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1. 发明申请

US20100213580A1 ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS 有权
标题翻译：酸敏感，开发者可溶底料抗反射涂料
公开(公告)号：US20100213580A1
公开(公告)日：2010-08-26
申请号：US12708630
申请日：2010-02-19
申请人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
发明人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
IPC分类号： H01L29/00 , G03F7/20 , C08L67/00
CPC分类号： G03F7/091
摘要： Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.
摘要翻译：提供了酸敏感的，显影剂可溶的底部抗反射涂料组合物，以及使用这些组合物的方法和由其形成的微电子结构。组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。聚合物优选包含具有金刚烷基的重复单体单元。组合物还优选包含与聚合物分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。底部抗反射涂层组合物是可热交联的，但可以在酸的存在下去交联以使显影剂可溶。

2. 发明授权

US08383318B2 Acid-sensitive, developer-soluble bottom anti-reflective coatings 有权
标题翻译：酸敏感，显影剂可溶的底部抗反射涂层
公开(公告)号：US08383318B2
公开(公告)日：2013-02-26
申请号：US12708630
申请日：2010-02-19
申请人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
发明人： Jim D. Meador , Joyce A. Lowes , Ramil-Marcelo L. Mercado
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/095
CPC分类号： G03F7/091
摘要： Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.
摘要翻译：提供了酸敏感的，显影剂可溶的底部抗反射涂料组合物，以及使用这些组合物的方法和由其形成的微电子结构。组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。聚合物优选包含具有金刚烷基的重复单体单元。组合物还优选包含与聚合物分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。底部抗反射涂层组合物是可热交联的，但可以在酸的存在下去交联以使显影剂可溶。

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