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1. 发明申请

US20130141706A1 LITHOGRAPHIC METHOD AND APPARATUS 有权
标题翻译：光刻方法和装置
公开(公告)号：US20130141706A1
公开(公告)日：2013-06-06
申请号：US13685467
申请日：2012-11-26
申请人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
发明人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
IPC分类号： G03F7/20
CPC分类号： G03F7/70425 , G03F1/144 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.
摘要翻译：一种使用投影系统将图案从图案形成装置投影到基板上的方法，该方法包括在投影系统中使用光学相位调整装置，对从图案的辅助特征衍射的辐射进行相位修改，相位改变用于减小在基板上的抗蚀剂中暴露的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，同时保持辅助特征图像对功能的图像增强的贡献模式的特征。

2. 发明申请

US20110153265A1 METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A LITHOGRAPHIC APPARATUS, DATA PROCESSING APPARATUS, AND COMPUTER PROGRAM PRODUCT 失效
标题翻译：数字处理设备和计算机程序产品测量动态定位错误属性的方法
公开(公告)号：US20110153265A1
公开(公告)日：2011-06-23
申请号：US12969289
申请日：2010-12-15
申请人： Frank STAALS , Hans Butler , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
发明人： Frank STAALS , Hans Butler , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G03F7/709 , G03F7/70625 , G03F7/70633 , G03F7/70666 , G03F7/70725 , G03F9/7088
摘要： Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.
摘要翻译：光刻设备的运动包括在一个或多个轴上的动态定位误差，其产生可以在所施加的图案中测量的相应误差。测试方法包括多次操作该设备，同时在不同的特定频率和轴处故意施加相对大的动态定位误差。对于给定的轴或轴，针对感兴趣的频带的注入误差的不同频率和幅度测量所应用模式中的误差的变化。使用所述测量和所注入的频率的知识的计算允许分析与每个注入的错误频率相关的频带中的动态定位误差变化。

3. 发明申请

US20110164229A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE 有权
标题翻译：光刻设备，设备制造方法和将图案应用于基板的方法
公开(公告)号：US20110164229A1
公开(公告)日：2011-07-07
申请号：US12969326
申请日：2010-12-15
申请人： Frank STAALS , Marcus Adrianus Van De Kerkhof
发明人： Frank STAALS , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B27/42 , G01B11/24
CPC分类号： G03F9/7003 , G03F9/7034
摘要： A lithographic apparatus includes a patterning subsystem for transferring a pattern from a patterning device onto a substrate controlled in accordance with recorded measurements of level variations across a surface of the substrate. A level sensor is provided for projecting a level sensing beam of radiation to reflect from a location on the substrate surface and for detecting the reflected sensing beam to record the surface level at said location. The level sensor incorporates at least one moving optical element to scan the substrate surface by optical movement in at least one dimension to obtain measurements of surface level at different locations without mechanical movement between the level sensor and the substrate. Optical path length equalization measures may be employed, using shaped reflectors and/or additional moving mirrors, to avoid focus variation during the scan.
摘要翻译：光刻设备包括图案化子系统，用于将图案从图案形成装置转移到基于通过衬底的表面上记录的电平变化的测量值而被控制的衬底上。提供了一种液位传感器，用于投射水平感测光束以从基板表面上的位置反射并检测反射的感测光束以记录在所述位置处的表面水平。水平传感器包括至少一个移动光学元件，以通过至少一个维度的光学运动来扫描基板表面，以获得在不同位置处的表面水平的测量，而不会在液位传感器和基板之间进行机械运动。可以采用光路长度均衡措施，使用成形的反射器和/或附加的移动反射镜，以避免扫描期间的焦点变化。

4. 发明申请

US20090268182A1 METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS 有权
标题翻译：测量抛物面投影装置的方法
公开(公告)号：US20090268182A1
公开(公告)日：2009-10-29
申请号：US12423570
申请日：2009-04-14
申请人： Frank STAALS , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
发明人： Frank STAALS , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03B27/32 , G03B27/42 , G03F7/70633 , G03F7/70641
摘要： A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.
摘要翻译：描述了一种测量光刻投影装置的方法。该方法包括将图案形成装置的验证标记成像到由光刻设备的衬底台保持的辐射敏感层上，其中验证标记至少包括具有相互不同灵敏度的第一，第二和第三验证结构配置文件用于剂量设置，对焦设置和对比度设置。

5. 发明申请

US20090201473A1 Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier 有权
标题翻译：确定曝光设置的方法，平版曝光装置，计算机程序和数据载体
公开(公告)号：US20090201473A1
公开(公告)日：2009-08-13
申请号：US12367191
申请日：2009-02-06
申请人： David Warren BURRY , Ralph BRINKHOF , Frank STAALS , Robert FRANKEN , Erik Johan KOOP
发明人： David Warren BURRY , Ralph BRINKHOF , Frank STAALS , Robert FRANKEN , Erik Johan KOOP
IPC分类号： G03B27/32 , G03B27/68 , G03B27/42
CPC分类号： G03B27/32 , G03B27/68 , G03F7/70516
摘要： Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
摘要翻译：本发明的实施例涉及一种用于在光刻曝光过程中确定基板上的目标场的曝光设置的方法，包括通过在第二个多个校准位置确定校准场在第一方向上的位置来提供校准数据和相对于校准场的位置的第三方向。该方法还包括通过在第二和第三方向上建立目标场的衬底上的位置并且通过在相对于曝光位置的至少一个测量位置处测量第一方向上的曝光场的位置来提供生产数据场在第二和第三个方向。

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