专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06567715B1 Method and system for automated on-chip material and structural certification of MEMS devices 有权
标题翻译： MEMS器件自动化芯片材料和结构认证的方法和系统
公开(公告)号：US06567715B1
公开(公告)日：2003-05-20
申请号：US09553989
申请日：2000-04-19
申请人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith , Brian D. Jensen , Samuel L. Miller
发明人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith , Brian D. Jensen , Samuel L. Miller
IPC分类号： G06F1900
CPC分类号： B81C99/005
摘要： A new approach toward MEMS quality control and materials characterization is provided by a combined test structure measurement and mechanical response modeling approach. Simple test structures are cofabricated with the MEMS devices being produced. These test structures are designed to isolate certain types of physical response, so that measurement of their behavior under applied stress can be easily interpreted as quality control and material properties information.
摘要翻译：通过组合的测试结构测量和机械响应建模方法提供了MEMS质量控制和材料表征的新方法。简单的测试结构与正在生产的MEMS器件共同构成。这些测试结构设计用于隔离某些类型的物理响应，从而可以轻易地将其在施加的应力下的行为测量解释为质量控制和材料属性信息。

2. 发明授权

US06721094B1 Long working distance interference microscope 有权
标题翻译：长工作距离干涉显微镜
公开(公告)号：US06721094B1
公开(公告)日：2004-04-13
申请号：US09800047
申请日：2001-03-05
申请人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith
发明人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith
IPC分类号： G02B2122
CPC分类号： G01B9/04 , G01B9/02082 , G02B21/14 , G02B21/22
摘要： Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.
摘要翻译：公开了一种长工作距离干涉显微镜，适用于标准微电子探针台上的MEMS器件和测试结构的三维成像和计量。 10-30 mm的长工作距离允许使用标准探头或探针卡。这使得能够在整个晶片上获取MEMS测试结构的纳米级3-D高度分布。与Linnik微型干涉仪相比，不需要很好匹配的参考/样品目标对，显着降低了该显微镜的成本。

3. 发明授权

US4136813A Joining a pair of parts 失效
标题翻译：加入一对零件
公开(公告)号：US4136813A
公开(公告)日：1979-01-30
申请号：US782257
申请日：1977-03-28
申请人： Norman F. Smith
发明人： Norman F. Smith
IPC分类号： B23K31/02 , B23K1/00 , B23K1/19 , B23K1/20 , B23K35/22
CPC分类号： B23K1/203 , B23K1/19
摘要： In a method of joining a pair of parts, wherein one of the parts is formed of a carbon-containing material and the other formed of a metal at least at its surface to be joined to said one part, the parts are first assembled with the surfaces to be joined in the required joining position, with a brazing material and a flux being provided at or adjacent the surfaces to be joined. The flux is chosen so that when raised to an elevated temperature above the melting point of the brazing material, it is capable of reacting with oxides and carbon at the surface of said one part, while the brazing material is chosen so as to be capable of being heated to said elevated temperature without decomposition. The assembly is then heated at least to said elevated temperature in a non-oxidizing atmosphere so as to melt the brazing material and cause the flux to react with surface oxides and carbon on said one part whereby, on cooling, a brazed joint is produced between the parts.
摘要翻译：在接合一对部件的方法中，其中一个部件由含碳材料形成，另一个部分由至少在其表面上形成的金属形成，以与所述一个部件接合，首先将部件与要在所需的接合位置接合的表面，钎焊材料和焊剂设置在待接合的表面上或邻近待连接的表面。选择焊剂，使得当升高到高于钎料的熔点的高温时，其能够在所述一部分的表面处与氧化物和碳反应，同时选择钎焊材料以能够被加热到所述升高的温度而不分解。然后将组件在非氧化性气氛中至少加热至所述升高温度，以熔化钎焊材料，并使助熔剂与所述一部分上的表面氧化物和碳反应，由此在冷却时，在零件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式