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    • 9. 发明授权
    • Method of cleaning storage case
    • 储存盒清洗方法
    • US07967917B2
    • 2011-06-28
    • US11839626
    • 2007-08-16
    • Shu ShimadaNoriyuki TakahashiHiroyuki NakajimaHiroko TanakaNobuyuki Kanda
    • Shu ShimadaNoriyuki TakahashiHiroyuki NakajimaHiroko TanakaNobuyuki Kanda
    • B08B5/02B08B9/093
    • B08B7/0071G03F1/66G03F1/82
    • The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case.
    • 本发明提供了一种清洁用于存放或传送诸如光掩模和光掩模坯料的掩模基板,诸如半导体晶片,薄膜等半导体基板的存储盒的方法。 本发明:便于定期的清洁操作,也可以用于复杂形状的储存盒,不需要大型设备或昂贵的设备来促进环境对策,并且提供高清洁效果。 清洁被有机材料的异物,物理吸收的离子性异物或离子性异物的附着物污染的储存箱的方法包括将储存箱放置在清洁空气的空气流中或惰性气体的步骤 气体在室温至80℃的温度范围内,用于解吸和除去粘附到储存盒的异物。
    • 10. 发明授权
    • Method for cleaning photo mask
    • 清洁光罩的方法
    • US07718008B2
    • 2010-05-18
    • US11839655
    • 2007-08-16
    • Shu ShimadaNoriyuki TakahashiHiroko TanakaHiroyuki IshiiYusuke ShojiMasashi Ohtsuki
    • Shu ShimadaNoriyuki TakahashiHiroko TanakaHiroyuki IshiiYusuke ShojiMasashi Ohtsuki
    • B08B7/00G01N21/00
    • G03F7/70925G03F1/64G03F1/82
    • The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.
    • 本发明提供了一种清洁光掩模的方法,而不需要除去安装在光掩模上的防护薄膜组件,而不需要用溶液洗涤的大规模设备,具有少量用于清洁和检查的步骤,并且没有 增加生产成本。 用防护薄膜组件清洁光罩的方法,其中防护薄膜组件框架具有气体导入孔和气体排出孔,包括:将气体取代物质从气体导入孔引入防护薄膜组件内部空间的步骤, 光掩模和防护薄膜组件,在光掩模上代替异物,并从排气孔排出异物; 以及从气体导入孔导入空气或氮气或稀有气体而将紫外线照射到光掩模的步骤,使取代的取代物质降解成气态,并将其从 气体排放孔。