专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110034436A1 SPIROCYCLIC AMINOQUINOLNES AS GSK-3 INHIBITORS 有权
标题翻译：作为GSK-3抑制剂的螺环氨基酚
公开(公告)号：US20110034436A1
公开(公告)日：2011-02-10
申请号：US12678120
申请日：2008-09-12
申请人： Oana Cociorva , Yasumichi Fukuda , Yasushi Kohno , Bei Li , Kyoko Okada , Ayako Nakamura , Masahiro Nomura , Shigeki Seto , Anna Katrin Szardenings , Yumoto Kazuhiro
发明人： Oana Cociorva , Yasumichi Fukuda , Yasushi Kohno , Bei Li , Kyoko Okada , Ayako Nakamura , Masahiro Nomura , Shigeki Seto , Anna Katrin Szardenings , Yumoto Kazuhiro
IPC分类号： A61K31/553 , C07D265/28 , C07D487/10 , A61K31/5386 , A61P25/00 , A61P25/28 , A61P1/00 , A61P25/18 , A61P35/00 , A61P3/10
CPC分类号： C07D498/06 , A61J1/00 , C07D498/10 , C07D498/20
摘要： Provided herein are spirocyclic aminoquinolones of formula I and compositions containing the compounds. The compounds and compositions provided herein are useful in the prevention, amelioration or treatment of GSK-3 inhibitors mediated diseases. In Formula (I): X1 is O or NR8; A is bond or substituted or unsubstituted C1-C2 alkylene, wherein the substituents when present are selected from one to four Q2 groups; where Q2 is alkyl or haloalkyl; p is 0 or 1; and q is an integer of 0 to 2.
摘要翻译：本文提供式I的螺环氨基喹诺酮和含有该化合物的组合物。本文提供的化合物和组合物可用于预防，改善或治疗GSK-3抑制剂介导的疾病。式（I）中，X 1为O或NR 8; A是键或取代或未取代的C 1 -C 2亚烷基，其中当存在时的取代基选自1至4个Q 2基团; 其中Q2是烷基或卤代烷基; p为0或1; q为0〜2的整数。

2. 发明授权

US08476261B2 Spirocyclic aminoquinolones as GSK-3 inhibitors 有权
标题翻译：螺环氨基喹诺酮类作为GSK-3抑制剂
公开(公告)号：US08476261B2
公开(公告)日：2013-07-02
申请号：US12678120
申请日：2008-09-12
申请人： Oana Cociorva , Yasumichi Fukuda , Yasushi Kohno , Bei Li , Kyoko Okada , Ayako Nakamura , Masahiro Nomura , Shigeki Seto , Anna Katrin Szardenings , Kazuhiro Yumoto
发明人： Oana Cociorva , Yasumichi Fukuda , Yasushi Kohno , Bei Li , Kyoko Okada , Ayako Nakamura , Masahiro Nomura , Shigeki Seto , Anna Katrin Szardenings , Kazuhiro Yumoto
IPC分类号： A61K31/5386
CPC分类号： C07D498/06 , A61J1/00 , C07D498/10 , C07D498/20
摘要： Provided herein are spirocyclic aminoquinolones of formula I and compositions containing the compounds. The compounds and compositions provided herein are useful in the prevention, amelioration or treatment of GSK-3 inhibitors mediated diseases. In Formula (I): X1 is O or NR8; A is bond or substituted or unsubstituted C1-C2 alkylene, wherein the substituents when present are selected from one to four Q2 groups; where Q2 is alkyl or haloalkyl; p is 0 or 1; and q is an integer of 0 to 2.
摘要翻译：本文提供式I的螺环氨基喹诺酮和含有该化合物的组合物。本文提供的化合物和组合物可用于预防，改善或治疗GSK-3抑制剂介导的疾病。式（I）中，X 1为O或NR 8; A是键或取代或未取代的C 1 -C 2亚烷基，其中当存在时的取代基选自1至4个Q 2基团; 其中Q2是烷基或卤代烷基; p为0或1; q为0〜2的整数。

3. 发明授权

US08063221B2 Aminoquinolones as GSK-3 inhibitors 有权
标题翻译：氨基喹诺酮类作为GSK-3抑制剂
公开(公告)号：US08063221B2
公开(公告)日：2011-11-22
申请号：US11718000
申请日：2007-03-13
申请人： Oana Cociorva , Bei Li , Anna Katrin Szardenings , Yasumichi Fukuda , Masahiro Nomura , Shigeki Seto , Kazuhiro Yumoto , Kyoko Okada , Ayako Nakamura
发明人： Oana Cociorva , Bei Li , Anna Katrin Szardenings , Yasumichi Fukuda , Masahiro Nomura , Shigeki Seto , Kazuhiro Yumoto , Kyoko Okada , Ayako Nakamura
IPC分类号： C07D215/00 , A01N43/42 , A61K31/47
CPC分类号： C12N9/99 , C07D498/06
摘要： Provided herein are aminoquinolones and pharmaceutically acceptable derivatives thereof. In certain embodiments, provided herein are compounds, compositions and methods for treating, preventing or ameliorating GSK-3 mediated diseases.
摘要翻译：本文提供氨基喹诺酮及其药学上可接受的衍生物。在某些实施方案中，本文提供了用于治疗，预防或改善GSK-3介导的疾病的化合物，组合物和方法。

