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1. 发明授权

US08307783B2 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US08307783B2
公开(公告)日：2012-11-13
申请号：US12874624
申请日：2010-09-02
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier.
摘要翻译：特别是用于等离子体涂覆工件的真空处理装置具有用于升高和/或点燃用于处理工件的辉光放电等离子体的装置，以及导电材料的至少一个空心体，所述中空体包括中空空间和至少一个电荷载体流过的开口，以便可能点燃和操作等离子体或增强现有的等离子体。中空体与工件电连接，使得中空体基本处于工件电位。中空空间被形成为使得当至少在一定的压力和电压范围内向中空体施加电信号时，满足在中空体的内部点火的几何条件，并且至少一个中空体不是工件载体。

2. 发明申请

US20100326356A1 PLASMA BOOSTER FOR PLASMA TREATMENT INSTALLATION 有权
标题翻译：用于等离子体处理安装的等离子体增压器
公开(公告)号：US20100326356A1
公开(公告)日：2010-12-30
申请号：US12874624
申请日：2010-09-02
申请人： ORLAW MASSLER , Hubert Eberle , Patrick Gschwend
发明人： ORLAW MASSLER , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/44
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier.
摘要翻译：特别是用于等离子体涂覆工件的真空处理装置具有用于升高和/或点燃用于处理工件的辉光放电等离子体的装置，以及导电材料的至少一个空心体，所述中空体包括中空空间和至少一个电荷载体流过的开口，以便可能点燃和操作等离子体或增强现有的等离子体。中空体与工件电连接，使得中空体基本处于工件电位。中空空间被形成为使得当至少在一定的压力和电压范围内向中空体施加电信号时，满足在中空体的内部点火的几何条件，并且至少一个中空体不是工件载体。

3. 发明授权

US07798097B2 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US07798097B2
公开(公告)日：2010-09-21
申请号：US11416344
申请日：2006-05-01
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： An arrangement for boosting or igniting a glow discharge plasma for coating workpieces has at least one hollow body of an electrically conductive material formed such that when an electric signal is applied to the hollow body at least in a certain pressure and voltage range, the geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied. The hollow body has at least one opening through which charge carriers can flow off into the environs of the arrangement in order to ignite and operate the plasma or to boost a plasma existing there. The arrangement has a mechanism which connects the hollow body electrically with the workpieces such that the hollow body is essentially at workpiece potential.
摘要翻译：用于升高或点燃用于涂覆工件的辉光放电等离子体的装置具有至少一个导电材料的中空体，其形成为使得当电信号至少在一定压力和电压范围内施加到中空体时，几何条件用于在中空体的内部点燃点火。中空体具有至少一个开口，电荷载体可以穿过该开口流入该装置的周围，以便点燃和操作等离子体或者提高存在于其中的等离子体。该装置具有将空心体与工件电连接使得中空体基本上处于工件电位的机构。

4. 发明申请

US20060254517A1 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US20060254517A1
公开(公告)日：2006-11-16
申请号：US11416344
申请日：2006-05-01
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： An arrangement for boosting or igniting a glow discharge plasma for coating workpieces has at least one hollow body of an electrically conductive material formed such that when an electric signal is applied to the hollow body at least in a certain pressure and voltage range, the geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied. The hollow body has at least one opening through which charge carriers can flow off into the environs of the arrangement in order to ignite and operate the plasma or to boost a plasma existing there. The arrangement has a mechanism which connects the hollow body electrically with the workpieces such that the hollow body is essentially at workpiece potential.
摘要翻译：用于升高或点燃用于涂覆工件的辉光放电等离子体的装置具有至少一个导电材料的中空体，其形成为使得当电信号至少在一定压力和电压范围内施加到中空体时，几何条件用于在中空体的内部点燃点火。中空体具有至少一个开口，电荷载体可以穿过该开口流入该装置的周围，以便点燃和操作等离子体或者提高存在于其中的等离子体。该装置具有将空心体与工件电连接使得中空体基本上处于工件电位的机构。

