The crosslinked layer can be used to provide reflection control. Upon exposure to light, the crosslinked polymer (or oligomer or monomer) in the compositions will decrosslink, rendering the light-exposed portions soluble in typical photoresist developing solutions (e.g., alkaline developers). Advantageously, the crosslinked portions of the composition remain insoluble in the solvent used to form the photosensitive composition. As a result, the coating, lithographic, and or developing steps can be repeated multiple times in varying order, depending upon the particular process, without destroying earlier-formed patterns.
摘要翻译：提供了双重图案化感光性树脂组合物的新方法。所述方法包括将光敏组合物施加到基底上并使组合物热交联。交联层可用于提供反射控制。在曝光时，组合物中的交联聚合物（或低聚物或单体）将脱链，使光曝光部分可溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）。有利地，组合物的交联部分保持不溶于用于形成光敏组合物的溶剂中。结果，涂层，光刻和/或显影步骤可以根据特定的工艺以不同的顺序重复多次，而不会破坏早期形成的图案。

5. 发明申请

US20090111057A1 PHOTOIMAGEABLE BRANCHED POLYMER 有权
标题翻译：可分光聚合物
公开(公告)号：US20090111057A1
公开(公告)日：2009-04-30
申请号：US12261971
申请日：2008-10-30
申请人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
发明人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
IPC分类号： G03F7/20 , C08F212/32
CPC分类号： G03F7/091 , C08L25/18 , Y10S430/151
摘要： Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新颖的显影剂可溶性抗反射涂层组合物和使用这些组合物的方法。组合物包含与多官能乙烯基醚反应形成支链聚合物或低聚物的多官能酸。在使用中，将组合物施加到基底上并进行热交联。在曝光和曝光后烘烤时，固化的聚合物/低聚物将脱链和解聚，使得该层可溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）。

6. 发明授权

US06876125B2 Elastomeric polyphosphazene transducers, methods of making, and methods of use thereof 失效
标题翻译：弹性聚磷腈换能器，制造方法及其使用方法
公开(公告)号：US06876125B2
公开(公告)日：2005-04-05
申请号：US10648720
申请日：2003-08-26
申请人： Rafil A. Basheer , Ramil-Marcelo L. Mercado
发明人： Rafil A. Basheer , Ramil-Marcelo L. Mercado
IPC分类号： H01L41/193 , H01L41/08
CPC分类号： H01L41/0986 , H01L41/193 , Y10S310/80 , Y10T29/42
摘要： This disclosure relates to transducers, methods of making transducers and methods of converting between electrical energy and mechanical energy. The transducers comprise an elastomeric film disposed between two electrodes wherein at least one electrode can be a compliant electrode. The elastomeric film comprises a polyphosphazene.
摘要翻译：本公开涉及换能器，制造换能器的方法以及在电能和机械能之间转换的方法。换能器包括设置在两个电极之间的弹性体膜，其中至少一个电极可以是顺应性电极。弹性体膜包含聚磷腈。

7. 发明申请

US20090226672A1 DUAL-LAYER LIGHT-SENSITIVE DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS FOR 193-NM LITHOGRAPHY 有权
标题翻译：用于193-NM光刻的双层感光开发者可溶底部抗反射涂层
公开(公告)号：US20090226672A1
公开(公告)日：2009-09-10
申请号：US12389135
申请日：2009-02-19
申请人： Jim D. Meador , Douglas J. Guerrero , Ramil-Marcelo L. Mercado
发明人： Jim D. Meador , Douglas J. Guerrero , Ramil-Marcelo L. Mercado
IPC分类号： H01L21/027 , B05D5/06 , B05D3/06 , B32B3/00
CPC分类号： G03F7/091 , G03F7/039 , G03F7/095 , G03F7/2041 , Y10T428/24521 , Y10T428/265 , Y10T428/31504
摘要： The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.
摘要翻译：本发明提供了制造微电子结构的方法，并且由此形成的所得到的结构使用双层，光敏，可湿式显影的底部抗反射涂层叠层，以在曝光期间降低基板的反射率。本发明提供了用于抗反射涂层的染料填充和染料附着组合物。抗反射涂层是可热交联的和光化学上可交联的。底部抗反射涂层堆叠具有梯度光学性质，并与光致抗蚀剂同时发展。该方法和结构特别适用于高NA光刻工艺。

8. 发明授权

US08383318B2 Acid-sensitive, developer-soluble bottom anti-reflective coatings 有权
标题翻译：酸敏感，显影剂可溶的底部抗反射涂层
公开(公告)号：US08383318B2
公开(公告)日：2013-02-26
申请号：US12708630
申请日：2010-02-19
申请人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
发明人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/095
CPC分类号： G03F7/091
摘要： Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.
摘要翻译：提供了酸敏感的，显影剂可溶的底部抗反射涂料组合物，以及使用这些组合物的方法和由其形成的微电子结构。组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。聚合物优选包含具有金刚烷基的重复单体单元。组合物还优选包含与聚合物分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。底部抗反射涂层组合物是可热交联的，但可以在酸的存在下去交联以使显影剂可溶。

9. 发明授权

US08206893B2 Photoimageable branched polymer 有权
标题翻译：可光成像支化聚合物
公开(公告)号：US08206893B2
公开(公告)日：2012-06-26
申请号：US12261971
申请日：2008-10-30
申请人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
发明人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
IPC分类号： G03F7/20 , G03F7/30 , G03F7/38 , G03C1/825 , G03C1/835
CPC分类号： G03F7/091 , C08L25/18 , Y10S430/151
摘要： Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新颖的显影剂可溶性抗反射涂层组合物和使用这些组合物的方法。组合物包含与多官能乙烯基醚反应形成支链聚合物或低聚物的多官能酸。在使用中，将组合物施加到基底上并进行热交联。在曝光和曝光后烘烤时，固化的聚合物/低聚物将脱链和解聚，使得该层可溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）。

10. 发明授权

US07939244B2 Photosensitive hardmask for microlithography 有权
标题翻译：用于微光刻的光敏硬掩模
公开(公告)号：US07939244B2
公开(公告)日：2011-05-10
申请号：US12386594
申请日：2009-04-21
申请人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero
发明人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/38 , G03F7/40
CPC分类号： G03F7/11 , G03F7/039 , G03F7/091 , G03F7/094 , Y10S430/114 , Y10S430/128 , Y10S430/151 , Y10T428/24612 , Y10T428/24851 , Y10T428/24893
摘要： New hardmask compositions comprising non-polymeric, metal-containing nanoparticles dispersed or dissolved in a solvent system and methods of using those compositions as hardmask layers in microelectronic structures are provided. The compositions are photosensitive and capable of being rendered developer soluble upon exposure to radiation. The inventive hardmask layer is patterned simultaneously with the photoresist layer and provides plasma etch resistance for subsequent pattern transfer.
摘要翻译：提供了包含分散或溶解在溶剂体系中的非聚合的含金属纳米颗粒的新硬掩模组合物，以及在微电子结构中使用这些组合物作为硬掩模层的方法。组合物是光敏的，并且能够在暴露于辐射时使显影剂变得可溶。本发明的硬掩模层与光致抗蚀剂层同时被图案化，并为随后的图案转印提供等离子体耐蚀刻性。

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