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1. 发明申请

US20120273658A1 MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM USING THE SAME 有权
标题翻译：使用该方法的调制装置和带电颗粒多波束平移系统
公开(公告)号：US20120273658A1
公开(公告)日：2012-11-01
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/26 , G21K5/04
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

2. 发明授权

US09287081B2 Lithography system, modulation device and method of manufacturing a fiber fixation substrate 有权
标题翻译：光刻系统，调制装置及其制造方法
公开(公告)号：US09287081B2
公开(公告)日：2016-03-15
申请号：US13281558
申请日：2011-10-26
申请人： Ralph Van Melle , Teunis Van De Peut , Henk Derks
发明人： Ralph Van Melle , Teunis Van De Peut , Henk Derks
IPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。该系统包括用于产生多个带电粒子子束的束发生器，用于根据图案对子束进行图案化的子束遮断器阵列，以及用于将图案化的子束投影到目标表面上的投影系统。遮光器阵列包括多个调制器和多个光敏元件。光敏元件布置成接收携带光束的图案数据并将光束转换成电信号。光敏元件电连接到一个或多个调制器以提供接收到的图案数据。遮光器阵列耦合到光纤固定基板，该光纤固定基板容纳多个光纤的端部，用于提供携带光束的图案数据作为具有固定连接的组合组。

3. 发明授权

US09036962B2 Arrangement of optical fibers, and a method of forming such arrangement 有权
标题翻译：光纤的布置，以及形成这种布置的方法
公开(公告)号：US09036962B2
公开(公告)日：2015-05-19
申请号：US13452558
申请日：2012-04-20
申请人： Guido De Boer , Ralph Van Melle , Teunis Van De Peut , Henk Derks , Frederik Matthias Spiegelhalder , Roy Josephus Stephanus Derks , Edwin Johannes Theodorus Smulders
发明人： Guido De Boer , Ralph Van Melle , Teunis Van De Peut , Henk Derks , Frederik Matthias Spiegelhalder , Roy Josephus Stephanus Derks , Edwin Johannes Theodorus Smulders
IPC分类号： G02B6/42 , H01J37/317 , B82Y10/00 , B82Y40/00 , G02B6/36
CPC分类号： B32B37/142 , B32B37/1284 , B32B37/1292 , B32B38/0012 , B32B2551/00 , B82Y10/00 , B82Y40/00 , G02B6/3612 , H01J37/3177 , H01J2237/0435 , H01J2237/2482 , Y10T156/1002
摘要： A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.
摘要翻译：一种形成光纤阵列的方法。该方法包括提供具有第一表面和相对的第二表面的基底。衬底设置有从第一表面延伸穿过衬底到第二表面的多个孔。另外，提供多根纤维。纤维具有直径小于孔的最小直径的纤维端。对于每个光纤，从基板的第一表面侧，将纤维插入到相应的孔中，使得光纤端位于紧邻第二表面的位置。然后纤维沿预定方向弯曲，使得纤维在预定位置处邻接孔的侧壁。最后，使用粘合剂材料将弯曲的纤维粘合在一起。

4. 发明授权

US08921758B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08921758B2
公开(公告)日：2014-12-30
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/14 , H01J5/16 , H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

5. 发明申请

US20120286168A1 DATA PATH FOR LITHOGRAPHY APPARATUS 有权
标题翻译：数据路径为LITHOGRAPHY设备
公开(公告)号：US20120286168A1
公开(公告)日：2012-11-15
申请号：US13290141
申请日：2011-11-07
申请人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
发明人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
IPC分类号： G06F11/20 , G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31754 , H01J2237/31762 , H01J2237/31793
摘要： A maskless charged particle lithography system comprises an electron-optical column and a data path. The column includes a blanker array including blanker elements. The data path comprises a preprocessing system, transmission channels, and a pattern streaming system. The lithography system is configured for exposing a target field in two passes by allocating a first beamlet subset for exposing a first field subset during a first pass and a second beamlet subset for exposing a second field subset during a second pass. A first beam selector selects a first pattern data subset containing exposure data for the first beamlet subset and a second pattern data subset containing exposure data for the second beamlet subset. Second beam selectors connect transmission channels assigned for transmitting the first pattern data subset to a first blanker elements subset, and transmission channels assigned for transmitting the second pattern data subset to a second blanker elements subset.
摘要翻译：无掩模带电粒子光刻系统包括电子 - 光学柱和数据路径。该列包括一个包含消隐元素的消隐数组。数据路径包括预处理系统，传输信道和模式流传输系统。光刻系统被配置为通过在第一次通过期间分配用于暴露第一场子集的第一子束子集和用于在第二遍期间暴露第二场子集的第二子束子集来分两次通过中的目标场曝光。第一光束选择器选择包含第一子束子集的曝光数据的第一图案数据子集和包含第二子束子集的曝光数据的第二图案数据子集。第二光束选择器将分配用于发射第一图案数据子集的传输通道连接到第一消隐元素子集，以及分配用于将第二图案数据子集发送到第二消隐元素子集的传输信道。

