专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06782901B2 Sulfuric acid recycle apparatus 有权
标题翻译：硫酸回收设备
公开(公告)号：US06782901B2
公开(公告)日：2004-08-31
申请号：US10045327
申请日：2001-11-07
申请人： Okimitsu Yasuda , Seiichi Fujii
发明人： Okimitsu Yasuda , Seiichi Fujii
IPC分类号： B08B300
CPC分类号： H01L21/67057 , B08B3/00 , C01B17/88 , Y10S134/902
摘要： A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.
摘要翻译：提供了一种能够浓缩硫酸的硫酸回收设备，其在晶圆清洗过程完成时浓度降低到待循环水平。通过混合硫酸和过氧化氢溶液制备的晶片清洗液中的硫酸回收硫酸回收装置包括一个具有至少一个引入口和排出口形成的两个开口的反应槽，用于通过浓缩硫酸获得浓硫酸在晶圆清洗工序完成后从引入口导入的晶片清洗废液中，然后从排出口排出浓硫酸，处理晶片的晶片处理槽，以及将浓硫酸供给到晶圆加工浴。

IPRDB

热门服务

关于我们

友情链接

联系方式