专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070132980A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070132980A1
公开(公告)日：2007-06-14
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
发明人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

2. 发明申请

US20070222965A1 Calibration methods, lithographic apparatus and patterning device for such lithographic apparatus 有权
标题翻译：用于这种光刻设备的校准方法，光刻设备和图案形成装置
公开(公告)号：US20070222965A1
公开(公告)日：2007-09-27
申请号：US11387050
申请日：2006-03-23
申请人： Willem Herman Koenen
发明人： Willem Herman Koenen
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70516 , G03F7/70775
摘要： A calibration method to calibrate a substrate table position in a lithographic apparatus, the method including repeatedly irradiating a pattern onto a surface of the substrate so as to create a two dimensional arrangement of patterns on the surface of the substrate, the irradiating including displacing the substrate table between successive irradiations to irradiate the pattern onto different locations on the surface of the substrate, reading out the patterns in the two dimensions to obtain pattern read out results, deriving incremental position deviations from the read out results of neighbouring patterns in dependency on the position of the substrate table in the two dimensions, deriving from the incremental position deviations a position error of the substrate table as a function of the two dimensional position of the substrate table and calibrating the position of the substrate table using the position dependent position error.
摘要翻译：一种用于校准光刻设备中的基板台位置的校准方法，所述方法包括将图案重复地照射到所述基板的表面上，以在所述基板的表面上产生图案的二维排列，所述照射包括移动所述基板连续照射之间的表格，以将图案照射到基板表面上的不同位置，读出两维中的图案以获得图案读出结果，从相对于位置的读出结果导出增加的位置偏差在两个维度上，从增量位置偏移导出衬底台的位置误差作为衬底台的二维位置的函数，并使用位置相关位置误差来校准衬底台的位置。

3. 发明申请

US20060170892A1 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 有权
标题翻译：用于确定Z位置误差/变化和衬底台平面度的平版印刷设备和方法
公开(公告)号：US20060170892A1
公开(公告)日：2006-08-03
申请号：US11317230
申请日：2005-12-27
申请人： Willem Herman Koenen , Arthur Minnaert , Luberthus Ouwehand , Johannes Mathias Adriens , Wouter Pril
发明人： Willem Herman Koenen , Arthur Minnaert , Luberthus Ouwehand , Johannes Mathias Adriens , Wouter Pril
IPC分类号： G03B27/52
CPC分类号： G03F9/7049 , B23D43/04 , G03F9/7011 , G03F9/7019 , G03F9/7034 , G03F9/7088
摘要： A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table. Also provided is a controller that is configured to cause relative movement between the substrate and the level sensor array from a first position at which a first measurement is taken to a plurality of overlapping positions at which further measurements are taken, and a calculator for calculating a measure of Z position errors and/or substrate table unflatness and/or a measure of the level sensor position/offset using the plurality of overlapping measurements.
摘要翻译：一种光刻投影设备，包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为在其横截面中赋予所述光束图案;被配置为保持基板的基板台，投影系统，被配置为将所述图案化的辐射投影到所述基板的目标部分上;多个液位传感器，用于感测在多个不同位置承载在所述基板台上的基板的水平;以及系统，用于确定所述基板的位置底物台。还提供了一种控制器，其被配置为从第一位置引起基板和液位传感器阵列之间的相对运动，在第一位置处，进行进一步测量的多个重叠位置，以及计算器，使用多个重叠测量来测量Z位置误差和/或衬底台不平坦度和/或液位传感器位置/偏移的量度。

4. 发明申请

US20060139595A1 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 审中-公开
标题翻译：用于确定Z位置误差/变化和衬底台平面度的平版印刷设备和方法
公开(公告)号：US20060139595A1
公开(公告)日：2006-06-29
申请号：US11020552
申请日：2004-12-27
申请人： Willem Herman Koenen , Arthur Winfried Minnaert , Luberthus Ouwehand , Johannes Mathias Adriaens
发明人： Willem Herman Koenen , Arthur Winfried Minnaert , Luberthus Ouwehand , Johannes Mathias Adriaens
IPC分类号： G03B27/52
CPC分类号： G03F9/7049 , B23D43/04 , G03F9/7011 , G03F9/7019 , G03F9/7034 , G03F9/7088
摘要： The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.
摘要翻译：本发明涉及一种用于在至少第一测量方向上测量可移动物体相对于基座的位移的测量系统，所述可移动物体具有至少一个可在相对于基座的运动平面中移动的参考部分，参考部分的实际运动在由具有形状的封闭轮廓界定的所述运动平面的区域内。测量系统包括与平面元件可操作地连通的传感器头。传感器头安装在基座上，平面元件安装在可移动物体的参考部分上，或者相反地安装在其上，其中平面元件具有与封闭轮廓的形状基本相同的形状。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式