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1. 发明申请

US20120273658A1 MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM USING THE SAME 有权
标题翻译：使用该方法的调制装置和带电颗粒多波束平移系统
公开(公告)号：US20120273658A1
公开(公告)日：2012-11-01
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/26 , G21K5/04
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

2. 发明申请

US20120292491A1 CHARGED PARTICLE BEAM MODULATOR 有权
标题翻译：充电颗粒光束调制器
公开(公告)号：US20120292491A1
公开(公告)日：2012-11-22
申请号：US13295252
申请日：2011-11-14
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
IPC分类号： G21K5/04
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/241 , H01J37/3177 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.
摘要翻译：本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

3. 发明授权

US08604411B2 Charged particle beam modulator 有权
标题翻译：带电粒子束调制器
公开(公告)号：US08604411B2
公开(公告)日：2013-12-10
申请号：US13295252
申请日：2011-11-14
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis van de Peut , Henk Derks
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis van de Peut , Henk Derks
IPC分类号： H01J37/147 , G21K5/00
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/241 , H01J37/3177 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.
摘要翻译：本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

4. 发明授权

US08921758B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08921758B2
公开(公告)日：2014-12-30
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/14 , H01J5/16 , H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

5. 发明授权

US08841636B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08841636B2
公开(公告)日：2014-09-23
申请号：US12911859
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/317 , H01J37/04 , B82Y40/00 , B82Y10/00 , H01J37/07
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。束发生器被布置用于产生多个带电粒子子束。子束消隐器阵列被布置成用于图形化子束。子束遮蔽器阵列包括多个调制器和多个光敏元件。光敏元件布置成接收携带光束的图案数据，并且电连接到一个或多个调制器。屏蔽结构是导电材料，用于基本上屏蔽在光敏元件附近从调制器产生的电场。屏蔽结构被设置为预定电位。投影系统布置成将图案化的子束投影到目标表面上。

6. 发明申请

US20110260040A1 Charged particle multi-beamlet lithography system with modulation device 有权
标题翻译：带调制装置的带电粒子多光束光刻系统
公开(公告)号：US20110260040A1
公开(公告)日：2011-10-27
申请号：US12911911
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G01J1/42
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device, a plurality of modulators arranged in arrays, each modulator provided with electrodes extending on opposing sides of an aperture for generating a voltage difference across the aperture, and a plurality of light sensitive elements arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column, wherein the modulation device is subdivided into a plurality of alternating beam areas and non-beam areas, the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统。该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得子束被阻挡或不被阻挡束阻挡。调制装置包括排列成阵列的多个孔，用于使子束通过调制装置，多个以阵列排列的调制器，每个调制器设置有在孔的相对侧延伸的电极，用于产生穿过孔的电压差，以及多个以阵列排列的感光元件，用于接收调制光束并将光束转换成用于致动调制器的电信号，其中光敏元件位于列内，其中调制装置被细分为多个交替光束区域和非光束区域，调制器阵列位于光束区域中，并且光敏元件阵列位于非光束区域中，并且与相邻光束区域中的调制器连通。

7. 发明授权

US08492731B2 Charged particle multi-beamlet lithography system with modulation device 有权
标题翻译：带调制装置的带电粒子多光束光刻系统
公开(公告)号：US08492731B2
公开(公告)日：2013-07-23
申请号：US12911911
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统。该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得子束被阻挡或不被阻挡束阻挡。

8. 发明申请

US20110261340A1 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US20110261340A1
公开(公告)日：2011-10-27
申请号：US12911859
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G03B27/54 , G01J1/42
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators, wherein the shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
摘要翻译：本发明涉及一种使用多个带电粒子子束将图案转印到目标表面上的带电粒子多子束光刻系统。该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。束发生器被布置用于产生多个带电粒子子束。子束阻挡器阵列被布置成根据图案图案化多个子束。子束遮蔽器阵列包括多个调制器和多个光敏元件，光敏元件被布置成接收携带光束的图案数据并将光束转换成电信号。光敏元件电连接到一个或多个调制器以提供接收到的图案数据。屏蔽结构是用于基本上屏蔽在光敏元件附近与调制器产生的电场的导电材料，其中屏蔽结构被设置成预定电位。投影系统布置成将图案化的子束投影到目标表面上。

9. 发明授权

US08618496B2 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams 有权
标题翻译：带电粒子系统包括用于操纵一个或多个带电粒子束的操纵器装置
公开(公告)号：US08618496B2
公开(公告)日：2013-12-31
申请号：US13458861
申请日：2012-04-27
申请人： Marco Jan-Jaco Wieland , Stijn Willem Herman Karel Steenbrink , Alexander Hendrik Vincent van Veen , Alrik van den Brom
发明人： Marco Jan-Jaco Wieland , Stijn Willem Herman Karel Steenbrink , Alexander Hendrik Vincent van Veen , Alrik van den Brom
IPC分类号： G03B27/54 , H01J3/14
CPC分类号： G03F7/70 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/09 , H01J37/12 , H01J37/3177 , H01J2237/1205
摘要： A charged particle system such as a multi beam lithography system. A manipulator device manipulates one or more charged particle beams. The manipulator device includes at least one through opening in the plane of the planar substrate for passing at least one charged particle. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of the through opening and in a second set of multiple second electrodes along a second part of the perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.
摘要翻译：带电粒子系统，如多光束光刻系统。操纵器装置操纵一个或多个带电粒子束。所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于使至少一个带电粒子通过。每个通孔具有沿着通孔的周边的第一部分和沿着周边的第二部分的第二组多个第二电极中布置在第一组多个第一电极中的电极。电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

10. 发明申请

US20120286168A1 DATA PATH FOR LITHOGRAPHY APPARATUS 有权
标题翻译：数据路径为LITHOGRAPHY设备
公开(公告)号：US20120286168A1
公开(公告)日：2012-11-15
申请号：US13290141
申请日：2011-11-07
申请人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
发明人： Henk Derks , Marco Jan-Jaco Wieland , Teunis Van De Peut
IPC分类号： G06F11/20 , G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31754 , H01J2237/31762 , H01J2237/31793
摘要： A maskless charged particle lithography system comprises an electron-optical column and a data path. The column includes a blanker array including blanker elements. The data path comprises a preprocessing system, transmission channels, and a pattern streaming system. The lithography system is configured for exposing a target field in two passes by allocating a first beamlet subset for exposing a first field subset during a first pass and a second beamlet subset for exposing a second field subset during a second pass. A first beam selector selects a first pattern data subset containing exposure data for the first beamlet subset and a second pattern data subset containing exposure data for the second beamlet subset. Second beam selectors connect transmission channels assigned for transmitting the first pattern data subset to a first blanker elements subset, and transmission channels assigned for transmitting the second pattern data subset to a second blanker elements subset.
摘要翻译：无掩模带电粒子光刻系统包括电子 - 光学柱和数据路径。该列包括一个包含消隐元素的消隐数组。数据路径包括预处理系统，传输信道和模式流传输系统。光刻系统被配置为通过在第一次通过期间分配用于暴露第一场子集的第一子束子集和用于在第二遍期间暴露第二场子集的第二子束子集来分两次通过中的目标场曝光。第一光束选择器选择包含第一子束子集的曝光数据的第一图案数据子集和包含第二子束子集的曝光数据的第二图案数据子集。第二光束选择器将分配用于发射第一图案数据子集的传输通道连接到第一消隐元素子集，以及分配用于将第二图案数据子集发送到第二消隐元素子集的传输信道。

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