专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08975599B2 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US08975599B2
公开(公告)日：2015-03-10
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G01J1/04 , G21K5/10 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

2. 发明申请

US20120242969A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20120242969A1
公开(公告)日：2012-09-27
申请号：US13414352
申请日：2012-03-07
申请人： Engelbertus Antonius Fransiscus VAN DER PASCH , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus VAN DER PASCH , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译：一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

3. 发明申请

US20120013879A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120013879A1
公开(公告)日：2012-01-19
申请号：US13178965
申请日：2011-07-08
申请人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
IPC分类号： G03B27/54 , G01B11/22
CPC分类号： G01B11/0608 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7034 , G03F9/7088
摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.
摘要翻译：本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开第一个方向。

4. 发明申请

US20090231563A1 Method and Lithographic Apparatus for Measuring and Acquiring Height Data Relating to a Substrate Surface 失效
标题翻译：用于测量和获取与基板表面相关的高度数据的方法和平版印刷设备
公开(公告)号：US20090231563A1
公开(公告)日：2009-09-17
申请号：US12399737
申请日：2009-03-06
申请人： Frank Staals , Paulus Antonius Andreas Teunissen , Ronald Albert John Van Doorn
发明人： Frank Staals , Paulus Antonius Andreas Teunissen , Ronald Albert John Van Doorn
IPC分类号： G03B27/42
CPC分类号： G03F7/70758 , G03F7/70725
摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.
摘要翻译：平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动通过控制致动器相对于液位传感器的基板。控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。

5. 发明授权

US09329500B2 Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor 有权
标题翻译：所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较
公开(公告)号：US09329500B2
公开(公告)日：2016-05-03
申请号：US12598377
申请日：2008-04-29
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03F7/09 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

6. 发明授权

US08582082B2 Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface 失效
标题翻译：用于测量和获取与衬底表面有关的高度数据的方法和光刻设备
公开(公告)号：US08582082B2
公开(公告)日：2013-11-12
申请号：US12399737
申请日：2009-03-06
申请人： Frank Staals , Paulus Antonius Andreas Teunissen , Ronald Albert John Van Doorn
发明人： Frank Staals , Paulus Antonius Andreas Teunissen , Ronald Albert John Van Doorn
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70758 , G03F7/70725
摘要： A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.
摘要翻译：平版印刷设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及用于移动通过控制致动器相对于液位传感器的基板。控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。

7. 发明授权

US08570492B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US08570492B2
公开(公告)日：2013-10-29
申请号：US13414352
申请日：2012-03-07
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译：一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

8. 发明申请

US20090153821A1 LITHOGRAPHIC APPARATUS WITH ADJUSTED EXPOSURE SLIT SHAPE ENABLING REDUCTION OF FOCUS ERRORS DUE TO SUBSTRATE TOPOLOGY AND DEVICE MANUFACTURING METHOD 有权
标题翻译：具有调整的曝光片形状的平版印刷设备使得基底拓扑和器件制造方法能够减少焦点错误
公开(公告)号：US20090153821A1
公开(公告)日：2009-06-18
申请号：US12329076
申请日：2008-12-05
申请人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
发明人： Sven Gunnar Krister Magnusson , Martin Jules Marie-Emile De Nivelle , Frank Staals , Wim Tjibbo Tel
IPC分类号： G03B27/42
CPC分类号： G03F7/70066
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.
摘要翻译：光刻设备包括用于调节辐射束的照明系统; 图案形成装置支撑件以支撑图案形成装置，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底的衬底台，以及投影系统，用于沿着扫描方向将图案化的辐射束沿扫描曝光投影到衬底的目标部分上。照明系统构造成在图案形成装置的平面中形成狭缝形图像。狭缝形状的图像具有在扫描方向上具有狭缝曲率的弯曲形状，扫描方向上的长度和垂直于扫描方向的宽度。狭缝形状的图像被配置为在投影系统的图像平面中产生图案化的辐射束的弯曲图案图像部分。

9. 发明申请

US20080273183A1 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US20080273183A1
公开(公告)日：2008-11-06
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03B27/58 , G03B27/80
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

10. 发明申请

US20050030507A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050030507A1
公开(公告)日：2005-02-10
申请号：US10892395
申请日：2004-07-16
申请人： Paulus Antonius Teunissen , Gerrit Nijmeijer , Rene Marinus Queens , Frank Staals , Robert Van Wijk , Roeland Nicolaas Vanneer
发明人： Paulus Antonius Teunissen , Gerrit Nijmeijer , Rene Marinus Queens , Frank Staals , Robert Van Wijk , Roeland Nicolaas Vanneer
IPC分类号： G03F9/00 , G03B27/52
CPC分类号： G03F9/7019 , G03F9/7034
摘要： According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.
摘要翻译：根据一个实施例，一种校准至少两个光刻投影设备的水平传感器以校正机器与机器水平传感器处理依赖性的方法包括使用第一光刻投影设备来测量参考基板和第二组的第一组调平数据根据所选择的工艺处理的衬底的调平数据，以及使用第二光刻投影装置测量用于所述参考衬底的第三组校平数据和用于所述经处理衬底的第四组校平数据。该方法还包括基于第一，第二，第三和第四组平整数据计算一组对于所选择的过程的机器与机器水平传感器差异的水平传感器参数，其中测量机器与机器水平传感器差异并作为场内值存储。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式