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1. 发明申请

US20060254517A1 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US20060254517A1
公开(公告)日：2006-11-16
申请号：US11416344
申请日：2006-05-01
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： An arrangement for boosting or igniting a glow discharge plasma for coating workpieces has at least one hollow body of an electrically conductive material formed such that when an electric signal is applied to the hollow body at least in a certain pressure and voltage range, the geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied. The hollow body has at least one opening through which charge carriers can flow off into the environs of the arrangement in order to ignite and operate the plasma or to boost a plasma existing there. The arrangement has a mechanism which connects the hollow body electrically with the workpieces such that the hollow body is essentially at workpiece potential.
摘要翻译：用于升高或点燃用于涂覆工件的辉光放电等离子体的装置具有至少一个导电材料的中空体，其形成为使得当电信号至少在一定压力和电压范围内施加到中空体时，几何条件用于在中空体的内部点燃点火。中空体具有至少一个开口，电荷载体可以穿过该开口流入该装置的周围，以便点燃和操作等离子体或者提高存在于其中的等离子体。该装置具有将空心体与工件电连接使得中空体基本上处于工件电位的机构。

2. 发明授权

US08307783B2 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US08307783B2
公开(公告)日：2012-11-13
申请号：US12874624
申请日：2010-09-02
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier.
摘要翻译：特别是用于等离子体涂覆工件的真空处理装置具有用于升高和/或点燃用于处理工件的辉光放电等离子体的装置，以及导电材料的至少一个空心体，所述中空体包括中空空间和至少一个电荷载体流过的开口，以便可能点燃和操作等离子体或增强现有的等离子体。中空体与工件电连接，使得中空体基本处于工件电位。中空空间被形成为使得当至少在一定的压力和电压范围内向中空体施加电信号时，满足在中空体的内部点火的几何条件，并且至少一个中空体不是工件载体。

3. 发明申请

US20100326356A1 PLASMA BOOSTER FOR PLASMA TREATMENT INSTALLATION 有权
标题翻译：用于等离子体处理安装的等离子体增压器
公开(公告)号：US20100326356A1
公开(公告)日：2010-12-30
申请号：US12874624
申请日：2010-09-02
申请人： ORLAW MASSLER , Hubert Eberle , Patrick Gschwend
发明人： ORLAW MASSLER , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/44
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier.
摘要翻译：特别是用于等离子体涂覆工件的真空处理装置具有用于升高和/或点燃用于处理工件的辉光放电等离子体的装置，以及导电材料的至少一个空心体，所述中空体包括中空空间和至少一个电荷载体流过的开口，以便可能点燃和操作等离子体或增强现有的等离子体。中空体与工件电连接，使得中空体基本处于工件电位。中空空间被形成为使得当至少在一定的压力和电压范围内向中空体施加电信号时，满足在中空体的内部点火的几何条件，并且至少一个中空体不是工件载体。

4. 发明授权

US07798097B2 Plasma booster for plasma treatment installation 有权
标题翻译：等离子体加速器用于等离子体处理装置
公开(公告)号：US07798097B2
公开(公告)日：2010-09-21
申请号：US11416344
申请日：2006-05-01
申请人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
发明人： Orlaw Massler , Hubert Eberle , Patrick Gschwend
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , C23C14/22 , C23C16/0272 , C23C16/26 , C23C16/50 , H01J37/32018
摘要： An arrangement for boosting or igniting a glow discharge plasma for coating workpieces has at least one hollow body of an electrically conductive material formed such that when an electric signal is applied to the hollow body at least in a certain pressure and voltage range, the geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied. The hollow body has at least one opening through which charge carriers can flow off into the environs of the arrangement in order to ignite and operate the plasma or to boost a plasma existing there. The arrangement has a mechanism which connects the hollow body electrically with the workpieces such that the hollow body is essentially at workpiece potential.
摘要翻译：用于升高或点燃用于涂覆工件的辉光放电等离子体的装置具有至少一个导电材料的中空体，其形成为使得当电信号至少在一定压力和电压范围内施加到中空体时，几何条件用于在中空体的内部点燃点火。中空体具有至少一个开口，电荷载体可以穿过该开口流入该装置的周围，以便点燃和操作等离子体或者提高存在于其中的等离子体。该装置具有将空心体与工件电连接使得中空体基本上处于工件电位的机构。

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