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    • 4. 发明申请
    • Automated Communications Device Field Testing, Performance Management, And Resource Allocation
    • 自动通信设备现场测试,性能管理和资源分配
    • US20110151863A1
    • 2011-06-23
    • US12643284
    • 2009-12-21
    • Venson ShawSteven CarlsonLeland YuLiping Zhang
    • Venson ShawSteven CarlsonLeland YuLiping Zhang
    • H04W24/08
    • H04W24/08H04W24/02
    • Field testing, performance monitoring, and resource management are performed via a communications device, automatically and autonomously, without user intervention. Abnormal conditions are automatically detected while the communications device is performing a service and adjustments are automatically made to network resources in order to improve service performance. Upon initiation of a request for service (e.g., IM, MMS, SMS, etc.), the communications device automatically begins to monitor the performance of the service session (e.g., send time, receive time, etc.). During or after the service session, the communications device stores the performance data associated with the performance of the service. The performance data is analyzed in accordance with a subscriber's user profile information, to detect any problems with the service. If problems are detected, necessary adjustments and/or reallocation of resources are made automatically and autonomously, without user intervention.
    • 通过通信设备自动和自主地进行现场测试,性能监控和资源管理,无需用户干预。 在通信设备执行服务时自动检测到异常情况,并自动对网络资源进行调整,以提高服务性能。 在启动服务请求(例如,IM,MMS,SMS等)时,通信设备自动开始监视服务会话的性能(例如,发送时间,接收时间等)。 在服务会话期间或之后,通信设备存储与服务性能相关联的性能数据。 根据用户的用户简档信息分析性能数据,以检测服务的任何问题。 如果检测到问题,则自动和自主地进行必要的调整和/或重新分配资源,无需用户干预。
    • 8. 发明授权
    • Method and system for patterning a substrate
    • 图案化基板的方法和系统
    • US08912097B2
    • 2014-12-16
    • US12859606
    • 2010-08-19
    • Patrick M. MartinSteven CarlsonChoong-Young OhJung-Wook Park
    • Patrick M. MartinSteven CarlsonChoong-Young OhJung-Wook Park
    • H01L21/302
    • H01L21/32139G03F7/40G03F7/405H01L21/0273H01L21/0337
    • A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes hardened. The introduction of particles may cause a reduction in critical dimension of the resist features. Sidewalls are provided on side portions of hardened resist features. Subsequent to the formation of the sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls disposed on the substrate. The sidewall array provides a mask for double patterning of features in the substrate layers disposed below the sidewalls, wherein an array of features formed in the substrate has a second pitch equal to half that of the first pitch.
    • 图案化衬底的方法包括提供由相邻抗蚀剂特征之间的第一间距和第一间隙宽度限定的抗蚀剂特征阵列。 将粒子引入到抗蚀剂特征阵列中,其中抗蚀剂特征阵列变硬。 颗粒的引入可能导致抗蚀剂特征的临界尺寸的降低。 侧壁设置在硬化抗蚀剂特征的侧部。 在形成侧壁之后,去除硬化的抗蚀剂特征,留下设置在基底上的隔离侧壁阵列。 侧壁阵列提供用于在设置在侧壁下方的衬底层中的特征的双重图案化的掩模,其中形成在衬底中的特征阵列具有等于第一间距的一半的第二间距。