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1. 发明授权

US5219233A Process for controlling the operation of a print head 失效
标题翻译：控制打印头操作的过程
公开(公告)号：US5219233A
公开(公告)日：1993-06-15
申请号：US730875
申请日：1991-09-11
申请人： Ralph Bauerle , Dietmar Kottwitz , Michael Blume , Joachim Schwarzkopf
发明人： Ralph Bauerle , Dietmar Kottwitz , Michael Blume , Joachim Schwarzkopf
IPC分类号： B41J19/18 , B41J2/30 , B41J2/51 , B41J19/20 , B41J29/38 , B41J29/46
CPC分类号： B41J29/38 , B41J19/202
摘要： A process for controlling the operation of a printing head detects defects in the transport of the printing head along a printed line and if necessary corrects them. A control unit (24) controls a current source (16) which supplies current to a transport motor (12) which moves the printing head (10). The printing elements (14) of the printing head (10) are supplied with pulsed drive current (ID) by a driver component (18). A position indicator (20) records the distance travelled by the printing head (10) along a printed line. According to the invention, the transport time between two printing positions is monitored to detect whether a limit value (G) is exceeded. If the limit value (G) is exceeded, the drive of the printing head (10) is stopped and if necessary the printing head is moved in the opposite direction and/or at least one printing element (14, 15) is operated with less energy that that required for printing. As a result of these measures, a defect due to adhesion of a printing element (14) to a printing ribbon can be detected and eliminated automatically.
摘要翻译： PCT No.PCT / EP90 / 00056 Sec。 371日期1991年9月11日 102（e）1991年9月11日PCT PCT 1990年1月10日PCT公布。出版物WO90 / 08039 日期1970年7月26日。用于控制打印头的操作的处理检测打印头沿着印刷线的传送中的缺陷，并且如果需要的话更正它们。控制单元（24）控制向移动打印头（10）的运送马达（12）供给电流的电流源（16）。打印头（10）的打印元件（14）由驱动器部件（18）提供脉冲驱动电流（ID）。位置指示器（20）记录打印头（10）沿印刷线行进的距离。根据本发明，监视两个打印位置之间的传送时间，以检测是否超过限制值（G）。如果超过限制值（G），则停止打印头（10）的驱动，并且如果需要，打印头沿相反方向移动和/或至少一个打印元件（14,15）以较少的操作印刷所需的能量。作为这些措施的结果，可以自动检测和消除由于打印元件（14）与印刷色带的粘合而引起的缺陷。

2. 发明授权

US06774375B2 Method and apparatus for forming a curved polyline on a radiation-sensitive resist 失效
标题翻译：用于在辐射敏感抗蚀剂上形成弯曲折线的方法和装置
公开(公告)号：US06774375B2
公开(公告)日：2004-08-10
申请号：US09797861
申请日：2001-03-05
申请人： Rainer Plontke , Andreas Schubert , Michael Blume , Ines Stolberg
发明人： Rainer Plontke , Andreas Schubert , Michael Blume , Ines Stolberg
IPC分类号： B23K1500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/30455 , H01J2237/31761
摘要： In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.
摘要翻译：在用电子束（6）形成涂覆有辐射敏感抗蚀剂的衬底（4）上的折线的方法中，电子束（6）被引导到衬底（4）的表面上，在Z坐标的方向上，并且基板（4）在XY平面中相对于电子束（6）在各个步骤中移位。在位移的每个单独步骤之后，电子束（6）在位移运动停止期间以预定的能量输入作用在基板（4）上。根据从以前的几个步骤确定的折线的形状确定每个单独步骤的能量输入。还描述了使用电子束光刻技术的相应装置，可以形成具有非常均匀线宽的折线。该方法和装置特别适用于书写弯曲折线。

3. 发明授权

US06635884B2 Method for directing an electron beam onto a target position on a substrate surface 失效
标题翻译：将电子束引导到基板表面上的目标位置的方法
公开(公告)号：US06635884B2
公开(公告)日：2003-10-21
申请号：US09797860
申请日：2001-03-05
申请人： Rainer Plontke , Ines Stolberg , Michael Blume , Rainer Kaebsch , Matthias Zierbock
发明人： Rainer Plontke , Ines Stolberg , Michael Blume , Rainer Kaebsch , Matthias Zierbock
IPC分类号： H01J37304
CPC分类号： H01J37/3045 , H01J2237/30438 , H01J2237/3175
摘要： The invention refers to the field of electron beam lithography, in particular to a method for directing an electron beam (6) onto a target position (Z) on the surface of a substrate, the substrate first being placed onto a movable stage (2) and the stage (2) then being displaced stepwise, in the X and/or Y coordinates of a Cartesian grid, until the target position (Z) is located at a spacing from the impact point (P) of the undeflected electron beam (6) which is smaller than the smallest step distance of the stage displacement system, and then the electron beam (6) is directed onto the target position (Z) by deflection. This results in a considerable increase in positioning accuracy in electron beam lithography. Positioning accuracies on the order of 0.1 nm to 0.05 are achievable. The method is suitable in particular for writing grating patterns in which the spacing between the individual grating lines must be maintained with high accuracy.
摘要翻译：本发明涉及电子束光刻领域，特别涉及一种将电子束（6）引导到衬底表面上的目标位置（Z）上的方法，该衬底首先被放置在可动平台（2）上，然后阶段（2）在笛卡尔网格的X和/或Y坐标中逐步移位，直到目标位置（Z）位于与未偏转的电子束（6）的冲击点（P）的间隔）小于级位移系统的最小步距，然后电子束（6）通过偏转被引导到目标位置（Z）上。这导致电子束光刻中定位精度的显着提高。定位精度可达0.1〜0.05。该方法特别适用于写入光栅图案，其中必须以高准确度保持单个光栅线之间的间隔。

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