5. 发明申请

US20100018464A1 DLC COATING SYSTEM AND PROCESS AND APPARATUS FOR MAKING COATING SYSTEM 审中-公开
标题翻译： DLC涂料体系及其制备方法及设备
公开(公告)号：US20100018464A1
公开(公告)日：2010-01-28
申请号：US12543869
申请日：2009-08-19
申请人： Orlaw MASSLER , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
发明人： Orlaw MASSLER , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
IPC分类号： C23C16/54
CPC分类号： H01J37/32055 , C23C16/029 , C23C16/26 , C23C28/044 , C23C28/046 , C23C28/048 , C23C28/42 , F16C33/043 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF.
摘要翻译：一种工艺和布置，通过该工艺和布置，可以产生用于防止磨损，防止腐蚀和改善滑动特性等的层系统，其具有用于在衬底上的布置的粘合剂层，用于在粘合剂层上的布置的过渡层和金刚烷碳的覆盖层，所述粘合剂层包括含有第4,5族和第6族的元素和硅的至少一种元素，所述过渡层包含碳和来自上述组的至少一种元素，并且覆盖层基本上由金刚烷碳组成，该层系统具有至少15GPa，优选至少20GPa的硬度和至少3HF的粘合力。

6. 发明授权

US07601405B2 DLC coating system and process and apparatus for making coating system 有权
标题翻译： DLC涂料体系及制备涂料体系的工艺和设备
公开(公告)号：US07601405B2
公开(公告)日：2009-10-13
申请号：US12013003
申请日：2008-01-11
申请人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
发明人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
IPC分类号： H05H1/24
CPC分类号： H01J37/32055 , C23C16/029 , C23C16/26 , C23C28/044 , C23C28/046 , C23C28/048 , C23C28/42 , F16C33/043 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF.
摘要翻译：一种工艺和布置，通过该工艺和布置，可以产生用于防止磨损，防止腐蚀和改善滑动特性等的层系统，其具有用于在衬底上的布置的粘合剂层，用于在粘合剂层上的布置的过渡层和金刚烷碳的覆盖层，所述粘合剂层包括含有第4,5族和第6族的元素和硅的至少一种元素，所述过渡层包含碳和来自上述组的至少一种元素，并且覆盖层基本上由金刚烷碳组成，该层系统具有至少15GPa，优选至少20GPa的硬度和至少3HF的粘合力。

7. 发明申请

US20080311310A1 DLC Coating System and Process and Apparatus for Making Coating System 有权
标题翻译： DLC涂料系统及其制备方法及设备
公开(公告)号：US20080311310A1
公开(公告)日：2008-12-18
申请号：US12013003
申请日：2008-01-11
申请人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
发明人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
IPC分类号： C23C14/02
CPC分类号： H01J37/32055 , C23C16/029 , C23C16/26 , C23C28/044 , C23C28/046 , C23C28/048 , C23C28/42 , F16C33/043 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF.
摘要翻译：一种工艺和布置，通过该工艺和布置，可以产生用于防止磨损，防止腐蚀和改善滑动特性等的层系统，其具有用于在衬底上的布置的粘合剂层，用于在粘合剂层上的布置的过渡层和金刚烷碳的覆盖层，所述粘合剂层包括含有第4,5族和第6族的元素和硅的至少一种元素，所述过渡层包含碳和来自上述组的至少一种元素，并且覆盖层基本上由金刚烷碳组成，该层系统具有至少15GPa，优选至少20GPa的硬度和至少3HF的粘合力。

8. 发明授权

US07160616B2 DLC layer system and method for producing said layer system 有权
公开(公告)号：US07160616B2
公开(公告)日：2007-01-09
申请号：US10257678
申请日：2000-12-27
申请人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
发明人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke , Thorsten Michler
IPC分类号： C23C16/26
CPC分类号： H01J37/32055 , C23C16/029 , C23C16/26 , C23C28/044 , C23C28/046 , C23C28/048 , C23C28/42 , F16C33/043 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the like with an adhesion layer to be arranged on a substrate, a transition layer to be arranged on the adhesion layer and a covering layer of diamond-like carbon, wherein the adhesion layer comprises at least one element of the group of elements that contains the elements of the fourth, fifth and sixth subgroup of the periodic table and silicon, the transition layer comprises carbon and at least one element of the aforesaid groups and covering layer consists essentially of diamond-like carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF according to VDI 382l, Sheet 4. The process used for the production of this layer system is such at the initial introduction of the substrate into a vacuum chamber and pumping to produce a vacuum of at least 10−4 mbar, preferably 10−5 mbar, is at first followed by the cleaning of the substrate surface to remove any adhering impurities and then by the plasma-supported deposition of the adhesion layer. Subsequently the transition layer is applied by the simultaneous deposition of the components of the adhesion layer and the deposition of carbon from the gaseous phase by means of plasma-CVD. The diamond-like carbon layer is then applied solely by means of plasma-supported deposition of carbon from the gaseous phase. During the process a biasing voltage is applied to the substrate, this voltage being pulsed in the medium-frequency range, while a superposed magnetic field stabilizes the plasma in the individual process steps.An appropriate device for carrying out the coating process therefore consists of a vacuum chamber (1) with a pumping system (9) for the production of a vacuum in the vacuum chamber, substrate holding devices (3) to receive the substrates to be coated, at least one gas supply unit (18) for dosing the supply of process gas, at least one vaporizer device (14) to make available coating material for deposition, an arc generation device (10, 13) to ignite a low-voltage d.c. arc, a device (16) for the generation of a substrate biasing voltage and with at least one or several magnetic field generator devices (17) for the formation of a far magnetic field.The invention also describes a DLC-slipping layer system and a process for the production of such a system, which on its surface side is provided with an an additional slipping layer.