4. 发明申请

US20070254866A1 Aminoquinolones as GSK-3 inhibitors 有权
标题翻译：氨基喹诺酮类作为GSK-3抑制剂
公开(公告)号：US20070254866A1
公开(公告)日：2007-11-01
申请号：US11718000
申请日：2007-03-13
申请人： Oana Cociorva , Bei Li , Katrin Szardenings , Yasumichi Fukuda , Masahiro Nomura , Shigeki Seto , Kazuhiro Yumoto , Kyoko Okada , Ayako Nakamura
发明人： Oana Cociorva , Bei Li , Katrin Szardenings , Yasumichi Fukuda , Masahiro Nomura , Shigeki Seto , Kazuhiro Yumoto , Kyoko Okada , Ayako Nakamura
IPC分类号： A61K31/47 , A61K31/535 , A61K31/553 , A61P19/02 , A61P19/10 , A61P25/16 , A61P25/24 , A61P25/28 , A61P3/10 , A61P31/12 , A61P35/00 , C07D215/02 , C07D265/34 , C07D267/08 , C12N9/99
CPC分类号： C12N9/99 , C07D498/06
摘要： Provided herein are aminoquinolones and pharmaceutically acceptable derivatives thereof. In certain embodiments, provided herein are compounds, compositions and methods for treating, preventing or ameliorating GSK-3 mediated diseases.
摘要翻译：本文提供氨基喹诺酮及其药学上可接受的衍生物。在某些实施方案中，本文提供了用于治疗，预防或改善GSK-3介导的疾病的化合物，组合物和方法。

5. 发明申请

US20100016304A1 GLUCOKINASE ACTIVATOR 有权
公开(公告)号：US20100016304A1
公开(公告)日：2010-01-21
申请号：US12448549
申请日：2007-12-21
申请人： Yasumichi Fukuda , Yoshikazu Asahina , Ayako Nakamura , Kenji Fujita , Tomohiro Ide , Fumiyoshi Kobayashi , Shinji Kobayashi , Kanji Komatsu , Masanori Yamamoto
发明人： Yasumichi Fukuda , Yoshikazu Asahina , Ayako Nakamura , Kenji Fujita , Tomohiro Ide , Fumiyoshi Kobayashi , Shinji Kobayashi , Kanji Komatsu , Masanori Yamamoto
IPC分类号： A61K31/5377 , C07D263/14 , A61K31/421 , A61K31/426 , C07D277/28 , C07D513/04 , A61K31/4365 , C07D417/12 , A61P3/10
CPC分类号： C07C317/44 , C07C2601/08 , C07D213/75 , C07D213/80 , C07D215/38 , C07D217/22 , C07D231/40 , C07D237/20 , C07D239/42 , C07D241/20 , C07D241/28 , C07D241/44 , C07D261/14 , C07D263/48 , C07D275/02 , C07D277/20 , C07D277/46 , C07D277/82 , C07D285/08 , C07D417/04 , C07D471/04 , C07D487/04 , C07D498/04 , C07D513/04
摘要： A compound represented by the following formula (1): (wherein the carbon atom denoted by * is in the R-configuration; R1 and R2 are each independently a hydrogen atom, a halogen atom, an amino group, a hydroxyl group, a hydroxyamino group, a nitro group, a cyano group, a sulfamoyl group, a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C6 alkylsulfanyl group, a C1-C6 alkylsulfinyl group or a C1-C6 alkylsulfonyl group; and A is a substituted or unsubstituted heteroaryl group), or a pharmaceutically acceptable salt thereof.
摘要翻译：由下式（1）表示的化合物：（其中由*表示的碳原子为R构型; R 1和R 2各自独立地为氢原子，卤素原子，氨基，羟基，羟基氨基基团，硝基，氰基，氨磺酰基，C1-C6烷基，C1-C6烷氧基，C1-C6烷基硫烷基，C1-C6烷基亚磺酰基或C1-C6烷基磺酰基;以及 A是取代或未取代的杂芳基）或其药学上可接受的盐。

