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    • 1. 发明授权
    • Electroless copper plating solution
    • 化学镀铜溶液
    • US4303443A
    • 1981-12-01
    • US159231
    • 1980-06-13
    • Osamu MiyazawaHitoshi OkaIsamu TanakaAkira MatsuoHitoshi YokonoNobuo NakagawaTokio Isogai
    • Osamu MiyazawaHitoshi OkaIsamu TanakaAkira MatsuoHitoshi YokonoNobuo NakagawaTokio Isogai
    • C23C18/40C23C3/02
    • C23C18/40
    • When an amine compound having at least two polyolefin glycol chains in one molecule is used as a stabilizer, and an alkylene diamine compound, at least one hydrogen atom in the respective amino groups thereof being substituted by CH.sub.2 COOX (wherein X is H or Na) and another hydrogen atom in the respective amino group thereof being substituted by CH.sub.2 OH, is used as a complexing agent for cupric ions and a nitrogen-containing cyclic compound is used as a complexing agent for cuprous ions in an electroless copper plating solution comprising water, a water-soluble copper salt, a complexing agent for cupric ions, a reducing agent, a pH-controlling agent and a stabilizer, or an electroless copper plating solution comprising water, a water-soluble copper salt, a complexing agent for cupric ions, a reducing agent, a pH-controlling agent, a stabilizer and a complexing agent for cuprous ions, the plating rate of the electroless copper plating solution, mechanical strength of plating film, and stability of the plating solution are improved.
    • 当使用在一个分子中具有至少两个聚烯烃二醇链的胺化合物作为稳定剂和亚烷基二胺化合物时,其各氨基中的至少一个氢原子被CH 2 COOX(其中X是H或Na)取代,和 在其氨基中的另一个氢原子被CH 2 OH取代,用作铜离子的络合剂,并且含氮环状化合物用作含有水,水的无电镀铜溶液中的亚硝酸根离子的络合剂 可溶性铜盐,铜离子络合剂,还原剂,pH控制剂和稳定剂,或包含水,水溶性铜盐,铜离子络合剂,还原剂的化学镀铜溶液 药剂,pH控制剂,稳定剂和亚铜离子络合剂,化学镀铜溶液的电镀速率,电镀膜的机械强度和稳定剂 改善了电镀溶液的性能。
    • 5. 发明申请
    • Analytical filter
    • 分析过滤器
    • US20060081527A1
    • 2006-04-20
    • US11250321
    • 2005-10-13
    • Katsuji IchikawaNobuo NakagawaMitsuhiko Oguchi
    • Katsuji IchikawaNobuo NakagawaMitsuhiko Oguchi
    • B01D29/13
    • B01D39/2027B01D39/2003B01D2239/0478B01D2239/086B01D2239/1216
    • Embodiments of the invention eliminate, in an elemental analysis made of fine particles trapped using a conventional analytical filter, a hindrance to correct identification of elements of the fine particles as an original object of measurement that would otherwise cause the X-ray analyzer to measure elements of a filter base in addition to those of the fine particles. In one embodiment, an analytical filter includes a filter base and a metallic coating film. The filter base made of a resin has a plurality of filtering holes, each having a hole diameter ranging between about 100 nm and 1000 nm. The metallic coating film is formed on one face of the filter base through ion sputtering of gold (Au). The metallic coating film is so thick that an electron beam from an X-ray analyzer does not penetrate therethrough and the filtering holes are not plugged up. The metallic coating film is at least about 40 nm thick and is preferably about 40 nm to 100 nm thick.
