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    • 5. 发明授权
    • Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof
    • 微电子工件电化学处理接触组件及其制造方法
    • US07294243B2
    • 2007-11-13
    • US10497670
    • 2002-12-05
    • Nolan ZimmermanGregory J. WilsonSteve L. Eudy
    • Nolan ZimmermanGregory J. WilsonSteve L. Eudy
    • C25D17/00
    • C25D17/001C25D7/123C25D17/06
    • Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the workpiece and a plurality of contacts (420). The individual contacts (420) include a conductor (440) and a cover (430). The conductor (440) can comprise a proximal section (435) projecting inwardly into the opening (414) relative to the support member (410), a distal section (436) extending from the proximal section (435), and an inert exterior (444) at least at the distal section (436). The cover (430) comprises a dielectric element that covers at least the proximal section of the conductor, but does not cover at least a portion of the distal section of the core. The exposed portion of the distal section of the core, accordingly, defines a conductive contact site for contacting a conductive layer (e.g., a seed layer) on the workpiece.
    • 微电子工件电化学处理接触组件。 接触组件(400)可包括支撑构件(410),该支撑构件包括内壁(412),所述内壁限定了构造成容纳工件的开口(414)和多个触点(420)。 各个触点(420)包括导体(440)和盖(430)。 导体(440)可以包括相对于支撑构件(410)向内伸入开口(414)的近端部分(435),从近侧部分(435)延伸的远端部分(436)和惰性外部 444),至少在远端部分(436)。 盖(430)包括覆盖导体的至少近端部分但不覆盖芯的远端部分的至少一部分的电介质元件。 因此,芯的远端部分的暴露部分限定了用于接触工件上的导电层(例如种子层)的导电接触部位。
    • 6. 发明申请
    • Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof
    • 微电子工件电化学处理接触组件及其制造方法
    • US20050045474A1
    • 2005-03-03
    • US10497670
    • 2002-12-05
    • Nolan ZimmermanGregory WilsonSteve Eudy
    • Nolan ZimmermanGregory WilsonSteve Eudy
    • C25D7/12C25D17/06
    • C25D17/001C25D7/123C25D17/06
    • Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the work-piece and a plurality of contacts (420). The individual contacts (420) include a conductor (440) and a cover (430). The conductor (440) can comprise a proximal section (435) projecting inwardly into the opening (414) relative to the support member (410), a distal section (436) extending from the proximal section (435), and an inert exterior (444) at least at the distal section (436). The cover (430) comprises a dielectric element that covers at least the proximal section of the conductor, but does not cover at least a portion of the distal section of the core. The exposed portion of the distal section of the core, accordingly, defines a conductive contact site for contacting a conductive layer (e.g., a seed layer) on the workpiece.
    • 微电子工件电化学处理接触组件。 接触组件(400)可以包括支撑构件(410),该支撑构件包括内壁(412),内壁限定了构造成容纳工件的多个触点(420)的开口(414)。 各个触点(420)包括导体(440)和盖(430)。 导体(440)可以包括相对于支撑构件(410)向内伸入开口(414)的近端部分(435),从近侧部分(435)延伸的远端部分(436)和惰性外部 444),至少在远端部分(436)。 盖(430)包括覆盖导体的至少近端部分但不覆盖芯的远端部分的至少一部分的电介质元件。 因此,芯的远端部分的暴露部分限定了用于接触工件上的导电层(例如种子层)的导电接触部位。
    • 8. 发明申请
    • Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods
    • 具有多个电极和/或封闭的往复式桨的反应器及相关方法
    • US20050000817A1
    • 2005-01-06
    • US10734100
    • 2003-12-11
    • Paul McHughGregory WilsonDaniel WoodruffNolan ZimmermanJames Erickson
    • Paul McHughGregory WilsonDaniel WoodruffNolan ZimmermanJames Erickson
    • C25D5/00
    • C25D5/006C25D5/08C25D17/001C25D17/008C25D17/10C25D17/12C25D21/10C25D21/12H01L21/6723
    • Reactors having multiple electrodes and/or enclosed reciprocating paddles are disclosed. The reactor can include multiple electrodes spaced apart from a process location to provide virtual electrodes proximate to the process location for transferring material to or from the workpiece. A magnet may be positioned proximate to the process plane to orient magnetically sensitive material deposited on the workpiece. The electrodes may be removable from the reactor without passing them through the magnet to reduce interference between the electrodes and the magnet. The workpiece may be carried by a rotatable workpiece support to orient the workpiece for processing. At least one of the electrodes can operate as a current thief to reduce terminal effects at the periphery of the workpiece. An electric field control element positioned between the electrodes and the workpiece circumferentially varies the effect of the thieving electrode current to account for effects created by elongated paddles as they oscillate proximate to the workpiece.
    • 公开了具有多个电极和/或封闭的往复式叶片的反应器。 反应器可以包括与处理位置间隔开的多个电极,以提供靠近处理位置的虚拟电极,用于将材料转移到工件或从工件传送材料。 可以将磁体定位成靠近处理平面以定向沉积在工件上的感应敏感材料。 电极可以从反应器中移除,而不会使它们通过磁体,以减少电极和磁体之间的干扰。 工件可以由可旋转的工件支撑件承载以使工件定向以进行加工。 电极中的至少一个可以作为电流窃贼工作,以减少在工件周边处的终端效应。 定位在电极和工件之间的电场控制元件周向地改变了窃电电极电流的影响,以解决细长桨叶在靠近工件振荡时产生的效应。