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    • 10. 发明授权
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US07489388B2
    • 2009-02-10
    • US10740832
    • 2003-12-22
    • Wilhelmus Josephus BoxHendrik Jan Eggink
    • Wilhelmus Josephus BoxHendrik Jan Eggink
    • G03B27/58G03B27/62
    • G03F7/707G03F7/70783G03F7/70875G03F7/709
    • A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.
    • 光刻设备包括用于将辐射束投射到衬底上的照明系统。 光刻设备还具有用于支撑基板或图案形成装置中的至少一个的卡盘组件,图案形成装置用于在其横截面中赋予光束图案。 传热系统可在第一表面和第二表面之间操作。 传热系统能够在第一表面和第二表面之间传递热量。 第一表面至少部分地由卡盘组件的至少一部分形成。 第二表面至少部分地由与卡盘间隔一定距离的部件的至少一部分形成。 第二表面与第一表面机械隔离并热耦合。