6. 发明授权

US08884255B2 Data path for lithography apparatus 有权
标题翻译：光刻设备的数据路径
公开(公告)号：US08884255B2
公开(公告)日：2014-11-11
申请号：US13290141
申请日：2011-11-07
申请人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
发明人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
IPC分类号： H01J37/00 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31754 , H01J2237/31762 , H01J2237/31793
摘要： A maskless charged particle lithography system comprises an electron-optical column and a data path. The column includes a blanker array including blanker elements. The data path comprises a preprocessing system, transmission channels, and a pattern streaming system. The lithography system is configured for exposing a target field in two passes by allocating a first beamlet subset for exposing a first field subset during a first pass and a second beamlet subset for exposing a second field subset during a second pass. A first beam selector selects a first pattern data subset containing exposure data for the first beamlet subset and a second pattern data subset containing exposure data for the second beamlet subset. Second beam selectors connect transmission channels assigned for transmitting the first pattern data subset to a first blanker elements subset, and transmission channels assigned for transmitting the second pattern data subset to a second blanker elements subset.
摘要翻译：无掩模带电粒子光刻系统包括电子 - 光学柱和数据路径。该列包括一个包含消隐元素的消隐数组。数据路径包括预处理系统，传输信道和模式流传输系统。光刻系统被配置为通过在第一次通过期间分配用于暴露第一场子集的第一子束子集和用于在第二遍期间暴露第二场子集的第二子束子集来分两次通过中的目标场曝光。第一光束选择器选择包含第一子束子集的曝光数据的第一图案数据子集和包含第二子束子集的曝光数据的第二图案数据子集。第二光束选择器将分配用于发射第一图案数据子集的传输通道连接到第一消隐元素子集，以及分配用于将第二图案数据子集发送到第二消隐元素子集的传输信道。

7. 发明申请

US20120292491A1 CHARGED PARTICLE BEAM MODULATOR 有权
标题翻译：充电颗粒光束调制器
公开(公告)号：US20120292491A1
公开(公告)日：2012-11-22
申请号：US13295252
申请日：2011-11-14
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
IPC分类号： G21K5/04
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/241 , H01J37/3177 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.
摘要翻译：本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

8. 发明授权

US08710465B2 Pattern data conversion for lithography system 有权
标题翻译：光刻系统的图案数据转换
公开(公告)号：US08710465B2
公开(公告)日：2014-04-29
申请号：US13293426
申请日：2011-11-10
申请人： Teunis Van De Peut , Marco Jan-Jaco Weiland
发明人： Teunis Van De Peut , Marco Jan-Jaco Weiland
IPC分类号： H01J37/06 , H01J37/07 , G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70508
摘要： A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data.
摘要翻译：一种用于在无掩模光刻机中根据图案数据曝光目标的方法和系统，其生成用于曝光目标的多个曝光子束。该方法包括以矢量格式提供输入图形数据，渲染和量化输入图案数据以产生中间图案数据，并重新采样和重新量化中间图案数据以产生输出图案数据。将输出图案数据提供给光刻机，并且基于输出图案数据调制由光刻机产生的子束。

9. 发明授权

US09691589B2 Dual pass scanning 有权
公开(公告)号：US09691589B2
公开(公告)日：2017-06-27
申请号：US13293393
申请日：2011-11-10
申请人： Teunis Van De Peut , Marco Jan-Jaco Wieland
发明人： Teunis Van De Peut , Marco Jan-Jaco Wieland
IPC分类号： H01J37/302 , H01J37/04 , H01J37/317 , H01J37/30 , B82Y10/00 , B82Y40/00 , G03F7/20
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G03F7/70475 , G06T1/20 , G06T1/60 , H01J37/045 , H01J37/3002 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/3175 , H01J2237/31761 , H01J2237/31764 , H04N1/405
摘要： A method for exposing a wafer using a plurality of charged particle beamlets. The method comprises identifying non-functional beamlets among the beamlets, allocating a first subset of the beamlets for exposing a first portion of the wafer, the first subset excluding the identified non-functional beamlets, performing a first scan for exposing the first portion of the wafer using the first subset of the beamlets, allocating a second subset of the beamlets for exposing a second portion of the wafer, the second subset also excluding the identified non-functional beamlets, and performing a second scan for exposing the second portion of the wafer using the second subset of the beamlets, wherein the first and second portions of the wafer do not overlap and together comprise the complete area of the wafer to be exposed.

10. 发明申请

US20120287410A1 DATA PATH FOR LITHOGRAPHY APPARATUS 有权
标题翻译：数据路径为LITHOGRAPHY设备
公开(公告)号：US20120287410A1
公开(公告)日：2012-11-15
申请号：US13290139
申请日：2011-11-07
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Floris Pepijn Van Der Wilt , Ernst Habekotte
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Floris Pepijn Van Der Wilt , Ernst Habekotte
IPC分类号： G03B27/00 , G06F3/12 , H04Q11/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31774
摘要： The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
摘要翻译：本发明涉及一种用于使用多个带电粒子子束来图案化靶的无掩模光刻系统。该系统包括电子光学柱，其包括用于调制子束的阻挡阵列。消隐器阵列包括用于接收数据信号的接收器和用于根据数据信号调制子束的消隐元件。该系统还包括数据路径，该数据路径包括用于处理模式数据的预处理系统和用于将处理后的图案数据发送到消隐元件的多个传输通道。数据路径还包括用于接收模式数据和产生数据信号的模式流传输系统。第一和第二信道选择器连接用于模式数据传输的所选传输信道的子集。第一通道选择器连接在预处理系统和传输通道之间。第二通道选择器连接在通道和消声器元件之间。

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