专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06418155B1 Laser device 有权
标题翻译：激光设备
公开(公告)号：US06418155B1
公开(公告)日：2002-07-09
申请号：US09297372
申请日：1999-06-17
申请人： Osamu Wakabayashi , Tatsuya Ariga , Toru Igarashi , Shoichi Sakanishi , Tomokazu Takahashi
发明人： Osamu Wakabayashi , Tatsuya Ariga , Toru Igarashi , Shoichi Sakanishi , Tomokazu Takahashi
IPC分类号： H01S310
CPC分类号： H01S3/131 , H01S3/134 , H01S5/06216
摘要： A laser device which repeats a cycle of burst mode operation in each of which continuous oscillating operations for continuously pulsatively oscillating laser light by a prescribed number of times and stopping operations for stopping the pulsative oscillation for a prescribed pausing time are alternately executed, controls the power supply voltage of the laser device so that each output energy of the pulsative oscillation can become coincide with a target value, finds the difference between the output voltage of each pulse and the target value at every pulse and, for a pulse for which the difference exceeds tolerance limits, corrects and updates the power supply voltage value stored in the voltage data table means corresponding to the pulse number of the pulse and the measured oscillation pausing time by using the control gain of a control gain setting means set in the block corresponding to the pulse number and the measured oscillation pausing time and the difference, so as to always make the pulse energy of all pulses for the continuous pulsative oscillation constant and further improves the accuracy of optical machining.
摘要翻译：重复进行突发模式操作的周期的激光装置，其中每个激光装置交替地执行连续振荡操作以连续脉动振荡激光规定次数和停止操作以停止脉动振荡达规定的暂停时间，控制功率激光装置的电源电压使得脉冲振荡的每个输出能量可以与目标值一致，找出每个脉冲的每个脉冲的输出电压与目标值之间的差，并且对于该差超过的脉冲通过使用设置在对应于所述脉冲数的块中的控制增益设定装置的控制增益来校正和更新存储在与脉冲的脉冲数相对应的电压数据表装置中的电源电压值和测量的振荡暂停时间脉冲数和测量的振荡暂停时间和差值，以便始终使所有脉冲的脉冲能量连续脉动振荡恒定，进一步提高光学加工精度。

2. 发明授权

US08093571B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

3. 发明申请

US20070091968A1 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US20070091968A1
公开(公告)日：2007-04-26
申请号：US10554537
申请日：2004-04-16
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/22 , H01S3/093
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

4. 发明申请

US20060239309A1 Two-stage laser pulse energy control device and two-stage laser system 有权
标题翻译：两级激光脉冲能量控制装置和两级激光系统
公开(公告)号：US20060239309A1
公开(公告)日：2006-10-26
申请号：US10568091
申请日：2004-08-09
申请人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/13 , H01S3/00 , H01S3/22 , H01S3/223
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134
摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.
摘要翻译：施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或更多的是放大饱和区域。并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。因此，控制两级激光器的脉冲能量以稳定脉冲能量。

5. 发明授权

US06879617B2 Two stage laser system 有权
标题翻译：两级激光系统
公开(公告)号：US06879617B2
公开(公告)日：2005-04-12
申请号：US10438737
申请日：2003-05-14
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
IPC分类号： H01S3/131 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： H01S3/10092 , H01S3/036 , H01S3/08004 , H01S3/08009 , H01S3/08059 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2316
摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.
摘要翻译：本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为在同步时间间隔内在放大器激光器20中发生放电。

6. 发明授权

US08476609B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置和用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08476609B2
公开(公告)日：2013-07-02
申请号：US13306358
申请日：2011-11-29
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

7. 发明授权

US07382816B2 Two-stage laser pulse energy control device and two-stage laser system 有权
标题翻译：两级激光脉冲能量控制装置和两级激光系统
公开(公告)号：US07382816B2
公开(公告)日：2008-06-03
申请号：US10568091
申请日：2004-08-09
申请人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134
摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.
摘要翻译：施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或更多的是放大饱和区域。并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。因此，控制两级激光器的脉冲能量以稳定脉冲能量。

8. 发明授权

US06560269B1 Fluorine laser device 有权
标题翻译：氟激光装置
公开(公告)号：US06560269B1
公开(公告)日：2003-05-06
申请号：US09625969
申请日：2000-07-26
申请人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
发明人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
IPC分类号： H01S308
CPC分类号： H01S3/08 , H01S3/08004 , H01S3/2258
摘要： Fluorine laser device capable of obtaining laser light with strong monochromatic property and large power is provided. For this purpose, the fluorine laser device is in a fluorine laser device including a laser chamber (2) in which a laser medium including fluorine is contained and is excited to thereby oscillate laser light (11), a front slit (116) disposed in front of said laser chamber (2) and having a front opening (33) for transmitting the laser light (11), and a rear slit (117) disposed behind said laser chamber (2) and having a rear opening (34) for transmitting the laser light (11), at least one of the front slit (116) and the rear slit (117) is a slit (16; 17) in which a slit inclined plane (35) is formed on a surface at a laser chamber side to make one of the front opening (33) and the rear opening (34) convex.
摘要翻译：提供能够获得具有强的单色性能和大功率的激光的氟激光装置。为此，氟激光器件在氟激光器件中，包括激光室（2），其中包含氟的激光介质被包含并激发以激发激光（11），前狭缝（116）设置在所述激光室（2）的前部并具有用于透射激光（11）的前开口（33）和设置在所述激光室（2）后面的后狭缝（117），并且具有用于传输的后开口激光（11），前狭缝（116）和后狭缝（117）中的至少一个是在激光室的表面上形成有狭缝倾斜面（35）的狭缝（16; 17）使前开口（33）和后开口（34）中的一个凸起。

9. 发明授权

US07957449B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US07957449B2
公开(公告)日：2011-06-07
申请号：US11566235
申请日：2006-12-03
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/083
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

10. 发明授权

US06741627B2 Photolithographic molecular fluorine laser system 有权
标题翻译：光刻分子氟激光系统
公开(公告)号：US06741627B2
公开(公告)日：2004-05-25
申请号：US10330966
申请日：2002-12-27
申请人： Naoki Kitatochi , Tatsuya Ariga , Osamu Wakabayashi
发明人： Naoki Kitatochi , Tatsuya Ariga , Osamu Wakabayashi
IPC分类号： H01S322
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/134 , H01S3/22 , H01S3/2258
摘要： The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
摘要翻译：本发明提供了一种用于将振荡级激光器的中心波长与放大级激光器的中心波长匹配的光刻分子氟激光器系统的两级激光模式，从而振荡具有低光谱纯度和窄的激光束行宽。激光系统是包括振荡级激光器10和放大级模式20的两级模式。从振荡级激光器10发出的激光束的中心波长与中心当放大级激光器20自身振荡时，从放大级激光器20发出的激光束的波长。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式