    • 本发明的实施例在使用常规分析过滤器捕获的细小颗粒的元素分析中消除了将微粒元素的正确识别作为原始测量对象的障碍,否则将导致X射线分析仪测量元件 除了微粒之外的过滤器底座。 在一个实施例中,分析过滤器包括过滤器底座和金属涂膜。 由树脂制成的过滤器底座具有多个过孔,每个过孔都具有在约100nm和1000nm之间的孔直径。 金属涂膜通过金(Au)的离子溅射形成在过滤器基体的一个面上。 金属涂膜如此厚,使得来自X射线分析仪的电子束不穿透其中,并且过滤孔未堵塞。 金属涂膜的厚度至少约40nm,优选为约40nm至100nm厚。
    • 7. 发明授权
    • Magnetic disc substrate
    • 磁盘基板
    • US5494721A
    • 1996-02-27
    • US112255
    • 1993-08-26
    • Nobuo NakagawaHirayoshi Tanei
    • Nobuo NakagawaHirayoshi Tanei
    • G11B5/72G11B5/725G11B5/73G11B5/738G11B5/00
    • G11B5/7315G11B5/72G11B5/725G11B5/738Y10S428/90Y10T428/21Y10T428/24421Y10T428/252Y10T428/315
    • A substrate for a magnetic disc, which comprises a crystallized glass consisting essentially of an amorphous glass continuous phase and crystal particles dispersed in the continuous phase, the substrate having fine projections of the crystal particles on the surface thereof, a method of producing the substrate, the magnetic disc using the substrate, and a method of producing the magnetic disc are provided. The crystallized glass is made from a glass material of a Li.sub.2 O--SiO.sub.2, Li.sub.2 O--Al.sub.2 O.sub.3 --SiO.sub.2, Li.sub.2 O--MgO--Al.sub.2 O.sub.3 --SiO.sub.2, MgO--Al.sub.2 O.sub.3 --SiO.sub.2, Na.sub.2 O--Al.sub.2 O.sub.3 --SiO .sub.2 or BaO--Al.sub.2 O.sub.3 --SiO.sub.2 system, and the crystal particles have one or more compositions selected from Li.sub.2 O--SiO.sub.2, Li.sub.2 O.2SiO.sub.2, Li.sub.2 O.Al.sub.2 O.sub.3.2Si.sub.2, Li.sub.2 O.Al.sub.2 O.sub.3 4SiO.sub.2, SiO.sub.2 and 2MgO--2Al.sub.2 O.sub.3.5SiO.sub.2, and an average particle size of 0.01 to 3.0 .mu.m, and are projected at a density of 10.sup.2 to 10.sup.6 / mm.sup.2 and at an average height of 0.005 to 0.2 .mu.m on the surface of the substrate, the total surface area of the projections of crystal particles occupying at most 30% of the unit surface area of the substrate. The projections are made by chemical etching with an aqueous solution of hydrofluoric acid, physical etching with sputtering under vacuum or ion-milling, or mechanical etching with sand blasting. The magnetic disc comprises the crystallized glass substrate, a chromium or chromium alloy undercoat film, thin magnetic film, protective carbon film and lubricant film.
    • 一种用于磁盘的基板,其包括基本上由无定形玻璃连续相组成的结晶玻璃和分散在连续相中的晶体颗粒,所述基板在其表面上具有晶体颗粒的微小突起,制造基板的方法, 提供使用该基板的磁盘及其制造方法。 结晶玻璃由Li2O-SiO2,Li2O-Al2O3-SiO2,Li2O-MgO-Al2O3-SiO2,MgO-Al2O3-SiO2,Na2O-Al2O3-SiO2或BaO-Al2O3-SiO2体系的玻璃材料制成, 所述结晶粒子具有选自Li 2 O-SiO 2,Li 2 O 2·SiO 2,Li 2 O·Al 2 O 3·2Si 2,Li 2 O·Al 2 O 34·SiO 2,SiO 2和2MgO·2Al 2 O 3·5SiO 2中的一种以上的组成,平均粒径为0.01〜3.0μm, 投影在基板表面上的密度为102〜106 / mm 2,平均高度为0.005〜0.2μm,晶体颗粒的突起的总表面积占据了单体表面积的至多30% 基质。 通过用氢氟酸的水溶液进行化学蚀刻,在真空下进行溅射物理蚀刻或离子研磨或通过喷砂机械蚀刻来进行突起。 磁盘包括结晶玻璃基板,铬或铬合金底涂层,薄磁膜,保护性碳膜和润滑膜。
