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1. 发明授权

US07294574B2 Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement 有权
标题翻译：金属化种子层的溅射沉积和蚀刻用于悬垂和侧壁改进
公开(公告)号：US07294574B2
公开(公告)日：2007-11-13
申请号：US10915139
申请日：2004-08-09
申请人： Peijun Ding , Fuhong Zhang , Hsien-Lung Yang , Michael A. Miller , Jianming Fu , Jick M. Yu , Zheng Xu , Fusen Chen
发明人： Peijun Ding , Fuhong Zhang , Hsien-Lung Yang , Michael A. Miller , Jianming Fu , Jick M. Yu , Zheng Xu , Fusen Chen
IPC分类号： H01L21/44
CPC分类号： H01L21/2855 , H01L21/76843 , H01L21/76865 , H01L21/76873 , H01L2221/1089
摘要： An integrated sputtering method and reactor for copper or aluminum seed layers in which a plasma sputter reactor initially deposits a thin conformal layer onto a substrate including a high-aspect ratio hole subject to the formation of overhangs. After the seed deposition, the same sputter reactor is used to sputter etch the substrate with energetic light ions, especially helium, having an energy sufficiently low that it selectively etches the metallization to the heavier underlying barrier layer, for example, copper over tantalum or aluminum over titanium. An RF inductive coil generates the plasma during the sputtering etching while the target power is turned off. A final copper flash step deposits copper over the bare barrier field region before copper is electrochemically plated to fill the hole. The invention also includes a simultaneous sputter deposition and sputter etch, and an energetic ion processing of the copper seed sidewall.
摘要翻译：一种用于铜或铝种子层的集成溅射方法和反应器，其中等离子体溅射反应器最初将薄的共形层沉积到包括形成突出端的高纵横比孔的基板上。在种子沉积之后，使用相同的溅射反应器以能量足够低的能量的能量轻离子（特别是氦）溅射蚀刻衬底，以使其能够将金属化选择性地蚀刻到较重的下层阻挡层，例如钽或铝上的铜超过钛。 RF感应线圈在溅射蚀刻期间产生等离子体，同时关闭目标电源。在铜电化学镀以填充孔之前，最终的铜闪光步骤将铜沉积在裸露的屏障场区域上。本发明还包括同时溅射沉积和溅射蚀刻以及铜种子侧壁的能量离子处理。

2. 发明授权

US08696875B2 Self-ionized and inductively-coupled plasma for sputtering and resputtering 有权
标题翻译：用于溅射和再溅射的自电离和电感耦合等离子体
公开(公告)号：US08696875B2
公开(公告)日：2014-04-15
申请号：US10495506
申请日：2002-11-14
申请人： Peijun Ding , Rong Tao , Zheng Xu , Daniel C. Lubben , Suraj Rengarajan , Michael A. Miller , Arvind Sundarrajan , Xianmin Tang , John C. Forster , Jianming Fu , Roderick C. Mosely , Fusen Chen , Praburam Gopalraja
发明人： Peijun Ding , Rong Tao , Zheng Xu , Daniel C. Lubben , Suraj Rengarajan , Michael A. Miller , Arvind Sundarrajan , Xianmin Tang , John C. Forster , Jianming Fu , Roderick C. Mosely , Fusen Chen , Praburam Gopalraja
IPC分类号： C23C14/35
CPC分类号： C23C14/046 , C23C14/345 , C23C14/3457 , C23C14/35 , C23C14/358 , C23C14/564 , C23C14/568 , H01J37/321 , H01J37/3402 , H01J37/3408 , H01J37/3441 , H01J2237/3327 , H01L21/2855 , H01L21/76805 , H01L21/76814 , H01L21/76843 , H01L21/76844 , H01L21/76846 , H01L21/76862 , H01L21/76865 , H01L21/76868 , H01L21/76871 , H01L21/76873 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： A magnetron sputter reactor (410) and its method of use, in which SIP sputtering and ICP sputtering are promoted is disclosed. In another chamber (412) an array of auxiliary magnets positioned along sidewalls (414) of a magnetron sputter reactor on a side towards the wafer from the target is disclosed. The magnetron (436) preferably is a small one having a stronger outer pole (442) of a first polarity surrounding a weaker inner pole (440) of a second polarity all on a yoke (444) and rotates about the axis (438) of the chamber using rotation means (446, 448, 450). The auxiliary magnets (462) preferably have the first polarity to draw the unbalanced magnetic field (460) towards the wafer (424), which is on a pedestal (422) supplied with power (454). Argon (426) is supplied through a valve (428). The target (416) is supplied with power (434).
摘要翻译：公开了一种促进SIP溅射和ICP溅射的磁控溅射反应器（410）及其使用方法。在另一个室（412）中，公开了一种辅助磁体阵列，其沿着磁控溅射反应器的侧面（414）定位，所述磁控溅射反应器在朝向晶片的一侧朝向靶。优选地，磁控管（436）是小的，其具有第一极性的更强的外极（442），其具有围绕轭（444）的第二极性的较弱内极（440），并且围绕轴线（438）旋转所述腔室使用旋转装置（446,448,450）。辅助磁体（462）优选地具有第一极性，以将不平衡磁场（460）朝着被提供电力（454）的基座（422）上的晶片（424）拉出。氩（426）通过阀（428）供应。目标（416）被供电（434）。