9. 发明授权

US06740393B1 DLC coating system and process and apparatus for making coating system 有权
公开(公告)号：US06740393B1
公开(公告)日：2004-05-25
申请号：US09551883
申请日：2000-04-18
申请人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke
发明人： Orlaw Massler , Mauro Pedrazzini , Christian Wohlrab , Hubert Eberle , Martin Grischke
IPC分类号： B32B900
CPC分类号： H01J37/32055 , C23C16/029 , C23C16/26 , C23C28/044 , C23C28/046 , C23C28/048 , C23C28/42 , F16C33/043 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A process and an arrangement are described by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer comprising at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at last 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF according to VDI 3824, Page 4. For producing such a layer, a process is used during which, after the substrate is placed in a vacuum chamber and after a pumping-down to a vacuum of less than 10−4 mbar, preferably 10−5, the substrate surface is first cleaned in that adhering impurities are removed, while subsequently a plasma-aided vapor depositing of the adhesive layer takes place. Then the transition layer is applied by the simultaneous plasma-aided vapor depositing of the adhesive layer constituents and the depositing of carbon from the gas phase by means of plasma CVD. The application of the adamantine carbon layer then takes place by way of the sole plasma-aided depositing of carbon from the gas phase. During the process, a substrate bias voltage is applied to the substrate which is preferably pulsed in a medium frequency range, and a magnetic field is superimposed which stabilizes the plasma in individual process steps. A corresponding arrangement for implementing the coating process therefore has a vacuum chamber (1) with a pumping system (9) for generating a vacuum in the vacuum chamber, substrate holding devices (3) for receiving the substrates to be coated, at least one gas supply unit (18) for the metered addition of process gas, at least one vaporizer device (14) for providing coating material for the vapor depositing, an arc generating device (10, 13) for igniting a direct-voltage low-voltage arc, a device (16) for generating a substrate bias voltage, and at least one or several magnetic field generating devices (17) for forming a magnetic far field and/or several close fields.

10. 发明授权

US4453861A Trench walls and method for constructing same 失效
标题翻译：沟槽墙壁及其构造方法
公开(公告)号：US4453861A
公开(公告)日：1984-06-12
申请号：US202872
申请日：1980-10-31
申请人： Helmut Bretz , Hubert Eberle
发明人： Helmut Bretz , Hubert Eberle
IPC分类号： E02D5/18 , E02D5/20
CPC分类号： E02D5/18
摘要： A trench wall section having a finished exposed surface and a method for constructing such a trench wall section involves excavating a trench and simultaneously filling it with shore-up fluid, inserting into the trench a pair of spaced apart vertical partition elements having guide grooves thereon, engaging the ends of a prefabricated plate with the guide grooves and guiding the plate downward into the trench between the vertical partition elements at the side of the trench wall which is later to be exposed by removing the soil, introducing in-situ concrete into the space between the plate and the other side of the trench and between the vertical partition elements and thereby displacing the shore-up fluid, allowing the in-situ concrete to harden into a body which adheres to the plate and to the vertical partition elements, and removing the soil to expose the plate, the associated vertical partition elements and the concrete body which are joined together to form the trench wall section.
摘要翻译：具有完成的暴露表面的沟槽壁部分和用于构造这样的沟槽壁部分的方法包括挖掘沟槽并同时用凸起流体填充沟槽，将一对间隔开的垂直分隔元件插入其中，将预制板的端部与引导槽接合，并将板向下引导到沟槽壁侧面处的沟槽之间的沟槽中，后壁将通过移除土壤而被暴露，将现场混凝土引入空间在槽和槽的另一侧之间以及垂直分隔件之间并且由此移动上升液体，从而允许现场混凝土硬化到粘附到板和垂直分隔元件的主体中，并且移除暴露板的土壤，相连的垂直分隔元件和混凝土体，它们结合在一起以形成沟槽壁部分 n。

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