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1. 发明授权

US07202009B2 Polymers and photoresist compositions for short wavelength imaging 有权
标题翻译：用于短波长成像的聚合物和光致抗蚀剂组合物
公开(公告)号：US07202009B2
公开(公告)日：2007-04-10
申请号：US09948526
申请日：2001-09-08
申请人： Peter Trefonas, III , Gary N. Taylor , Charles R. Szmanda
发明人： Peter Trefonas, III , Gary N. Taylor , Charles R. Szmanda
IPC分类号： G03F7/038 , G03F7/039 , G03F7/033 , G03F7/032 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.
摘要翻译：本发明涉及包含这种树脂的树脂和光致抗蚀剂组合物。本发明优选的聚合物包含相对于聚合物主链的整体或垂饰的饱和碳原子，其具有基本上高的构象。本发明的聚合物特别可用作化学放大的正性作用抗蚀剂的树脂粘合剂组分，其可以在短波长如200nm以下，优选约157nm下有效成像。在这样的短波长成像应用中，具有富含基本上高分子构象的相邻饱和碳原子的二面角群体的本发明的聚合物可以提供高能量曝光辐射的不希望的吸光度。

2. 发明授权

US06852466B2 Photoresist compositions particularly suitable for short wavelength imaging 有权
标题翻译：特别适用于短波长成像的光刻胶组合物
公开(公告)号：US06852466B2
公开(公告)日：2005-02-08
申请号：US09219468
申请日：1998-12-23
申请人： Peter Trefonas, III , Gary N. Taylor
发明人： Peter Trefonas, III , Gary N. Taylor
IPC分类号： C08K5/17 , C08L101/00 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/038
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/114
摘要： The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.
摘要翻译：本发明提供了包含树脂粘合剂，光酸产生剂化合物和加入的胺组分的新型光致抗蚀剂组合物。在第一方面，添加的胺优选为1）非芳族2）具有约9至约16个碳原子，3）不含伯胺基或仲胺基，和/或4）不含有多个叔胺基团，其中两个叔胺通过任选取代的乙烯的连接分开。在相关方面，加入的胺是非芳族胺，其包括1）叔氮脂环族成员，优选在双环或其他多环环系统之间的连接位置; 或2）不是环成员的叔氮，并被至少两个叔碳原子或季碳基团取代。

3. 发明授权

US06379861B1 Polymers and photoresist compositions comprising same 有权
标题翻译：包含其的聚合物和光致抗蚀剂组合物
公开(公告)号：US06379861B1
公开(公告)日：2002-04-30
申请号：US09510069
申请日：2000-02-22
申请人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
发明人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
IPC分类号： G03C172
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/115
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C═O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于包括193nm和248nm的短波长的情况下提供高度分辨的浮雕图像。本发明的抗蚀剂也可用于其它波长例如365nm。本发明的聚合物包括包含光生酸不稳定单元的那些，其是包含具有约5个或更多个碳原子和至少两个仲，叔或季碳原子的烷基部分的酯基。酯基的烷基部分可以是非环或单环脂环族基团。酯基的羧基（C = O（O））氧通常优选直接键合到季碳原子。

4. 发明授权

US6136501A Polymers and photoresist compositions comprising same 有权
标题翻译：包含其的聚合物和光致抗蚀剂组合物
公开(公告)号：US6136501A
公开(公告)日：2000-10-24
申请号：US143462
申请日：1998-08-28
申请人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
发明人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
IPC分类号： C07C67/14 , C07C69/54 , C08L33/08 , C08L33/10 , G03F7/004 , G03F7/028 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C.dbd.O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于包括193nm和248nm的短波长的情况下提供高度分辨的浮雕图像。本发明的抗蚀剂也可用于其它波长例如365nm。本发明的聚合物包括包含光生酸不稳定单元的那些，其是包含具有约5个或更多个碳原子和至少两个仲，叔或季碳原子的烷基部分的酯基。酯基的烷基部分可以是非环或单环脂环族基团。酯基的羧基（C = O（+ E，未取代O + EE））氧通常优选直接键合到季碳原子上。

5. 发明授权

US06749983B1 Polymers and photoresist compositions 失效
标题翻译：聚合物和光致抗蚀剂组合物
公开(公告)号：US06749983B1
公开(公告)日：2004-06-15
申请号：US09330418
申请日：1999-06-11
申请人： Gary N. Taylor , Charles R. Szmanda
发明人： Gary N. Taylor , Charles R. Szmanda
IPC分类号： G03C173
CPC分类号： C08F220/18 , C08K5/42 , G03F7/0045 , G03F7/039 , Y10S430/111 , Y10S430/115
摘要： The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.
摘要翻译：本发明提供了含有树脂粘合剂成分等聚合物的新型聚合物和化学增幅正性光致抗蚀剂组合物。本发明优选的聚合物包括能够降低聚合物酸不稳定部分有效去保护所需温度的一个或多个结构基团。