    • 8. 发明授权
    • Magnetic disc comprising a substrate of an amorphous glass continuous
phase dispersed with crystal particles which produce a structurally
defined surface on the substrate
    • 磁盘包括分散有晶体颗粒的无定形玻璃连续相的基底,其在基底上产生结构上限定的表面
    • US5093173A
    • 1992-03-03
    • US462775
    • 1990-01-10
    • Nobuo NakagawaHirayoshi Tanei
    • Nobuo NakagawaHirayoshi Tanei
    • G11B5/82G11B5/72G11B5/725G11B5/73G11B5/738G11B5/84
    • G11B5/7315G11B5/72G11B5/725G11B5/7325G11B5/738Y10S428/90Y10T428/252Y10T428/30
    • A substrate for a magnetic disc, which comprises a crystallized glass consisting essentially of an amorphous glass continuous phase and crystal particles dispersed in the continuous phase, the substrate having fine projections of the crystal particles on the surface thereof, a method of producing the substrate, the magnetic disc using the substrate, and a method of producing the magnetic disc are provided. The crystallized glass is made from a glass material of a Li.sub.2 O-SiO.sub.2, Li.sub.2 O-Al.sub.2 O.sub.3 -SiO.sub.2, Li.sub.2 O-MgO-Al.sub.2 O.sub.3 -SiO.sub.2, MgO-Al.sub.2 O.sub.3 -SiO.sub.2, Na.sub.2 O-Al.sub.2 O.sub.3 -SiO.sub.2 or BaO-Al.sub.2 O.sub.3 -SiO.sub.2 system, and the crystal particles have one or more compositions selected from Li.sub.2 O.multidot.SiO.sub.2, Li.sub.2 O.multidot.2SiO.sub.2, Li.sub.2 O.multidot.Al.sub.2 O.sub.3 .multidot.2SiO.sub.2, Li.sub.2 O.multidot.Al.sub.2 O.sub.3 .multidot.4SiO.sub.2, SiO.sub.2 and 2MgO.multidot.2Al.sub.2 O.sub.3 .multidot.5SiO.sub.2, and an average particle size of 0.01 to 3.0 .mu.m, and are projected at a density of 10.sup.2 to 10.sup.6 /mm.sup.2 and at an average height of 0.005 to 0.2 .mu.m on the surface of the substrate, the total surface area of the projections of crystal particles occupying at most 30% of the unit surface area of the substrate. The projections are made by chemical etching with an aqueous solution of hydrofluoric acid, physical etching with sputtering under vacuum or ion-milling, or mechanical etching with sand blasting. The magnetic disc comprises the crystallized glass substrate, a chromium or chromium alloy undercoat film, thin magnetic film, protective carbon film and lubricant film.
    • 一种用于磁盘的基板,其包括基本上由无定形玻璃连续相组成的结晶玻璃和分散在连续相中的晶体颗粒,所述基板在其表面上具有晶体颗粒的微小突起,制造基板的方法, 提供使用该基板的磁盘及其制造方法。 结晶玻璃由Li2O-SiO2,Li2O-Al2O3-SiO2,Li2O-MgO-Al2O3-SiO2,MgO-Al2O3-SiO2,Na2O-Al2O3-SiO2或BaO-Al2O3-SiO2体系的玻璃材料制成, 晶体颗粒具有选自Li 2 O x SiO 2,Li 2 O x 2 SiO 2,Li 2 O x Al 2 O 3 xSiSiO 2,Li 2 O x Al 2 O 3 x 4 SiO 2,SiO 2和2MgO 2 Al 2 O x xSiSiO 2中的一种或多种组合物,平均粒径为0.01〜3.0μm,以102〜106 / mm 2的密度投影,平均高度 在基板表面上为0.005〜0.2μm,晶体颗粒的突起的总表面积占基板的单位面积的至多30%。 通过用氢氟酸的水溶液进行化学蚀刻,在真空下进行溅射物理蚀刻或离子研磨或通过喷砂机械蚀刻来进行突起。 磁盘包括结晶玻璃基板,铬或铬合金底涂层,薄磁膜,保护性碳膜和润滑膜。