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    • 4. 发明授权
    • Electronic device array
    • 电子设备阵列
    • US07947612B2
    • 2011-05-24
    • US11793294
    • 2005-12-16
    • Paul A. Cain
    • Paul A. Cain
    • H01L21/00
    • H01L27/283H01L51/0017H01L51/0512H01L51/0516H01L51/0541
    • A method of producing an array of electronic devices, the method including the steps of: forming one or more first conductive elements of a first electronic device on a substrate and one or more second conductive elements of a second electronic device on said substrate; and forming a layer of channel material over the substrate and the first and second conductive elements to provide a first channel for, in use, the movement of charge carriers between conductive elements of said first electronic device and a second channel for, in use, the movement of charge carriers between conductive elements of said second electronic device; wherein the method also includes the step (a) of using an irradiative technique to decrease in a single step the conductivity of one or more selected portions of the layer of channel material in one or more regions between the first and second conductive elements.
    • 一种制造电子器件阵列的方法,所述方法包括以下步骤:在衬底上形成第一电子器件的一个或多个第一导电元件和在所述衬底上形成第二电子器件的一个或多个第二导电元件; 以及在所述衬底和所述第一和第二导电元件之上形成沟道材料层,以在使用中提供第一通道,用于在所述第一电子器件的导电元件和第二通道之间的电荷载体的移动, 电荷载体在所述第二电子器件的导电元件之间的移动; 其中所述方法还包括步骤(a),其使用照射技术在一个步骤中减少所述第一和第二导电元件之间的一个或多个区域中的所述通道材料层的一个或多个选定部分的导电率。
    • 9. 发明申请
    • LASER ABLATION OF ELECTRONIC DEVICES
    • 电子设备的激光消除
    • US20090298299A1
    • 2009-12-03
    • US12065722
    • 2006-08-31
    • Paul A. CainCarl Hayton
    • Paul A. CainCarl Hayton
    • H01L21/26
    • H01L51/0023B23K26/0622B23K26/40B23K2101/40B23K2103/172B23K2103/50H01L21/268H01L21/76838H05K3/027H05K3/4644H05K2201/09672
    • The present invention relates to methods of fabricating electronic devices using laser ablation and to devices fabricated thereby. Embodiments of the methods are particularly suitable for defining electrodes within thin film transistor (TFT) structures using laser ablation in a step-and-repeat mode. A method of fabricating an electronic device, the device comprising a plurality of layers on a substrate, the layers including an upper conductive layer and at least said conductive layer and said substrate, the method comprising: patterning said underlying layer; and patterning said upper conductive layer by laser ablation using a stepwise process in which successive areas of said upper conductive layer are ablated by successively applied laser patterns; wherein said successively applied laser patterns overlap one another in an overlap region; and wherein said method further comprises configuring a said laser pattern and said patterned underlying layer with respect to one another such that in a said overlap region said patterned underlying layer is substantially undamaged by said stepwise laser ablation.
    • 本发明涉及使用激光烧蚀制造电子器件的方法及其制造的器件。 该方法的实施例特别适合于在步进重复模式中使用激光烧蚀来限定薄膜晶体管(TFT)结构内的电极。 一种制造电子器件的方法,所述器件在衬底上包括多个层,所述层包括上导电层和至少所述导电层和所述衬底,所述方法包括:图案化所述下层; 以及通过使用逐步过程的激光烧蚀来图案化所述上导电层,其中所述上导电层的连续区域被依次施加的激光图案消融; 其中所述连续施加的激光图案在重叠区域中彼此重叠; 并且其中所述方法还包括相对于彼此配置所述激光图案和所述图案化的下层,使得在所述重叠区域中,所述图案化底层通过所述逐步激光烧蚀基本上未损坏。
    • 10. 发明授权
    • Non-linear capacitors
    • 非线性电容
    • US06950299B2
    • 2005-09-27
    • US10777677
    • 2004-02-13
    • Nicholas J. StonePaul A. CainThomas M. Brown
    • Nicholas J. StonePaul A. CainThomas M. Brown
    • H01L21/02H01L27/08H01L29/94H01G4/228
    • H01L28/40H01L27/0808H01L29/94
    • An electronic device including first, second and third conductor layers respectively arranged as the source, drain and gate electrodes of a field effect transistor, the third conductor layer being capacitively coupled with both the first and second conductor layers but with the second conductor layer to a greater degree than with the first conductor layer, wherein the electronic device is operable as a non-linear capacitor by applying an alternating voltage across the third conductor layer and the first conductor layer whilst leaving the second conductor layer at a floating potential. Also, an electronic device including a first pair of capacitively coupled first and second conductor layers and a second pair of capacitively coupled third and fourth conductor layers, wherein the first and third conductor layers and the second and fourth conductor layers are arranged as the drain and source electrodes of respective field effect transistors together with one or more gate electrodes conductively connected to either of the first and second conductor layers, wherein the electronic device is operable as a non-linear capacitor by applying an alternating voltage across the first and second conductor layers whilst leaving the third and fourth conductor layers at a floating potential.
    • 一种电子设备,包括分别布置为场效应晶体管的源极,漏极和栅电极的第一,第二和第三导体层,第三导体层与第一和第二导体层电容耦合,但是与第二导体层电容耦合到 比第一导体层更大的程度,其中电子器件可通过在第二导体层和第一导体层之间施加交替电压而作为非线性电容器工作,同时使第二导体层处于浮动电位。 另外,电子设备包括第一对电容耦合的第一和第二导体层和第二对电容耦合的第三和第四导体层,其中第一和第三导体层以及第二和第四导体层被布置为漏极和 各个场效应晶体管的源电极与一个或多个导电连接到第一和第二导体层中的任一个的栅电极连接,其中电子器件可通过在第一和第二导体层上施加交流电压而作为非线性电容器操作 同时使第三和第四导体层处于浮动电位。