3. 发明授权

US08668816B2 Self-ionized and inductively-coupled plasma for sputtering and resputtering 有权
标题翻译：用于溅射和再溅射的自电离和电感耦合等离子体
公开(公告)号：US08668816B2
公开(公告)日：2014-03-11
申请号：US11933157
申请日：2007-10-31
申请人： Peijun Ding , Rong Tao , Zheng Xu , Daniel C. Lubben , Suraj Rengarajan , Michael A. Miller , Arvind Sundarrajan , Xianmin Tang , John C. Forster , Jianming Fu , Roderick C. Mosely , Fusen Chen , Praburam Gopalraja
发明人： Peijun Ding , Rong Tao , Zheng Xu , Daniel C. Lubben , Suraj Rengarajan , Michael A. Miller , Arvind Sundarrajan , Xianmin Tang , John C. Forster , Jianming Fu , Roderick C. Mosely , Fusen Chen , Praburam Gopalraja
IPC分类号： C23C14/35
CPC分类号： C23C14/046 , C23C14/345 , C23C14/3457 , C23C14/35 , C23C14/358 , C23C14/564 , C23C14/568 , H01J37/321 , H01J37/3402 , H01J37/3408 , H01J37/3441 , H01J2237/3327 , H01L21/2855 , H01L21/76805 , H01L21/76814 , H01L21/76843 , H01L21/76844 , H01L21/76846 , H01L21/76862 , H01L21/76865 , H01L21/76868 , H01L21/76871 , H01L21/76873 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： A magnetron sputter reactor for sputtering deposition materials such as tantalum, tantalum nitride and copper, for example, and its method of use, in which self-ionized plasma (SIP) sputtering and inductively coupled plasma (ICP) sputtering are promoted, either together or alternately, in the same or different chambers. Also, bottom coverage may be thinned or eliminated by ICP resputtering in one chamber and SIP in another. SIP is promoted by a small magnetron having poles of unequal magnetic strength and a high power applied to the target during sputtering. ICP is provided by one or more RF coils which inductively couple RF energy into a plasma. The combined SIP-ICP layers can act as a liner or barrier or seed or nucleation layer for hole. In addition, an RF coil may be sputtered to provide protective material during ICP resputtering. In another chamber an array of auxiliary magnets positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target. The magnetron preferably is a small, strong one having a stronger outer pole of a first magnetic polarity surrounding a weaker outer pole of a second magnetic polarity and rotates about the central axis of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets or electromagnets.
摘要翻译：用于溅射诸如钽，氮化钽和铜的沉积材料的磁控溅射反应器及其使用方法，其中促进了自离子等离子体（SIP）溅射和电感耦合等离子体（ICP）溅射，其一起或者交替地，在相同或不同的室中。此外，底部覆盖可以通过在一个室中的ICP再溅射和另一个室中的SIP来减薄或消除。 SIP由在溅射期间施加到靶的不均匀磁强度和高功率的磁极的小磁控管促进。 ICP由一个或多个将RF能量感应耦合到等离子体中的RF线圈提供。组合的SIP-ICP层可以作为孔的衬垫或屏障或种子或成核层。此外，可以在ICP溅射期间溅射RF线圈以提供保护材料。在另一个腔室中，辅助磁体阵列沿磁控溅射反应器的侧壁朝着晶片从目标侧面定位。磁控管优选地是小而强的，具有围绕第二磁极性较弱的外极的第一磁极的更强的外极并围绕腔的中心轴旋转。辅助磁体优选地具有第一磁极以将不平衡的磁场分量拉向晶片。辅助磁体可以是永磁体或电磁体。