6. 发明授权

US06749986B2 Polymers and photoresist compositions for short wavelength imaging 有权
标题翻译：用于短波长成像的聚合物和光致抗蚀剂组合物
公开(公告)号：US06749986B2
公开(公告)日：2004-06-15
申请号：US09948459
申请日：2001-09-08
申请人： Gary N. Taylor , Charles R. Szmanda
发明人： Gary N. Taylor , Charles R. Szmanda
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , Y10S430/107 , Y10S430/108
摘要： The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.
摘要翻译：本发明包括新的聚合物和这种聚合物作为光致抗蚀剂组合物的树脂组分，特别是化学增强的正性光致抗蚀剂组合物的用途。本发明的聚合物和抗蚀剂对于使用短波长辐射如亚200nm，优选约157nm的成像特别有用。本发明的聚合物含有被一个或多个吸电子基团取代的酸性位点的一个或多个基团α。

7. 发明授权

US6165674A Polymers and photoresist compositions for short wavelength imaging 失效
标题翻译：用于短波长成像的聚合物和光致抗蚀剂组合物
公开(公告)号：US6165674A
公开(公告)日：2000-12-26
申请号：US7617
申请日：1998-01-15
申请人： Gary N. Taylor , George G. Barclay , Charles R. Szmanda
发明人： Gary N. Taylor , George G. Barclay , Charles R. Szmanda
IPC分类号： G03F7/039 , H01L21/027 , G03F7/004
CPC分类号： G03F7/039 , Y10S430/106 , Y10S430/111
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron features imaged at 193 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that includes a cyano moiety, as well as polymers that contain cyano and itaconic anhydride moieties in combination.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于极短波长的情况下提供高度分辨的浮雕图像，包括在193nm下成像的良好分辨的0.25微米特征。本发明的聚合物包括包含氰基部分的光生酸不稳定单元的聚合物，以及组合含有氰基和衣康酸酐部分的聚合物。

8. 发明授权

US06858379B2 Photoresist compositions for short wavelength imaging 有权
标题翻译：用于短波长成像的光刻胶组合物
公开(公告)号：US06858379B2
公开(公告)日：2005-02-22
申请号：US10101768
申请日：2002-03-20
申请人： Anthony Zampini , Charles R. Szmanda , Gary N. Taylor , James F. Cameron , Gerhard Pohlers
发明人： Anthony Zampini , Charles R. Szmanda , Gary N. Taylor , James F. Cameron , Gerhard Pohlers
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.
摘要翻译：提供了适用于短波长成像的新型光致抗蚀剂，包括亚200nm，例如157nm。一方面，本发明的抗蚀剂包含含氟聚合物，光活性组分和胺或其它碱性组合物的一种或多种另外的组分，溶解抑制剂化合物，表面活性剂或流平剂或增塑剂材料。在另一方面，本发明的抗蚀剂含有含氟树脂和一种或多种光酸产生剂化合物，特别是非芳族鎓盐和亚氨磺酸盐，以及其它非离子光酸产生剂化合物。

9. 发明授权

US6057083A Polymers and photoresist compositions 失效
标题翻译：聚合物和光刻胶组合物
公开(公告)号：US6057083A
公开(公告)日：2000-05-02
申请号：US963922
申请日：1997-11-04
申请人： Gary N. Taylor , Charles R. Szmanda
发明人： Gary N. Taylor , Charles R. Szmanda
IPC分类号： C08F220/16 , C08F220/18 , C08K5/42 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08F220/18 , C08K5/42 , G03F7/0045 , G03F7/039 , Y10S430/111 , Y10S430/115
摘要： The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.
摘要翻译：本发明提供了含有树脂粘合剂成分等聚合物的新型聚合物和化学增幅正性光致抗蚀剂组合物。本发明优选的聚合物包括能够降低聚合物酸不稳定部分有效去保护所需温度的一个或多个结构基团。

10. 发明授权

US5876899A Photoresist compositions 失效
标题翻译：光刻胶组合物
公开(公告)号：US5876899A
公开(公告)日：1999-03-02
申请号：US718099
申请日：1996-09-18
申请人： Charles R. Szmanda , Gary N. Taylor , Robert L. Brainard , Manuel DoCanto
发明人： Charles R. Szmanda , Gary N. Taylor , Robert L. Brainard , Manuel DoCanto
IPC分类号： C09D4/06 , G03F7/004 , G03F7/027 , G03F7/038 , G03F7/039 , G03C1/492 , C03F220/10
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/109 , Y10S430/117
摘要： A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.
摘要翻译：一种制备丙烯酸树脂光致抗蚀剂的方法，其特征在于在溶解所有单体和所得聚合物的溶剂中丙烯酸类单体聚合。使用溶剂允许形成适用于制备光致抗蚀剂而不从其反应混合物中回收的丙烯酸树脂。由这些聚合物制备的光致抗蚀剂具有改善的透明度，特别是在193毫微米或更小的曝光下。

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