6. 发明授权

US08173649B2 Glucokinase activator 有权
标题翻译：葡萄糖激酶活化剂
公开(公告)号：US08173649B2
公开(公告)日：2012-05-08
申请号：US12448549
申请日：2007-12-21
申请人： Yasumichi Fukuda , Yoshikazu Asahina , Ayako Nakamura , Kenji Fujita , Tomohiro Ide , Fumiyoshi Kobayashi , Shinji Kobayashi , Kanji Komatsu , Masanori Yamamoto
发明人： Yasumichi Fukuda , Yoshikazu Asahina , Ayako Nakamura , Kenji Fujita , Tomohiro Ide , Fumiyoshi Kobayashi , Shinji Kobayashi , Kanji Komatsu , Masanori Yamamoto
IPC分类号： A61K31/5377 , A61K31/421 , A61K31/426 , A61K31/4365 , C07D263/14 , C07D277/28 , C07D513/04 , C07D417/12 , A61P3/10
CPC分类号： C07C317/44 , C07C2601/08 , C07D213/75 , C07D213/80 , C07D215/38 , C07D217/22 , C07D231/40 , C07D237/20 , C07D239/42 , C07D241/20 , C07D241/28 , C07D241/44 , C07D261/14 , C07D263/48 , C07D275/02 , C07D277/20 , C07D277/46 , C07D277/82 , C07D285/08 , C07D417/04 , C07D471/04 , C07D487/04 , C07D498/04 , C07D513/04
摘要： A compound represented by the following formula (1): (wherein the carbon atom denoted by * is in the R-configuration; R1 and R2 are each independently a hydrogen atom, a halogen atom, an amino group, a hydroxyl group, a hydroxyamino group, a nitro group, a cyano group, a sulfamoyl group, a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C6 alkylsulfanyl group, a C1-C6 alkylsulfinyl group or a C1-C6 alkylsulfonyl group; and A is a substituted or unsubstituted heteroaryl group), or a pharmaceutically acceptable salt thereof.
摘要翻译：由下式（1）表示的化合物：（其中由*表示的碳原子为R构型; R 1和R 2各自独立地为氢原子，卤素原子，氨基，羟基，羟基氨基基团，硝基，氰基，氨磺酰基，C1-C6烷基，C1-C6烷氧基，C1-C6烷基硫烷基，C1-C6烷基亚磺酰基或C1-C6烷基磺酰基;以及 A是取代或未取代的杂芳基）或其药学上可接受的盐。

7. 发明授权

US10222293B2 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method by detecting a light amount of measuring light 有权
公开(公告)号：US10222293B2
公开(公告)日：2019-03-05
申请号：US12654590
申请日：2009-12-23
申请人： Hiroshi Ooki , Ayako Nakamura
发明人： Hiroshi Ooki , Ayako Nakamura
IPC分类号： G03B27/54 , G01M11/02 , G03F1/44 , G03F7/20
摘要： There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected; arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area; and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area; wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.

8. 发明申请

US20090011368A1 Exposure Method and Apparatus, and Electronic Device Manufacturing Method 审中-公开
标题翻译：曝光方法和装置以及电子装置制造方法
公开(公告)号：US20090011368A1
公开(公告)日：2009-01-08
申请号：US11884891
申请日：2006-02-23
申请人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
发明人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
IPC分类号： G03F7/22 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70408 , G02B5/1838 , G02B5/1866 , G02B13/143 , G02B27/4222 , G02B27/4272 , G02B27/4277 , G03B27/42 , G03F7/70283 , G03F7/7035
摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.
摘要翻译：目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。

9. 发明申请

US20100195072A1 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
标题翻译：光学特性测量方法，光学特性调节方法，曝光装置，曝光方法和曝光装置制造方法
公开(公告)号：US20100195072A1
公开(公告)日：2010-08-05
申请号：US12654590
申请日：2009-12-23
申请人： Hiroshi Ooki , Ayako Nakamura
发明人： Hiroshi Ooki , Ayako Nakamura
IPC分类号： G03B27/54 , G01B11/14
CPC分类号： G01M11/0264 , G03F1/44 , G03F7/70258 , G03F7/706 , G03F7/7085
摘要： There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected; arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area; and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area; wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.
摘要翻译：提供一种光学特性测量方法，用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性，该光学特性测量方法包括：在第一平面上，测量光通过的第一区域或测量光通过该区域反射; 在对应于第一区域的位置处，在第二平面上布置测量光通过的第二区域或测量光被反射的第二区域; 并且经由所述第一区域和所述第二区域中的一个区域经由所述光学系统和所述第一区域和所述第二区域中的另一个检测所述测量光的光量; 其中，所述第一区域和所述第二区域中的至少一个具有使得通过所述测量光或经由所述光学系统反射的所述测量光的光量根据所述光学特性而改变的形状。

10. 发明申请

US20100177290A1 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
标题翻译：光学特性测量方法，光学特性调节方法，曝光装置，曝光方法和曝光装置制造方法
公开(公告)号：US20100177290A1
公开(公告)日：2010-07-15
申请号：US12654589
申请日：2009-12-23
申请人： Kiyoshi Toyama , Ayako Nakamura
发明人： Kiyoshi Toyama , Ayako Nakamura
IPC分类号： G03B27/52 , G01M11/02
CPC分类号： G03F7/7085 , G01M11/0264 , G03F1/44 , G03F7/70641
摘要： There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging at least one phase pattern on the first plane; illuminating the arranged phase pattern, with a light having a predetermined wavelength; extracting a partial image of a pattern image formed via the phase pattern and the optical system; and detecting information about the light in relation to the extracted partial image.
摘要翻译：提供一种光学特性测量方法，用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性，所述光学特性测量方法包括：将至少一个相位图案布置在第一架飞机; 用具有预定波长的光照亮布置的相位图案; 提取通过相位图案和光学系统形成的图案图像的部分图像; 并且检测关于所提取的部分图像的光的信息。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式