4. 发明授权

US08350412B2 Dynamically controlling configuration of a power grid comprising one or more stand-alone sub-grids 有权
标题翻译：动态地控制包括一个或多个独立子网格的电网的配置
公开(公告)号：US08350412B2
公开(公告)日：2013-01-08
申请号：US12817645
申请日：2010-06-17
申请人： Darrell D. Massie , Michael A. Miller , Peter S. Curtiss
发明人： Darrell D. Massie , Michael A. Miller , Peter S. Curtiss
IPC分类号： H02J7/00 , H02J9/00
CPC分类号： H02J3/38 , H02J3/00 , H02J2003/388 , Y10T307/469 , Y10T307/62
摘要： A technique is provided for automatically controlling configuration of a power grid, which includes one or more stand-alone sub-grids. Each stand-alone sub-grid includes a power generator, and a load is associated with the stand-alone sub-grid(s). The technique includes: monitoring the power grid by monitoring power demand of a load associated with the stand-alone sub-grid(s) and the power generated by the power generator within each stand-alone sub-grid; automatically determining that a grid configuration change is required for the power grid based on the monitoring; and dynamically reconfiguring the power grid by automatically modifying a number of stand-alone sub-grids in the power grid without interrupting power to the load associated with the stand-alone sub-grid(s) of the power grid. In one implementation, the power grid is a mobile power grid, and the power generator of each stand-alone sub-grid is a portable power generator.
摘要翻译：提供了一种用于自动控制包括一个或多个独立子网格的电网的配置的技术。每个独立子网包括发电机，并且负载与独立子电网相关联。该技术包括：通过监测与独立子电网相关联的负载的功率需求和由每个独立子电网内发电机产生的功率来监测电网; 基于监控自动确定电网需要更改电网; 并且通过自动修改电网中的多个独立子网格来动态地重新配置电网，而不会中断与电网的独立子网相关联的负载的功率。在一个实施中，电网是移动电网，每个独立子电网的发电机是便携式发电机。

5. 发明授权

US07189574B2 Measurement of nitrogen content in a gas mixture by transforming the nitrogen into a substance detectable with nondispersive infrared detection 有权
标题翻译：通过将氮转化为可用非分散红外检测法检测的物质来测量气体混合物中的氮含量
公开(公告)号：US07189574B2
公开(公告)日：2007-03-13
申请号：US10810103
申请日：2004-03-26
申请人： Thomas E. Owen , Michael A. Miller
发明人： Thomas E. Owen , Michael A. Miller
IPC分类号： G01N31/00
CPC分类号： G01N31/005 , G01N21/3504 , G01N33/0054 , Y02A50/246 , Y10T436/17 , Y10T436/173076 , Y10T436/173845 , Y10T436/175383 , Y10T436/176152 , Y10T436/177692 , Y10T436/178459
摘要： A method of determining the amount of nitrogen in a gas mixture. The constituent gases of the mixture are dissociated and transformed to create a substance that may measured using nondispersive infrared adsorption techniques.
摘要翻译：一种确定气体混合物中氮的量的方法。混合物的构成气体被解离和转化以产生可以使用非分散红外吸收技术测量的物质。

6. 发明授权

US6151969A Electromechanical and electrochemical impedance spectroscopy for measuring and imaging fatigue damage 失效
标题翻译：机电和电化学阻抗谱用于测量和成像疲劳损伤
公开(公告)号：US6151969A
公开(公告)日：2000-11-28
申请号：US115114
申请日：1998-07-14
申请人： Michael A. Miller , Stephen J. Hudak, Jr.
发明人： Michael A. Miller , Stephen J. Hudak, Jr.
IPC分类号： G01N27/416 , G01N3/32
CPC分类号： G01N17/02
摘要： EIS and EMIS methods of assessing the fatigue status of a material. The EIS method uses an electrochemical transducer cell to apply electrical perturbations to the material, and to acquire voltage and current measurements over a range of frequencies. The impedance at each frequency is calculated, resulting in impedance spectrum data. This data is correlated to reference data representing the fatigue life of the material. The EMIS method is similar except that mechanical instead of electrical perturbations are applied to the material.
摘要翻译： EIS和EMIS评估材料疲劳状态的方法。 EIS方法使用电化学换能器单元对材料施加电扰动，并在一定频率范围内获取电压和电流测量。计算每个频率的阻抗，得到阻抗谱数据。该数据与表示材料的疲劳寿命的参考数据相关。 EMIS方法是类似的，只是机械而不是电气扰动被施加到材料上。

