专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08836913B2 Lithographic apparatus having an encoder type position sensor system 有权
标题翻译：光刻设备具有编码器型位置传感器系统
公开(公告)号：US08836913B2
公开(公告)日：2014-09-16
申请号：US13308388
申请日：2011-11-30
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03F7/20 , G03B27/68
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

2. 发明授权

US08760615B2 Lithographic apparatus having encoder type position sensor system 有权
标题翻译：光刻设备具有编码器型位置传感器系统
公开(公告)号：US08760615B2
公开(公告)日：2014-06-24
申请号：US12153799
申请日：2008-05-23
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/68
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

3. 发明申请

US20120075613A1 Lithographic Apparatus Having an Encoder Type Position Sensor System 有权
标题翻译：具有编码器类型位置传感器系统的平版印刷设备
公开(公告)号：US20120075613A1
公开(公告)日：2012-03-29
申请号：US13308388
申请日：2011-11-30
申请人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

4. 发明申请

US20090002653A1 Lithographic apparatus having encoder type position sensor system 有权
标题翻译：光刻设备具有编码器型位置传感器系统
公开(公告)号：US20090002653A1
公开(公告)日：2009-01-01
申请号：US12153799
申请日：2008-05-23
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Van Der Pasch , Ruud Antonius Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Van Der Pasch , Ruud Antonius Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/54 , G03B27/74
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

5. 发明申请

US20070132980A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070132980A1
公开(公告)日：2007-06-14
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
发明人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

6. 发明申请

US20070146661A1 LITHOGRAPHIC APPARATUS, AND APPARATUS AND METHOD FOR MEASURING AN OBJECT POSITION IN A MEDIUM 有权
标题翻译：平面设备，以及用于测量介质中的对象位置的装置和方法
公开(公告)号：US20070146661A1
公开(公告)日：2007-06-28
申请号：US11319194
申请日：2005-12-28
申请人： Emiel Jozef Eussen
发明人： Emiel Jozef Eussen
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70516 , G03F7/70775
摘要： A lithographic apparatus has a position measuring apparatus configured to measure a position of a substrate support or a patterning support in a medium. The position measuring apparatus has a barometer to measure a pressure of the medium, thereby providing a pressure signal. The position measuring apparatus has a distance measuring device measuring a reference distance, thereby providing a reference distance signal. The position measuring apparatus has a processor that converts the reference distance signal into a pressure-change signal; processes the pressure-change signal in a similar way as the pressure signal, thereby providing a processed pressure-change signal; determines a difference between the processed pressure-change signal and the pressure signal, thereby providing a drift signal; determines a difference between the pressure-change signal and the drift signal, thereby providing an absolute pressure signal; and corrects a position measurement on the basis of the absolute pressure signal.
摘要翻译：光刻设备具有位置测量装置，其被配置为测量介质中的基板支撑件或图案形成支撑件的位置。位置测量装置具有用于测量介质压力的气压计，从而提供压力信号。位置测量装置具有测量参考距离的距离测量装置，从而提供参考距离信号。位置测量装置具有将参考距离信号转换为压力变化信号的处理器; 以与压力信号相似的方式处理压力变化信号，从而提供经处理的压力变化信号; 确定经处理的压力变化信号和压力信号之间的差异，从而提供漂移信号; 确定压力变化信号和漂移信号之间的差，从而提供绝对压力信号; 并且基于绝对压力信号校正位置测量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式