7. 发明授权

US09050612B2 Shower device with independently operating valves 有权
标题翻译：带独立操作阀的淋浴装置
公开(公告)号：US09050612B2
公开(公告)日：2015-06-09
申请号：US12407136
申请日：2009-03-19
申请人： Michael A. Miller , Julian Giggs , Lizhong Liao , Shengjun Du
发明人： Michael A. Miller , Julian Giggs , Lizhong Liao , Shengjun Du
IPC分类号： A62C37/20 , B05B1/18 , B05B1/16
CPC分类号： B05B1/18 , B05B1/1681
摘要： A shower device includes spray outlets and valves configured to control flow of a fluid to the spray outlets. At least one of the valves is configured to control, independently of other valves, flow of the fluid to at least one of the spray outlets.
摘要翻译：淋浴装置包括喷射出口和阀，其配置成控制流体到喷雾出口的流动。阀中的至少一个被配置为独立于其它阀来控制流体到至少一个喷雾出口的流动。

8. 发明授权

US07781220B2 Measurement of nitrogen content in a gas mixture by transforming the nitrogen into a substance detectable with nondispersive infrared detection 有权
标题翻译：通过将氮转化为可用非分散红外检测法检测的物质来测量气体混合物中的氮含量
公开(公告)号：US07781220B2
公开(公告)日：2010-08-24
申请号：US11613278
申请日：2006-12-20
申请人： Thomas E. Owen , Michael A. Miller
发明人： Thomas E. Owen , Michael A. Miller
IPC分类号： G01N33/00
CPC分类号： G01N31/005 , G01N21/3504 , G01N33/0054 , Y02A50/246 , Y10T436/17 , Y10T436/173076 , Y10T436/173845 , Y10T436/175383 , Y10T436/176152 , Y10T436/177692 , Y10T436/178459
摘要： A method of determining the amount of nitrogen in a gas mixture. The constituent gases of the mixture are dissociated and transformed to create a substance that may measured using nondispersive infrared adsorption techniques.
摘要翻译：一种确定气体混合物中氮的量的方法。混合物的构成气体被解离和转化以产生可以使用非分散红外吸收技术测量的物质。

9. 发明授权

US06939686B2 Methodology of using raman imaging microscopy for evaluating drug action within living cells 有权
标题翻译：使用拉曼成像显微镜评估活细胞内药物作用的方法
公开(公告)号：US06939686B2
公开(公告)日：2005-09-06
申请号：US10750603
申请日：2003-12-31
申请人： Jian Ling , Steven D. Weitman , Michael A. Miller
发明人： Jian Ling , Steven D. Weitman , Michael A. Miller
IPC分类号： G01N21/65 , C12Q1/02
CPC分类号： G01N21/65 , Y10T436/24
摘要： A method of using Raman imaging microscopy to evaluate drug actions in living cells is disclosed. Specifically the invention describes the methods of using Raman imaging microscopy to detect drug uptake, distribution, binding, and metabolism in a single cell, and to study drug pharmacokinetics at the cellular level. The method involves measuring the Raman image of both the drug and the cell. Control images and post-treatment images of the cell were studied. Ratio images were calculated and the requisite information was obtained from a study of the intensity of the bright areas in the ratio images.
摘要翻译：公开了使用拉曼成像显微镜评估活细胞药物作用的方法。具体地，本发明描述了使用拉曼成像显微镜检测单细胞中药物摄取，分布，结合和代谢的方法，以及研究细胞水平的药物药代动力学。该方法涉及测量药物和细胞的拉曼图像。研究了细胞的图像和后处理图像。计算比率图像，并从比较图像中亮区强度的研究中获得必要的信息。

10. 发明授权

US06267017B1 Two-dimensional array for electromechanical and electrochemical spectroscopy 有权
标题翻译：用于机电和电化学光谱的二维阵列
公开(公告)号：US06267017B1
公开(公告)日：2001-07-31
申请号：US09633946
申请日：2000-08-08
申请人： Michael A. Miller , Stephen J. Hudak, Jr.
发明人： Michael A. Miller , Stephen J. Hudak, Jr.
IPC分类号： G01N3300
CPC分类号： G01N17/02
摘要： A transducer cell array for electrochemical and electromechanical spectroscopy testing. The array has rows and columns of electrolytic volume cell elements that are spatially uniform. A reference electrode is common to all volume elements. Each counter electrode is individually addressable. The total impedance response provides a spatial image of the surface being tested.
摘要翻译：用于电化学和机电光谱测试的换能器单元阵列。该阵列具有空间均匀的电解体积单元元素的行和列。参考电极对于所有体积元件是共同的。每个对电极可单独寻址。总阻抗响应提供被测试表面的空间图像。

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